公开(公告)号：US20130260315A1

公开(公告)日：2013-10-03

申请号：US13905166

申请日：2013-05-30

申请人： JSR CORPORATION

发明人： Mitsuo SATO ,  Takehiko NARUOKA

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/004 ,  C07C69/54 ,  C07C69/63 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2601/18 ,  C07C2603/74 ,  C07D307/77 ,  C07D309/10 ,  C08F220/22 ,  C08F2220/1891 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/38 ,  C08F2220/281

摘要： A radiation-sensitive resin composition includes a polymer component that includes one or more types of polymers, and a radiation-sensitive acid generator. At least one type of the polymer of the polymer component includes a first structural unit represented by a following formula (1). R1 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group. R2 represents a linear alkyl group having 5 to 21 carbon atoms. Z represents a divalent alicyclic hydrocarbon group or an aliphatic heterocyclic group having a ring skeleton which has 4 to 20 atoms. A part or all of hydrogen atoms included in the alicyclic hydrocarbon group and the aliphatic heterocyclic group represented by Z are not substituted or substituted.

摘要翻译： 辐射敏感性树脂组合物包括包含一种或多种聚合物的聚合物组分和辐射敏感性酸产生剂。 至少一种聚合物组分的聚合物包括由下式（1）表示的第一结构单元。 R1表示氢原子，氟原子，甲基或三氟甲基。 R2表示碳原子数为5〜21的直链烷基。 Z表示二价脂环族烃基或具有4〜20个原子的环骨架的脂肪族杂环基。 由脂环族烃基和Z表示的脂肪族杂环基中的一部分或全部氢原子不被取代或取代。

公开(公告)号：US20180017864A9

公开(公告)日：2018-01-18

申请号：US15460503

申请日：2017-03-16

申请人： JSR CORPORATION

发明人： Takehiko NARUOKA ,  Tomohisa FUJISAWA ,  Motohiro SHIRATANI ,  Hisashi NAKAGAWA

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/20 ,  G03F7/16 ,  H01L21/027 ,  G03F7/32

摘要： A pattern-forming method includes applying a radiation-sensitive composition on a substrate to provide a film on the substrate. The film is exposed. The film exposed is developed. The radiation-sensitive composition includes a metal-containing component that is a metal compound having a hydrolyzable group, a hydrolysis product of the metal compound having a hydrolyzable group, a hydrolytic condensation product of the metal compound having a hydrolyzable group, or a combination thereof. A content of a transition metal atom in the metal-containing component with respect to total metal atoms in the metal-containing component is no less than 50 atomic %.

公开(公告)号：US20170184961A1

公开(公告)日：2017-06-29

申请号：US15460477

申请日：2017-03-16

申请人： JSR CORPORATION

发明人： Hisashi NAKAGAWA ,  Takehiko NARUOKA ,  Motohiro SHIRATANI

IPC分类号： G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/038 ,  G03F7/32

摘要： A pattern-forming method includes applying a radiation-sensitive composition comprising a complex on a substrate to provide a film on the substrate. The film is exposed. The film exposed is developed. The complex includes: a metal-containing component that is a transition metal compound having a hydrolyzable group, a hydrolysis product of the transition metal compound having a hydrolyzable group, a hydrolytic condensation product of the transition metal compound having a hydrolyzable group, or a combination thereof; and an organic compound represented by formula (1). In the formula (1), R1 represents an organic group having a valency of n, n being an integer of 1 to 4. In a case where n is 1, X represents —COOH. In a case where n is 2 to 4, X represents —OH, —COOH, —NCO, —NHRa, —COORA or —CO—C(RL)2—CO—RA. R1X)n  (1)

公开(公告)号：US20170131633A1

公开(公告)日：2017-05-11

申请号：US15347033

申请日：2016-11-09

申请人： JSR CORPORATION

发明人： Hisashi NAKAGAWA ,  Takehiko NARUOKA ,  Tomoki NAGAI

IPC分类号： G03F7/004 ,  G03F7/16

CPC分类号： G03F7/0046 ,  C07C381/12 ,  C07D307/77 ,  C08F220/18 ,  C08F220/22 ,  C08F220/24 ,  C08F220/26 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/095 ,  G03F7/168 ,  G03F7/2022 ,  G03F7/38 ,  H01L21/0274

摘要： A chemically amplified resist material comprises a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The radiation-sensitive acid-and-sensitizer generating agent or the radiation-sensitive acid generating agent included in the generative component comprises the first compound that is radiation-sensitive and second compound that is radiation-sensitive. The first compound includes a first onium cation and a first anion, and the second compound includes a second onium cation and a second anion that is different from the first anion. Each of an energy released upon reduction of the first onium cation to a radical and an energy released upon reduction of the second onium cation to a radical is less than 5.0 eV.

公开(公告)号：US20170075221A1

公开(公告)日：2017-03-16

申请号：US15259200

申请日：2016-09-08

申请人： JSR CORPORATION

发明人： Hisashi NAKAGAWA ,  Takehiko NARUOKA ,  Tomoki NAGAI

IPC分类号： G03F7/039 ,  G03F7/38 ,  G03F7/32 ,  G03F7/20

CPC分类号： G03F7/0397 ,  C08F220/24 ,  C08F228/02 ,  C08F2220/382 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/203 ,  G03F7/322 ,  G03F7/38

摘要： A chemically amplified resist material comprises: a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid; and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The polymer component comprises: a first polymer comprising a first structural unit that comprises a fluorine atom and does not comprise a salt structure; or a second polymer comprising a second structural unit that comprises a fluorine atom and a salt structure. The generative component comprises: a radiation-sensitive acid-and-sensitizer generating agent; any two of the radiation-sensitive acid-and-sensitizer generating agent, a radiation-sensitive sensitizer generating agent and a radiation-sensitive acid generating agent; or the radiation-sensitive acid-and-sensitizer generating agent, the radiation-sensitive sensitizer generating agent and the radiation-sensitive acid generating agent.

摘要翻译： 化学放大抗蚀剂材料包括：能够通过酸的作用使其可溶于或不溶于显影剂溶液的聚合物组分; 以及能够在曝光时产生辐射敏感敏化剂和酸的生成成分。 聚合物组分包括：包含第一结构单元的第一聚合物，其包含氟原子并且不包含盐结构; 或包含包含氟原子和盐结构的第二结构单元的第二聚合物。 生成组分包括：辐射敏感的酸和敏化剂产生剂; 任何两种辐射敏感性酸敏感剂发生剂，辐射敏感敏化剂产生剂和辐射敏感性酸产生剂; 或辐射敏感性酸敏感剂发生剂，辐射敏感敏化剂发生剂和辐射敏感性酸产生剂。

公开(公告)号：US20170299962A1

公开(公告)日：2017-10-19

申请号：US15642908

申请日：2017-07-06

申请人： JSR CORPORATION

发明人： Motohiro SHIRATANI ,  Takehiko NARUOKA ,  Hisashi NAKAGAWA

IPC分类号： G03F7/004 ,  G03F7/20 ,  G03F7/16 ,  G03F7/32

CPC分类号： G03F7/0045 ,  G03F7/004 ,  G03F7/0043 ,  G03F7/16 ,  G03F7/2004 ,  G03F7/2006 ,  G03F7/322

摘要： A radiation-sensitive composition includes an organic acid, particles including a metal oxide as a principal component, and an acid generating agent that is capable of generating an acid upon irradiation with a radioactive ray. A pKa, which is a logarithmic value of a reciprocal of an acid dissociation constant Ka, of the acid generated from the acid generating agent is less than a pKa of the organic acid. The acid generating agent satisfies at least one of conditions (i) and (ii): (i) a van der Waals volume of the acid is no less than 2.1×10−28 m3; and (ii) the acid generating agent includes a plurality of groups that are capable of generating an acid.

公开(公告)号：US20170184960A1

公开(公告)日：2017-06-29

申请号：US15460503

申请日：2017-03-16

申请人： JSR CORPORATION

发明人： Takehiko NARUOKA ,  Tomohisa FUJISAWA ,  Motohiro SHIRATANI ,  Hisashi NAKAGAWA

IPC分类号： G03F7/004 ,  H01L21/027 ,  G03F7/32 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20

摘要： A pattern-forming method includes applying a radiation-sensitive composition on a substrate to provide a film on the substrate. The film is exposed. The film exposed is developed. The radiation-sensitive composition includes a metal-containing component that is a metal compound having a hydrolyzable group, a hydrolysis product of the metal compound having a hydrolyzable group, a hydrolytic condensation product of the metal compound having a hydrolyzable group, or a combination thereof. A content of a transition metal atom in the metal-containing component with respect to total metal atoms in the metal-containing component is no less than 50 atomic %.

公开(公告)号：US20170088740A1

公开(公告)日：2017-03-30

申请号：US15374342

申请日：2016-12-09

申请人： JSR CORPORATION

发明人： Hiroyuki KOMATSU ,  Takehiko NARUOKA ,  Shinya MINEGISHI ,  Kaori SAKAI ,  Tomoki NAGAI

IPC分类号： C09D125/14 ,  G03F7/11 ,  C09D133/12 ,  G03F7/00

CPC分类号： C09D125/14 ,  C08F220/14 ,  C09D133/06 ,  C09D133/12 ,  G03F7/0002 ,  G03F7/0388 ,  G03F7/11 ,  C08F2220/325 ,  C08F212/08 ,  C08F2220/1841

摘要： A base film-forming composition includes a compound including a group capable of reacting with Si—OH or Si—H, and a solvent. The base film-forming composition is for forming a base film provided between a layer including a silicon atom and a directed self-assembling film in a directed self-assembly lithography process. The receding contact angle of the base film for pure water is no less than 70° and no greater than 90°. The compound is preferably represented by formula (1). In the formula (1), A represents a linking group having a valency of (m+n); D represents a monovalent organic group having at least 10 carbon atoms; E represents the group capable of reacting with Si—OH or Si—H; and m and n are each independently an integer of 1 to 200. (En-AD)m  (1)

公开(公告)号：US20160293408A1

公开(公告)日：2016-10-06

申请号：US15074053

申请日：2016-03-18

申请人： JSR Corporation

发明人： Hiroyuki KOMATSU ,  Takehiko NARUOKA ,  Tomoki NAGAI

IPC分类号： H01L21/02 ,  H01L21/311 ,  C08F293/00 ,  C09D133/12

CPC分类号： C08F293/00 ,  C08G18/61 ,  C08G77/38 ,  C09D153/00 ,  C09D183/00 ,  G03F7/0002 ,  G03F7/002 ,  G03F7/165 ,  H01L21/02112 ,  H01L21/0274 ,  H01L21/3065 ,  H01L21/3081

摘要： A composition for pattern formation capable of forming a directed self-assembling film having a regular array structure with fine pitches accompanied by fewer defects, and in turn capable of forming a pattern having a fine and favorable shape. A composition for pattern formation contains a block copolymer that forms a phase separation structure by directed self-assembly, and a solvent, in which the block copolymer has a first block composed of a first repeating unit that includes a silicon atom, a second block composed of a second repeating unit that does not include a silicon atom, and a first group that bonds to at least one end of the main chain and links to the first block, in which the first group is a monovalent group that forms a compound having C log P of no less than 2.4 provided that a methyl group is bonded thereto. The first group may be a monovalent hydrocarbon group having 3 to 25 carbon atoms, or a monovalent aromatic heterocyclic group having 3 to 25 carbon atoms and one hetero atom that constitutes the ring.

摘要翻译： 一种用于图案形成的组合物，其能够形成具有规则阵列结构的定向自组装膜，其具有精细的间距，伴随着较少的缺陷，并且进而能够形成具有良好形状的图案。 用于图案形成的组合物包含通过定向自组装形成相分离结构的嵌段共聚物和其中嵌段共聚物具有由包含硅原子的第一重复单元组成的第一嵌段的溶剂，第二嵌段组成 的不包含硅原子的第二重复单元，以及键合到主链的至少一个末端并连接到第一嵌段的第一基团，其中第一基团是形成具有C的化合物的一价基团 对数P不小于2.4，条件是甲基与键结合。 第一基团可以是具有3〜25个碳原子的一价烃基或具有3〜25个碳原子的一价芳族杂环基和构成环的一个杂原子。

公开(公告)号：US20150252216A1

公开(公告)日：2015-09-10

申请号：US14638844

申请日：2015-03-04

申请人： JSR CORPORATION

发明人： Shinya MINEGISHI ,  Takehiko NARUOKA ,  Tomoki NAGAI

IPC分类号： C09D153/00

CPC分类号： C09D153/00 ,  C08F297/026 ,  G03F7/0002 ,  C08L33/14

摘要： A pattern-forming method includes providing a coating film using a composition that includes: a first polymer which is a block copolymer; and a second polymer having a surface free energy lower than a surface free energy of the first polymer, such that the second polymer is unevenly distributed to be localized into a superficial layer region of the coating film. Phase separation is caused in the coating film along a direction substantially perpendicular to a thickness direction of the coating film such that at least a part of the coating film is converted into a directed self-assembling film which includes a plurality of phases. A part of the plurality of phases of the directed self-assembling film is removed.

摘要翻译： 图案形成方法包括使用组合物提供涂膜，所述组合物包括：作为嵌段共聚物的第一聚合物; 以及具有比第一聚合物的表面自由能低的表面自由能的第二聚合物，使得第二聚合物不均匀地分布以定位在涂膜的表层层区域中。 在涂膜中沿着与涂膜的厚度方向大致垂直的方向引起相分离，使得至少一部分涂膜转化为包括多相的定向自组装膜。 去除定向自组装膜的多个相的一部分。