公开(公告)号：US11355304B2

公开(公告)日：2022-06-07

申请号：US15734367

申请日：2018-06-14

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Takahiro Nishihata ,  Mayuka Osaki ,  Wei Sun ,  Takuma Yamamoto

IPC: H01J37/21 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

Abstract: In the present invention, an electro-optical condition generation unit includes: a condition setting unit that sets, as a plurality of electro-optical conditions, a plurality of electro-optical conditions in which the combinations of the aperture angle and the focal-point height for an electron beam are different; an index calculating unit that determines a measurement-performance index in the electro-optical conditions set by the condition setting unit; and a condition deriving unit that derives an electro-optical condition, including an aperture angle and a focal-point height, so that the measurement-performance index determined by the index calculating unit becomes a prescribed value.

公开(公告)号：US11302513B2

公开(公告)日：2022-04-12

申请号：US17042290

申请日：2019-04-05

Applicant: Hitachi High-Tech Corporation

Inventor： Takahiro Nishihata ,  Mayuka Osaki ,  Takuma Yamamoto ,  Akira Hamaguchi ,  Yusuke Iida ,  Chihiro Ida

IPC: H01J37/22 ,  G06T7/70 ,  G01N23/203 ,  H01J37/244 ,  G06T7/00 ,  G06T11/00 ,  H01J37/26

Abstract: An electron microscope apparatus includes a detection unit that detects reflected electrons reflected from a sample when the sample is irradiated with primary electrons emitted by a primary electron generation unit (electron gun), an image generation unit that generates an image of a surface of the sample with the reflected electrons based on output from the detection unit, and a processing unit that generates a differential waveform signal of the image generated by the image generation unit, processes the image by using information of the differential waveform signal, and measures a dimension of a pattern formed on the sample.

公开(公告)号：US20210027983A1

公开(公告)日：2021-01-28

申请号：US17043140

申请日：2019-04-05

Applicant: Hitachi High-Tech Corporation

Inventor： Takahiro Nishihata ,  Mayuka Osaki ,  Takuma Yamamoto ,  Akira Hamaguchi ,  Yusuke Iida

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/22

Abstract: A scanning electron microscopy system that includes a primary electron beam radiation unit configured to irradiate a first pattern of a substrate having a second pattern formed in a peripheral region of the first pattern, a detection unit configured to detect back scattered electrons emitted from the substrate, an image generation unit configured to generate an electron beam image corresponding to a strength of the back scattered electrons, a designating unit configured to designate a depth measurement region in which the first pattern exists on the electron beam image, and a processing unit configured to obtain an image signal of the depth measurement region and a pattern density in the peripheral region where the second pattern exists, and to estimate a depth of the first pattern based on the obtained image signal of the depth measurement region and the pattern density in the peripheral region.

公开(公告)号：US11211226B2

公开(公告)日：2021-12-28

申请号：US16810969

申请日：2020-03-06

Applicant: Hitachi High-Tech Corporation

Inventor： Toshiyuki Yokosuka ,  Hirohiko Kitsuki ,  Daisuke Bizen ,  Makoto Suzuki ,  Yusuke Abe ,  Kenji Yasui ,  Mayuka Osaki ,  Hideyuki Kazumi

IPC: H01J37/28 ,  H01J37/22 ,  H01J37/244

Abstract: The present disclosure provides a pattern cross-sectional shape estimation system which includes a charged particle ray device which includes a scanning deflector that scans a charged particle beam, a detector that detects charged particles, and an angle discriminator that is disposed in a front stage of the detector and discriminates charged particles to be detected, and an arithmetic device that generates a luminance of an image, and calculates a signal waveform of a designated region on the image using the luminance. The arithmetic device generates angle discrimination images using signal electrons at different detection angles, and estimates a side wall shape of a measurement target pattern.

公开(公告)号：US11164720B2

公开(公告)日：2021-11-02

申请号：US16747761

申请日：2020-01-21

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Kenji Yasui ,  Mayuka Osaki ,  Makoto Suzuki ,  Hirohiko Kitsuki ,  Toshiyuki Yokosuka ,  Daisuke Bizen ,  Yusuke Abe

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/20 ,  G01N23/2251

Abstract: To measure a depth of a three-dimensional structure, for example, a hole or a groove, formed in a sample without preparing information in advance, an electron microscope detects, among emitted electrons generated by irradiating a sample with a primary electron beam, an emission angle in a predetermined range, the emission angle being formed between an axial direction of the primary electron beam and an emission direction of the emitted electrons, and outputs a detection signal corresponding to the number of the emitted electrons detected. An emission angle distribution of a detection signal is obtained based on a plurality of detection signals, and an opening angle is obtained based on a change point of the emission angle distribution, the opening angle being based on an optical axis direction of the primary electron beam with respect to the bottom portion of the three-dimensional structure.

公开(公告)号：US12142457B2

公开(公告)日：2024-11-12

申请号：US17771551

申请日：2020-10-06

Applicant: Hitachi High-Tech Corporation

Inventor： Takahiro Nishihata ,  Mayuka Osaki ,  Yuji Takagi ,  Takuma Yamamoto ,  Makoto Suzuki

IPC: H01J37/28 ,  H01J37/22 ,  H01J37/244

Abstract: A charged particle beam device 1 includes: a plurality of detectors 7 for detecting a signal particle 9 emitted from a sample 8 irradiated with a charged particle beam 3 and converting the detected signal particle 9 into an output electrical signal 17; an energy discriminator 14 provided for each detector 7 and configured to discriminate the output electrical signal 17 according to energy of the signal particle 9; a discrimination control block 21 for setting an energy discrimination condition of each of the energy discriminators 14; and an image calculation block 22 for generating an image based on the discriminated electrical signal. The discrimination control block 21 sets energy discrimination conditions different from each other among the plurality of energy discriminators 14.

公开(公告)号：US11545336B2

公开(公告)日：2023-01-03

申请号：US17043140

申请日：2019-04-05

Applicant: Hitachi High-Tech Corporation

Inventor： Takahiro Nishihata ,  Mayuka Osaki ,  Takuma Yamamoto ,  Akira Hamaguchi ,  Yusuke Iida

IPC: H01J37/28 ,  H01J37/22 ,  H01J37/244

Abstract: A scanning electron microscopy system that includes a primary electron beam radiation unit configured to irradiate a first pattern of a substrate having a second pattern formed in a peripheral region of the first pattern, a detection unit configured to detect back scattered electrons emitted from the substrate, an image generation unit configured to generate an electron beam image corresponding to a strength of the back scattered electrons, a designating unit configured to designate a depth measurement region in which the first pattern exists on the electron beam image, and a processing unit configured to obtain an image signal of the depth measurement region and a pattern density in the peripheral region where the second pattern exists, and to estimate a depth of the first pattern based on the obtained image signal of the depth measurement region and the pattern density in the peripheral region.

公开(公告)号：US20210012998A1

公开(公告)日：2021-01-14

申请号：US17042290

申请日：2019-04-05

Applicant: Hitachi High-Tech Corporation

Inventor： Takahiro Nishihata ,  Mayuka Osaki ,  Takuma Yamamoto ,  Akira Hamaguchi ,  Yusuke Iida ,  Chihiro Ida

IPC: H01J37/22 ,  H01J37/26 ,  H01J37/244 ,  G01N23/203 ,  G06T7/00 ,  G06T11/00 ,  G06T7/70

Abstract: An electron microscope apparatus includes a detection unit that detects reflected electrons reflected from a sample when the sample is irradiated with primary electrons emitted by a primary electron generation unit (electron gun), an image generation unit that generates an image of a surface of the sample with the reflected electrons based on output from the detection unit, and a processing unit that generates a differential waveform signal of the image generated by the image generation unit, processes the image by using information of the differential waveform signal, and measures a dimension of a pattern formed on the sample.