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公开(公告)号：US20210027983A1
公开(公告)日：2021-01-28
申请号：US17043140
申请日：2019-04-05
IPC分类号： H01J37/28 , H01J37/244 , H01J37/22
摘要： A scanning electron microscopy system that includes a primary electron beam radiation unit configured to irradiate a first pattern of a substrate having a second pattern formed in a peripheral region of the first pattern, a detection unit configured to detect back scattered electrons emitted from the substrate, an image generation unit configured to generate an electron beam image corresponding to a strength of the back scattered electrons, a designating unit configured to designate a depth measurement region in which the first pattern exists on the electron beam image, and a processing unit configured to obtain an image signal of the depth measurement region and a pattern density in the peripheral region where the second pattern exists, and to estimate a depth of the first pattern based on the obtained image signal of the depth measurement region and the pattern density in the peripheral region.
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公开(公告)号：US11302513B2
公开(公告)日：2022-04-12
申请号：US17042290
申请日：2019-04-05
发明人： Takahiro Nishihata , Mayuka Osaki , Takuma Yamamoto , Akira Hamaguchi , Yusuke Iida , Chihiro Ida
IPC分类号： H01J37/22 , G06T7/70 , G01N23/203 , H01J37/244 , G06T7/00 , G06T11/00 , H01J37/26
摘要： An electron microscope apparatus includes a detection unit that detects reflected electrons reflected from a sample when the sample is irradiated with primary electrons emitted by a primary electron generation unit (electron gun), an image generation unit that generates an image of a surface of the sample with the reflected electrons based on output from the detection unit, and a processing unit that generates a differential waveform signal of the image generated by the image generation unit, processes the image by using information of the differential waveform signal, and measures a dimension of a pattern formed on the sample.
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公开(公告)号：US11545336B2
公开(公告)日：2023-01-03
申请号：US17043140
申请日：2019-04-05
IPC分类号： H01J37/28 , H01J37/22 , H01J37/244
摘要： A scanning electron microscopy system that includes a primary electron beam radiation unit configured to irradiate a first pattern of a substrate having a second pattern formed in a peripheral region of the first pattern, a detection unit configured to detect back scattered electrons emitted from the substrate, an image generation unit configured to generate an electron beam image corresponding to a strength of the back scattered electrons, a designating unit configured to designate a depth measurement region in which the first pattern exists on the electron beam image, and a processing unit configured to obtain an image signal of the depth measurement region and a pattern density in the peripheral region where the second pattern exists, and to estimate a depth of the first pattern based on the obtained image signal of the depth measurement region and the pattern density in the peripheral region.
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公开(公告)号：US20210012998A1
公开(公告)日：2021-01-14
申请号：US17042290
申请日：2019-04-05
发明人： Takahiro Nishihata , Mayuka Osaki , Takuma Yamamoto , Akira Hamaguchi , Yusuke Iida , Chihiro Ida
IPC分类号： H01J37/22 , H01J37/26 , H01J37/244 , G01N23/203 , G06T7/00 , G06T11/00 , G06T7/70
摘要： An electron microscope apparatus includes a detection unit that detects reflected electrons reflected from a sample when the sample is irradiated with primary electrons emitted by a primary electron generation unit (electron gun), an image generation unit that generates an image of a surface of the sample with the reflected electrons based on output from the detection unit, and a processing unit that generates a differential waveform signal of the image generated by the image generation unit, processes the image by using information of the differential waveform signal, and measures a dimension of a pattern formed on the sample.
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