公开(公告)号：US20240186108A1

公开(公告)日：2024-06-06

申请号：US17773127

申请日：2019-11-22

Applicant: Hitachi High-Tech Corporation

Inventor： Hirokazu TAMAKI ,  Hiromi MISE

IPC: H01J37/26 ,  G01N23/06 ,  G01N23/2251 ,  H01J37/20 ,  H01J37/21

CPC classification number: H01J37/265 ,  G01N23/06 ,  G01N23/2251 ,  H01J37/20 ,  H01J37/21 ,  H01J2237/1534

Abstract: A charged particle beam system includes a charged particle beam apparatus that irradiates, via a charged particle optical system, a sample with a charged particle beam from a charged particle source and a control system that controls the charged particle ray apparatus. The control system evaluates, with respect to a signal obtained by irradiating the sample with the charged particle beam via the charged particle optical system having an astigmatic aberration, a score based on an index that changes in accordance with a spatial spread of the charged particle beam and determines a positional relation between a height position of the sample and a convergence plane of the charged particle beam based on the astigmatic aberration of the charged particle optical system and a result of the evaluation.

公开(公告)号：US20220216034A1

公开(公告)日：2022-07-07

申请号：US17603440

申请日：2019-04-23

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Takashi DOBASHI ,  Hirokazu TAMAKI ,  Kuniyasu NAKAMURA ,  Hiromi MISE

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/26 ,  H01J37/244

Abstract: A charged particle beam apparatus includes: a movement mechanism; a particle source; an optical element; a detector; and a control mechanism, in which the control mechanism acquires a diffraction pattern including a plurality of Kikuchi lines, calculates a crystal zone axis of the sample by performing analysis based on a plurality of intersections at which two Kikuchi lines included in the diffraction pattern intersect with each other, calculates an inclination angle of the sample based on the crystal zone axis and an irradiation direction of the charged particle beam, and controls the moving mechanism based on the inclination angle.

公开(公告)号：US20230093287A1

公开(公告)日：2023-03-23

申请号：US17795278

申请日：2020-03-26

Applicant: Hitachi High-Tech Corporation

Inventor： Hirokazu TAMAKI

IPC: H01J37/28 ,  H01J37/153 ,  H01J37/21

Abstract: A charged particle beam system includes: a charged particle beam device configured to emit a charged particle beam from a charged particle source to a sample via a charged particle optical system; and a control system configured to control the charged particle beam device. The control system scans the sample with the charged particle beam in a manner of forming a scan trajectory and determines scores of signal intensities associated with different scan directions in the scan trajectory. The control system generates, based on a relation between the scores and the different scan directions, information on at least one of a focus deviation and an aberration coefficient of the charged particle optical system.

公开(公告)号：US20220230844A1

公开(公告)日：2022-07-21

申请号：US17608651

申请日：2019-05-23

Applicant: Hitachi High-Tech Corporation

Inventor： Takashi DOBASHI ,  Hirokazu TAMAKI ,  Hiromi MISE ,  Shuntaro ITO

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/20 ,  H01J37/26 ,  H01J37/22

Abstract: A charged particle beam apparatus includes a movement mechanism, a particle source, an optical element, a detector, and a control mechanism configured to control, based on an observation condition, the movement mechanism, the particle source, the optical element, and the detector. The control mechanism is configured to acquire a diffraction pattern image including a plurality of Kikuchi lines as a comparison image after inclining the movement mechanism by a first angle, evaluate an error between an inclination angle of the sample and a target inclination angle using a reference image of a reference diffraction pattern and the comparison image, and control inclination of the movement mechanism based on an evaluation result.

公开(公告)号：US20240420915A1

公开(公告)日：2024-12-19

申请号：US18705611

申请日：2022-03-31

Applicant: Hitachi High-Tech Corporation

Inventor： Mihiro TAKASAKI ,  Hirokazu TAMAKI

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/26 ,  H01J37/28

Abstract: There is provided a charged particle beam device including an aberration corrector including a transmission lens disposed between a first multipole and a second multipole in order to correct five-fold fourth-order astigmatism (A4) while maintaining correction of four-fold third-order astigmatism (A3), and the charged particle beam device further includes: a first deflector configured to adjust an angle θ1 between a charged particle beam incident on the first multipole and an optical axis; a second deflector configured to adjust an angle θ2 between a charged particle beam incident on the second multipole and the optical axis; and a control unit configured to control the first deflector and the second deflector. The control unit changes the angle θ1 so as to correct the five-fold fourth-order astigmatism, and changes the angle θ2 so as to correct the four-fold third-order astigmatism that occurs due to a change in the angle θ1.

公开(公告)号：US20240006148A1

公开(公告)日：2024-01-04

申请号：US18031358

申请日：2021-01-12

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Hirokazu TAMAKI ,  Yudai KUBO

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/141

CPC classification number: H01J37/153 ,  H01J2237/1534 ,  H01J37/141 ,  H01J37/1471

Abstract: An aberration corrector includes: a first multipole and a second multipole configured to form a hexapole field; and a transfer optics including a plurality of round lenses. The transfer optics is disposed between the first multipole and the second multipole, and acts on a charged particle beam such that an absolute value of a slope of the charged particle beam passing through the first multipole is different from an absolute value of a slope of the charged particle beam passing through the second multipole.

公开(公告)号：US20220005667A1

公开(公告)日：2022-01-06

申请号：US17279041

申请日：2018-10-10

Applicant: Hitachi High-Tech Corporation

Inventor： Hirokazu TAMAKI

IPC: H01J37/21 ,  H01J37/22

Abstract: A control system of a charged particle beam apparatus obtains a first coefficient by performing multiple resolution analysis based on wavelet transform or discrete wavelet transform on at least a part of an image or a signal acquired by the charged particle beam apparatus. The control system obtains a second coefficient by performing, on at least a part of the first coefficient or an absolute value of the first coefficient, any one of calculation of a maximum value, calculation of a numerical value corresponding to a specified order in an order related to a magnitude, fitting to a histogram, calculation of an average value, and calculation of a total sum.