Abstract:
The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.
Abstract:
The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.
Abstract:
The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.
Abstract:
The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.
Abstract:
The present invention relates to a black resist composition for color filter which contains titanium black (A) with an average primary particle size of 100 nm, carbon black (B) with an average primary particle size of 60 nm or less, an acrylic copolymer dispersant (C) with an amino group and/or a quaternary ammonium salt, an organic solvent (D) and a binder resin (E) with a carboxyl group and an ethylenic unsaturated group, where the ratio in mass between the titanium black (A) and the titanium black (B) is 100:5 to 1000. According to the black resist composition for color filter of the present invention, patterns can readily be formed by photolithography, and the composition has high light resistance and high insulation property, and can be made into a thin film to attain sufficient sensitivity and resolution property.
Abstract:
There are provided a novel curable polymer compound of the present invention comprises having a structure represented by the following Formula (I): CH2═C(R1)COO(R2O)nCH2CH(OH)CH2OOC— Formula (I) wherein R1 represents a hydrogen atom or a methyl group, R2 independently has one or more organic residues selected from the group consisting of an alkylene group, a branched alkylene group, an alkenylene group, a branched alkenylene group, a cycloalkylene group, a cycloalkenylene group and an arylene group, and n represents an integer of 0 to 1, a method of preparing the polymer compound, a radical polymerizable and curable composition using the polymer compound, and a cured product obtained by photo-curing the radical polymerizable and curable composition.
Abstract:
The present invention is directed to a hardening composition comprising silica fine particles (a), a (meth)acrylate (b) having two or more ethylenically unsaturated groups and being free from cyclic structure, a (meth)acrylate (c) having an ethylenically unsaturated group and having an alicyclic structure, a polymerization initiator (d) and black inorganic fine particles (e), wherein the silica fine particles (a) are surface-treated with a silane compound (f) represented by the following general formula (1) and a silane compound (g) represented by the following general formula (2): (in the formula (1), R1 represents a hydrogen atom or a methyl group, R2 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group, R3 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; q represents an integer of 1 to 6; and r represents an integer of 0 to 2, (in the formula (2), R4 is an alkyl group having 1 to 3 carbon atoms or a phenyl group which may have a substituent; R5 is a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; s is an integer of 0 to 6; and t is an integer of 0 to 2.
Abstract:
There are provided a novel ethylenically unsaturated group-containing isocyanate compound, a process for producing the same, and a reactive monomer produced from the isocyanate compound, a reactive polymer and its use. The ethylenically unsaturated group-containing isocyanate compound according to the present invention is represented by formula (I).
Abstract:
A light decolorizable recording material comprising a colored dye having absorptions in the visible light region and a boron compound represented by the general formula (1), ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each independently represents an alkyl, aryl, allyl, aralkyl, alkenyl, alkynyl, silyl, heterocyclic, substituted alkyl, substituted aryl, substituted allyl, substituted aralkyl, substituted alkenyl, substituted alkynyl or substituted silyl group, and Z.sup.+ represents a quaternary ammonium, quaternary pyridinium, quaternary quinolinium or phosphonium cation.
Abstract:
The present invention relates to epoxy resin coating composition which comprises, at least, epoxy resin, a thiol-type curing agent and a curing assistant, being composed of two liquids of liquid (A) containing epoxy resin and a thiol-type curing agent and liquid (B) containing a curing assistant, which liquids are mixed just before using, wherein the thiol-type curing agent contains a branched compound containing a thiol group (P), which compound is an ester of polyhydric alcohol with thiol group-containing carboxylic acid represented by formula (1) HOCO(CH2)nCR1R2SH (1) (in the formula, R1 represents a hydrogen atom or a linear or branched alkyl group having 1 to 10 carbon atoms, R2 represents a linear or branched alkyl group having 1 to 10 carbon atoms, and n represents an integer of 1 to 4), which exhibits a suitable pot life, excellent curability particularly at low and ordinary temperature and low toxicity.