公开(公告)号：US20140197313A1

公开(公告)日：2014-07-17

申请号：US14215209

申请日：2014-03-17

申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

发明人： Noritsugu TAKAHASHI ,  Muneyuki FUKUDA ,  Manabu YANO ,  Hirohiko KITSUKI ,  Kazunari ASAO ,  Tomoyasu SHOJO

IPC分类号： H01J37/28 ,  H01J37/10

CPC分类号： H01J37/28 ,  H01J37/10 ,  H01J37/145 ,  H01J37/21 ,  H01J2237/2817

摘要： A charged-particle-beam device is characterized in having a control value for an aligner coil (29) being determined by: a coil current and an electrode applied-voltage at a control value for objectives (30, 31), which is an electromagnetic-field superposition lens; a control value for image-shift coils (27, 28); and the acceleration voltage of the charged-particle-beam. By doing this, it has become possible to avoid image disturbances that occur on images to be displayed at boundaries between charged areas and non-charged areas, and provide a charged-particle-beam device that obtains clear images without any unevenness in brightness.

摘要翻译： 带电粒子束装置的特征在于具有对准线圈（29）的控制值，通过以下方式确定：线圈电流和用于物镜（30,31）的控制值的电极施加电压，其为电磁 场叠加透镜; 用于图像转换线圈（27,28）的控制值; 和带电粒子束的加速电压。 通过这样做，可以避免在充电区域和非充电区域之间的边界处显示图像上出现的图像干扰，并且提供获得清晰图像而没有任何亮度不均匀的带电粒子束装置。

公开(公告)号：US20170092459A1

公开(公告)日：2017-03-30

申请号：US15310438

申请日：2015-04-28

申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

发明人： Noritsugu TAKAHASHI ,  Yasunari SOHDA ,  Wataru MORI ,  Yuko SASAKI ,  Hajime KAWANO

IPC分类号： H01J37/05 ,  H01J37/12 ,  H01J37/153 ,  H01J37/244 ,  H01J37/21

CPC分类号： H01J37/05 ,  H01J37/12 ,  H01J37/147 ,  H01J37/153 ,  H01J37/21 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/2448

摘要： A charged-particle-beam device used for measuring the dimensions, etc., of fine circuit patterns in a semiconductor manufacturing process, wherein corrections are made in the defocusing and astigmatism generated during changes in the operating conditions of a Wien filter acting as a deflector of secondary signals such as secondary electrons, and the display dimensions of obtained images are kept constant. In the charged-particle-beam device, the Wien filter (23) is arranged between a detector and a lens (11) arranged on the test-sample side among two stages of lenses for converging a charged-particle beam, and a computing device (93) is provided for the interlocked control of the Wien filter (23) and a lens (12) arranged on the charged-particle-source side among the two stages of lenses.

公开(公告)号：US20190206654A1

公开(公告)日：2019-07-04

申请号：US16325662

申请日：2016-08-31

申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION

发明人： Noritsugu TAKAHASHI ,  Makoto SAKAKIBARA ,  Wataru MORI ,  Hajime KAWANO ,  Yuko SASAKI

IPC分类号： H01J37/12 ,  H01J37/20 ,  H01J37/21 ,  H01J37/244 ,  H01J37/141

摘要： A measuring device for measuring a sample by emitting a charged particle beam includes a particle source, an electronic lens, a detector, a stage, a sensor for measuring the environment, and a control device, in which the control device includes a control module having a height calculation module configured to calculate a height estimation value indicating an estimated height of the sample at a measurement position; and a correction value calculation module configured to calculate a correction value reflecting a change of the environment based on the measurement position of the sample and an amount of change of the environment measured by the sensor, and the control module corrects the height estimation value based on the correction value, and sets a control value for controlling focus adjustment using the electronic lens based on the corrected height estimation value.

公开(公告)号：US20170018394A1

公开(公告)日：2017-01-19

申请号：US15123828

申请日：2015-02-04

申请人： Hitachi High-Technologies Corporation

发明人： Yasunari SOHDA ,  Takeyoshi OHASHI ,  Takafumi MIWA ,  Noritsugu TAKAHASHI ,  Hajime KAWANO

IPC分类号： H01J37/05 ,  H01J37/29 ,  H01J37/145 ,  H01J37/26

CPC分类号： H01J37/05 ,  H01J37/145 ,  H01J37/21 ,  H01J37/263 ,  H01J37/28 ,  H01J37/292 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/24514

摘要： A scanning electron microscope according to the present invention includes: an electron source that produces an electron beam; a trajectory dispersion unit that disperses the trajectory of an electron beam of electrons with a different energy value; a selection slit plate having a selection slit that selects the energy range of the dispersed electron beam; and a transmittance monitoring unit that monitors the transmittance of an electron beam, which is being transmitted through the selection slit. Accordingly, there can be provided a scanning electron microscope equipped with an energy filter that implements a stable reduction in energy distribution.

摘要翻译： 根据本发明的扫描电子显微镜包括：产生电子束的电子源; 轨迹分散单元，其分散具有不同能量值的电子束的轨迹; 选择狭缝板，其具有选择所述分散电子束的能量范围的选择狭缝; 以及透射率监视单元，其监视通过选择狭缝传输的电子束的透射率。 因此，可以提供一种装有能量过滤器的扫描电子显微镜，能够实现能量分布的稳定降低。

公开(公告)号：US20140326879A1

公开(公告)日：2014-11-06

申请号：US14334837

申请日：2014-07-18

申请人： Hitachi High-Technologies Corporation

发明人： Muneyuki FUKUDA ,  Naomasa SUZUKI ,  Tomoyasu SHOJO ,  Noritsugu TAKAHASHI

IPC分类号： H01J37/28

CPC分类号： H01J37/28 ,  G01N23/225 ,  H01J37/145 ,  H01J2237/21 ,  H01J2237/28

摘要： A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.

摘要翻译： 电磁叠加型物镜的下极片分为上磁路和下磁路。 几乎等于延迟电压的电压被施加到下磁路。 提供了能够获得具有比常规图像更高分辨率和更高对比度的图像的物镜。 电磁叠加型物镜包括包围线圈的磁路，围绕电子束的圆柱形或锥形增强器磁路，介于线圈和样品之间的控制磁路，加速电场控制单元，其加速 使用升压电源的电子束，使用级电源减速电子束的减速电场控制部，以及抑制使用控制磁路电源对样品进行放电的抑制部。

公开(公告)号：US20150348747A1

公开(公告)日：2015-12-03

申请号：US14759782

申请日：2013-12-11

申请人： Hitachi High-Technologies Corporation

发明人： Takeyoshi OHASHI ,  Yasunari SOHDA ,  Noritsugu TAKAHASHI ,  Hajime KAWANO ,  Osamu KOMURO

IPC分类号： H01J37/22 ,  H01J37/20 ,  H01J37/147 ,  H01J37/28

CPC分类号： H01J37/222 ,  H01J37/1472 ,  H01J37/1475 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/1536 ,  H01J2237/221 ,  H01J2237/2448 ,  H01J2237/2806 ,  H01J2237/2809 ,  H01J2237/2817

摘要： This charged-particle beam device changes conditions for combining an intensity ratio between upper and lower deflectors and rotation angles of the deflectors in multiple ways when obtaining images having different pixel sizes in the vertical and horizontal directions. Then, the charged-particle beam device determines an optimal intensity ratio between the upper and lower deflectors and rotation angles of the deflectors on the basis of variations in size value measured in the larger pixel size direction (Y-direction) of the image. As a result, it is possible to extend the field of view in the Y-direction while reducing deflection aberrations when measuring at high precision in the X-direction.

摘要翻译： 当获得在垂直和水平方向上具有不同像素尺寸的图像时，该带电粒子束装置改变用于以多种方式组合上偏导器和下偏转器之间的强度比和偏转器的旋转角度的条件。 然后，带电粒子束装置基于在图像的较大像素尺寸方向（Y方向）上测量的尺寸值的变化，确定偏转器的上下偏转器之间的最佳强度比和偏转器的旋转角度。 结果，可以在X方向上以高精度测量的同时在Y方向上延伸视场，同时减少偏转像差。