Charged Particle Beam Device and Method for Adjusting Charged Particle Beam Device
    1.
    发明申请
    Charged Particle Beam Device and Method for Adjusting Charged Particle Beam Device 审中-公开
    带电粒子束装置及调整带电粒子束装置的方法

    公开(公告)号:US20160118218A1

    公开(公告)日:2016-04-28

    申请号:US14896753

    申请日:2014-04-04

    CPC classification number: H01J37/265 H01J37/09 H01J37/20 H01J37/28

    Abstract: The present invention relates to enabling a versatile charged particle beam device, which is used for a wide range of kinds of samples to be observed and has parameters of emission conditions of a primary charged particle beam that is difficult to be registered in advance, to be operated easily and accurately even by a less-experienced operator and to obtain high-resolution images. A charged particle beam device according to the present invention includes, for example: a charged particle source, a focusing lens for a primary charged particle beam emitted from the charged particle source, an objective lens for focusing the primary charged particle beam, a movable objective aperture having multiple objective apertures disposed on a side of the charged particle source with respect to the objective lens, a detector of a secondary signal from the sample resulting from emission of the primary charged particle beam, a display unit configured to process and display a detected secondary signal, and a storage unit configured to store multiple emission conditions of the primary particle beam. The operation controller makes one emission condition be selected, determines whether or not the objective aperture is suitable for the selected emission condition, displays that the objective aperture is unsuitable when the objective aperture is unsuitable, and preadjusts the primary charged particle beam according to the selected emission condition and stores the preadjustment result as parameters for the emission conditions when the objective aperture is suitable.

    Abstract translation: 本发明涉及能够实现通用的带电粒子束装置,其用于待观察的各种样品的样品,并且具有难以预先登记的初级带电粒子束的发射条件的参数为 即使经验较少的操作员也能轻松准确地操作,并获得高分辨率图像。 根据本发明的带电粒子束装置包括:带电粒子源,用于从带电粒子源发射的初级带电粒子束的聚焦透镜,用于聚焦初级带电粒子束的物镜,可移动物镜 具有设置在所述带电粒子源相对于所述物镜的一侧上的多个目标孔的孔,来自所述主要带电粒子束的发射产生的样本的次级信号的检测器,被配置为处理和显示检测到的 辅助信号和被配置为存储一次粒子束的多个发射条件的存储单元。 操作控制器选择一个发射条件,确定物镜孔径是否适合所选择的发射条件,当物镜孔径不合适时显示物镜孔径不合适,并且根据所选择的预先调整初级带电粒子束 发射条件,并将预调整结果作为目标孔径适合的发射条件的参数存储。

    Charged Particle Beam Apparatus and Sample Observation Method

    公开(公告)号:US20190279838A1

    公开(公告)日:2019-09-12

    申请号:US16345520

    申请日:2016-11-22

    Abstract: In the case of an in situ observation with a charged particle beam apparatus, an observer who is not an expert in the charged particle beam apparatus needs to maintain the field of view of the observation that changes from moment to moment while watching a monitor, and thus, adjustment of the field of view needs to be controllable in real time with a good operability. In order to eliminate the need for an observer to move the line of sight, a live image and a comparison image are overlapped and displayed. At this time, an interface is devised, such that overlapping of two images can be executed without giving stress to the observer. The observer presses a button on an operation screen, thereby displaying a superimposed image, which is obtained by making the comparison image matching the size of a first display area configured to display the live image translucent and superimposing the translucent comparison image on the live image, at the position of the first display area of the image display device.

    Charged Particle Beam Device and Charged Particle Beam Device Control Method
    3.
    发明申请
    Charged Particle Beam Device and Charged Particle Beam Device Control Method 有权
    带电粒子束装置和带电粒子束装置控制方法

    公开(公告)号:US20160203947A1

    公开(公告)日:2016-07-14

    申请号:US15023456

    申请日:2014-10-07

    Abstract: The objective of the present invention is to provide a charged particle beam device, wherein the positional relationship between reflected electron detection elements and a sample and the vacuum state of the sample surroundings are evaluated to select automatically a reflected electron detection element appropriate for acquiring an intended image. In this charged particle beam device, all the reflected electron detection elements are selected when the degree of vacuum inside the sample chamber is high and the sample is distant from the reflected electron detectors, while a reflected electron detection element appropriate for acquiring a compositional image or a height map image is selected when the degree of vacuum inside the sample chamber is high and the sample is close to the reflected electron detectors. When the degree of vacuum inside the sample chamber is low, all the reflected electron detection elements are selected.

    Abstract translation: 本发明的目的是提供一种带电粒子束装置,其中评估反射电子检测元件与样品之间的位置关系和样品周围的真空状态,以自动选择适于获得预期的反射电子检测元件 图片。 在该带电粒子束装置中,当样品室内的真空度高且样品远离反射的电子检测器时,选择所有的反射电子检测元件,而反射的电子检测元件适于获得组成图像或 当样品室内的真空度高且样品接近反射的电子检测器时,选择高度图图像。 当样品室内的真空度低时,选择所有的反射电子检测元件。

Patent Agency Ranking