Manufacturing method for solid-state imaging device and solid-state imaging device

    公开(公告)号:US10068800B2

    公开(公告)日:2018-09-04

    申请号:US14407633

    申请日:2013-02-21

    Abstract: A method for manufacturing a solid-state imaging device comprises a first step of preparing an imaging element having a second principal surface having an electrode arranged thereon, and a photoelectric converter part configured to photoelectrically convert the incident energy line so as to generate a signal charge; a second step of preparing a support substrate, provided with a through hole extending in a thickness direction thereof, having a third principal surface; a third step of aligning the imaging element and the support substrate with each other so that the electrode is exposed out of the through hole while the second and third principal surfaces oppose each other and joining the imaging element and the support substrate to each other; and a fourth step of arranging a conductive ball-shaped member in the through hole and electrically connecting the ball-shaped member to the electrode after the third step.

    MANUFACTURING METHOD FOR SOLID-STATE IMAGING DEVICE AND SOLID-STATE IMAGING DEVICE
    2.
    发明申请
    MANUFACTURING METHOD FOR SOLID-STATE IMAGING DEVICE AND SOLID-STATE IMAGING DEVICE 审中-公开
    固态成像装置和固态成像装置的制造方法

    公开(公告)号:US20150187649A1

    公开(公告)日:2015-07-02

    申请号:US14407633

    申请日:2013-02-21

    Abstract: A method for manufacturing a solid-state imaging device comprises a first step of preparing an imaging element having a second principal surface having an electrode arranged thereon, and a photoelectric converter part configured to photoelectrically convert the incident energy line so as to generate a signal charge; a second step of preparing a support substrate, provided with a through hole extending in a thickness direction thereof, having a third principal surface; a third step of aligning the imaging element and the support substrate with each other so that the electrode is exposed out of the through hole while the second and third principal surfaces oppose each other and joining the imaging element and the support substrate to each other; and a fourth step of arranging a conductive ball-shaped member in the through hole and electrically connecting the ball-shaped member to the electrode after the third step.

    Abstract translation: 一种制造固态成像装置的方法包括:准备具有布置在其上的具有电极的第二主表面的成像元件的第一步骤和被配置为对入射能量线进行光电转换以产生信号电荷的光电转换器部分 ; 制备具有沿其厚度方向延伸的通孔的支撑基板的第二步骤,具有第三主表面; 第三步骤,使成像元件和支撑基板彼此对准,使得电极从通孔露出,同时第二和第三主表面彼此相对并且将成像元件和支撑基板彼此接合; 以及第四步骤,在所述通孔中布置导电球形构件,并且在所述第三步骤之后将所述球形构件电连接到所述电极。

    MANUFACTURING METHOD FOR SOLID-STATE IMAGING DEVICE AND SOLID-STATE IMAGING DEVICE
    5.
    发明申请
    MANUFACTURING METHOD FOR SOLID-STATE IMAGING DEVICE AND SOLID-STATE IMAGING DEVICE 有权
    固态成像装置和固态成像装置的制造方法

    公开(公告)号:US20150137301A1

    公开(公告)日:2015-05-21

    申请号:US14406851

    申请日:2013-02-21

    Abstract: A method for manufacturing a solid-state imaging device comprises a first step of preparing an imaging element including a second principal surface having an electrode arranged thereon, and a photoelectric converter part configured to photoelectrically convert the incident energy line so as to generate a signal charge; a second step of preparing a support substrate, provided with at least one through hole extending in a thickness direction thereof, having a third principal surface; a third step of aligning the imaging element and the support substrate with each other so that the one electrode is exposed out of the one through hole while the second and third principal surfaces oppose each other and joining the imaging element and the support substrate to each other; and a fourth step of embedding a conductive member in the through hole after the third step.

    Abstract translation: 一种制造固态成像装置的方法包括:准备包括其上布置有电极的第二主表面的成像元件的第一步骤和被配置为对入射的能量线进行光电转换以产生信号电荷的光电转换器部分 ; 制备具有至少一个沿其厚度方向延伸的通孔的支撑衬底的第二步骤,具有第三主表面; 使成像元件和支撑基板彼此对准的第三步骤,使得一个电极从一个通孔露出,同时第二和第三主表面彼此相对并且将成像元件和支撑基板彼此接合 ; 以及在第三步骤之后将通孔嵌入到通孔中的第四步骤。

    Manufacturing method for solid-state imaging device and solid-state imaging device

    公开(公告)号:US10825730B2

    公开(公告)日:2020-11-03

    申请号:US16000603

    申请日:2018-06-05

    Abstract: A method for manufacturing a solid-state imaging device comprises a first step of preparing an imaging element having a second principal surface having an electrode arranged thereon, and a photoelectric converter part configured to photoelectrically convert the incident energy line so as to generate a signal charge; a second step of preparing a support substrate, provided with a through hole extending in a thickness direction thereof, having a third principal surface; a third step of aligning the imaging element and the support substrate with each other so that the electrode is exposed out of the through hole while the second and third principal surfaces oppose each other and joining the imaging element and the support substrate to each other; and a fourth step of arranging a conductive ball-shaped member in the through hole and electrically connecting the ball-shaped member to the electrode after the third step.

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