Invention Grant
- Patent Title: Manufacturing method for solid-state imaging device and solid-state imaging device
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Application No.: US14407633Application Date: 2013-02-21
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Publication No.: US10068800B2Publication Date: 2018-09-04
- Inventor: Yasuhito Yoneta , Ryoto Takisawa , Shingo Ishihara , Hisanori Suzuki , Masaharu Muramatsu
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2012-136198 20120615
- International Application: PCT/JP2013/054392 WO 20130221
- International Announcement: WO2013/187086 WO 20131219
- Main IPC: H01L31/0203
- IPC: H01L31/0203 ; H01L21/77 ; H01L27/146 ; H04N5/369

Abstract:
A method for manufacturing a solid-state imaging device comprises a first step of preparing an imaging element having a second principal surface having an electrode arranged thereon, and a photoelectric converter part configured to photoelectrically convert the incident energy line so as to generate a signal charge; a second step of preparing a support substrate, provided with a through hole extending in a thickness direction thereof, having a third principal surface; a third step of aligning the imaging element and the support substrate with each other so that the electrode is exposed out of the through hole while the second and third principal surfaces oppose each other and joining the imaging element and the support substrate to each other; and a fourth step of arranging a conductive ball-shaped member in the through hole and electrically connecting the ball-shaped member to the electrode after the third step.
Public/Granted literature
- US20150187649A1 MANUFACTURING METHOD FOR SOLID-STATE IMAGING DEVICE AND SOLID-STATE IMAGING DEVICE Public/Granted day:2015-07-02
Information query
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