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公开(公告)号:US20160093630A1
公开(公告)日:2016-03-31
申请号:US14964907
申请日:2015-12-10
发明人: Shyue Seng (Jason) TAN , Eng Huat TOH , Elgin QUEK
IPC分类号: H01L27/115 , G11C16/26 , H01L29/78 , H01L29/423 , H01L29/788 , G11C16/14 , G11C16/04
CPC分类号: H01L27/11521 , G11C16/0408 , G11C16/0425 , G11C16/14 , G11C16/26 , H01L29/40114 , H01L29/42328 , H01L29/66795 , H01L29/66825 , H01L29/7851 , H01L29/7881
摘要: A split gate memory cell is fabricated with a fin structure between a memory gate stack and a select gate. Embodiments include a first channel region under the memory gate stack and a second channel region under the select gate.
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公开(公告)号:US20160268387A1
公开(公告)日:2016-09-15
申请号:US14643558
申请日:2015-03-10
IPC分类号: H01L29/423 , H01L29/10 , H01L29/788
CPC分类号: H01L29/42328 , H01L29/1033 , H01L29/42336 , H01L29/42344 , H01L29/42352
摘要: A split gate memory cell is fabricated with a word gate extending below an upper surface of a substrate having the channel region. An embodiment includes providing a band engineered channel with the word gate extending there through. Another embodiment includes forming a buried channel with the word gate extending below the buried channel.
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