Magnetoresistive devices and methods of fabricating magnetoresistive devices

    公开(公告)号:US11502247B2

    公开(公告)日:2022-11-15

    申请号:US17134683

    申请日:2020-12-28

    摘要: A method of manufacturing a magnetoresistive device may comprise forming a first magnetic region, an intermediate region, and a second magnetic region of a magnetoresistive stack above a via; removing at least a portion of the second magnetic region using a first etch; removing at least a portion of the intermediate region and at least a portion of the first magnetic region using a second etch; removing at least a portion of material redeposited on the magnetoresistive stack using a third etch; and rendering at least a portion of the redeposited material remaining on the magnetoresistive stack electrically non-conductive.

    Magnetoresistive devices and methods therefor

    公开(公告)号:US11264564B2

    公开(公告)日:2022-03-01

    申请号:US16783740

    申请日:2020-02-06

    IPC分类号: H01L43/08 H01L43/02 H01L43/10

    摘要: A magnetoresistive device may include one or more electrodes or electrically conductive lines and a fixed region and a free region disposed between the electrodes or electrically conductive lines. The fixed region may have a fixed magnetic state and the free region may be configured to have a first magnetic state and a second magnetic state. The free region may store a first value when in the first magnetic state and store a second value when in the second magnetic state. The magnetoresistive device may further include a dielectric layer between the free region and the fixed region and a spin-Hall (SH) material proximate to at least a portion of the free region. An insertion layer may be disposed between the SH material and the free region.