公开(公告)号：US11680183B2

公开(公告)日：2023-06-20

申请号：US16967447

申请日：2019-03-11

Applicant: Dow Global Technologies LLC

Inventor： Cheng Shen ,  Jing Ji ,  Qi Jiang

IPC: C09D133/08 ,  C09D7/65 ,  C09D5/02

CPC classification number: C09D133/08 ,  C09D5/024 ,  C09D7/65

Abstract: Embodiments of the present invention relate to aqueous coating compositions and to methods for improving the freeze/thaw stability of aqueous coating compositions. In one aspect, an aqueous coating composition comprises an aqueous polymeric dispersion and a compound according to Formula (1) as described herein.

公开(公告)号：US11349115B2

公开(公告)日：2022-05-31

申请号：US17050101

申请日：2018-04-27

Applicant: Dow Global Technologies LLC ,  Dow Chemical Korea Limited

Inventor： Xin Jiang ,  Qi Jiang ,  Hua Ren ,  Jianhai Mu ,  Eungkyu Kim ,  Kaoru Ohba ,  Jong-Cheol Kim

IPC: H01M4/139 ,  H01M4/62 ,  H01M10/0525 ,  H01M4/131 ,  H01M4/1391 ,  H01M4/04 ,  H01M4/02

Abstract: In the process of producing a lithium ion battery, one or more compounds of Formula 1, 2, 3 or 4 (e.g., N,N-dimethylpropionamide), is used as the solvent in the step of forming a slurry from an active material (e.g., lithium cobalt oxide), a conductive agent (e.g., carbon black), and a binder polymer (e.g., polyvinylidene fluoride).

公开(公告)号：US20210083266A1

公开(公告)日：2021-03-18

申请号：US17050101

申请日：2018-04-27

Applicant: Dow Global Technologies LLC ,  Dow Chemical Korea Limited

Inventor： Xin Jiang ,  Qi Jiang ,  Hua Ren ,  Jianhai Mu ,  Eungkyu Kim ,  Kaoru Ohba ,  Jong-Cheol Kim ,  Zhuo Wang

IPC: H01M4/139 ,  H01M10/0525 ,  H01M4/62

Abstract: In the process of producing a lithium ion battery, one or more compounds of Formula 1, 2, 3 or 4 (e.g., N,N-dimethylpropionamide), is used as the solvent in the step of forming a slurry from an active material (e.g., lithium cobalt oxide), a conductive agent (e.g., carbon black), and a binder polymer (e.g., polyvinylidene fluoride).

公开(公告)号：US20250040540A1

公开(公告)日：2025-02-06

申请号：US18723773

申请日：2022-03-31

Applicant: Dow Global Technologies LLC

Inventor： Qi Jiang ,  Xue Chen

IPC: A01N33/08 ,  A01P1/00 ,  C10M133/08 ,  C10M159/00 ,  C10N30/16

Abstract: The present invention describes a water-based metal working fluid comprising a base oil, an organic acid, optionally emulsifiers, a concentrate additive, water and a microbial growth control agent which comprises an aminopropanediol.

公开(公告)号：US10731114B2

公开(公告)日：2020-08-04

申请号：US15544310

申请日：2017-01-20

Applicant: Dow Global Technologies LLC

Inventor： Qi Jiang ,  Xin Jiang ,  Hua Ren ,  Eungkyu Kim ,  Jianhai Mu ,  Kaoru Ohba

IPC: C11D7/32 ,  C11D7/34 ,  C11D7/26 ,  C11D7/50 ,  C11D11/00 ,  G03F7/42 ,  C11D3/43 ,  C11D3/34 ,  C11D3/36 ,  C11D3/20 ,  C11D3/32 ,  C11D3/28

Abstract: Solvents useful for removing, among other things, photoresists and poly(amic acid)/polyimide from display/semiconductor substrates or electronic processing equipment, consist essentially of: (A) a first component consisting of a sulfoxide, e.g., DMSO; (B) a second component consisting of a glycol ether, e.g., ethylene glycol monobutyl ether; and (C) a third component consisting of at least one of N-formyl morpholine, N,N-dimethyl propionamide, 3-methoxy-N,N-dimethyl propanamide, triethyl phosphate, N,N-dimethyl acetamide; N,N-diethyl acetamide, N,N-diethyl propionamide, N-methyl acetamide, N-methyl propionamide, N-ethyl acetamide, and N-ethyl propionamide.

公开(公告)号：US20200150542A1

公开(公告)日：2020-05-14

申请号：US16628598

申请日：2017-07-06

Applicant: Dow Global Technologies LLC

Inventor： Qi Jiang ,  Xin Jiang ,  Hua Ren ,  Eungkyu Kim ,  Jianhai Mu ,  Kaoru Ohba ,  William J. Harris

IPC: G03F7/42 ,  C11D7/32

Abstract: A solvent consisting essentially of: (A) a first component consisting of N,N-diethylacetamide (DEAC); (B) a second component consisting of 3-methoxy-N, N-dimethyl propionamide (M3DMPA); and (C) an optional third component consisting of one or more glycol ethers or glycol ether acetates; or a solvent consisting essentially of: (1) a first component consisting of one or more acyclic amides of Formula (I): and (2) an optional second component consisting of one or more of DEAC, M3DMPA, N,N-dimethylpropionamide, one or more glycol ethers or glycol ether acetates, and one or more cyclic amides of Formulae (II-IV).

公开(公告)号：US20250059457A1

公开(公告)日：2025-02-20

申请号：US18723493

申请日：2022-03-31

Applicant: Dow Global Technologies LLC

Inventor： Qi Jiang ,  Chao Zhao ,  Xue Chen ,  Yong Zhao

IPC: C10M133/08 ,  C10M101/00 ,  C10M129/16 ,  C10M129/42 ,  C10M135/10 ,  C10M141/08 ,  C10M159/08 ,  C10M163/00 ,  C10M169/04 ,  C10N20/00 ,  C10N30/12 ,  C10N30/16 ,  C10N40/22 ,  C10N50/00

Abstract: The present invention describes a water based semi-synthetic metal working fluid comprising a base oil, an organic acid, emulsifiers, a concentrate additive, water and a microbial growth control agent which comprises an alky alcohol amine.

公开(公告)号：US11016392B2

公开(公告)日：2021-05-25

申请号：US16628598

申请日：2017-07-06

Applicant: Dow Global Technologies LLC

Inventor： Qi Jiang ,  Xin Jiang ,  Hua Ren ,  Eungkyu Kim ,  Jianhai Mu ,  Kaoru Ohba ,  William J. Harris

IPC: C11D7/50 ,  G03F7/42 ,  C11D7/32

Abstract: A solvent consisting essentially of: (A) a first component consisting of N,N-diethylacetamide (DEAC); (B) a second component consisting of 3-methoxy-N, N-dimethyl propionamide (M3DMPA); and (C) an optional third component consisting of one or more glycol ethers or glycol ether acetates; or a solvent consisting essentially of: (1) a first component consisting of one or more acyclic amides of Formula (I): and (2) an optional second component consisting of one or more of DEAC, M3DMPA, N,N-dimethylpropionamide, one or more glycol ethers or glycol ether acetates, and one or more cyclic amides of Formulae (II-IV).

公开(公告)号：US10982047B2

公开(公告)日：2021-04-20

申请号：US16336568

申请日：2016-09-28

Applicant: Dow Global Technologies LLC

Inventor： Eungkyu Kim ,  William J. Harris ,  Qi Jiang ,  Xin Jiang ,  Kaoru Ohba

IPC: C08G73/10

Abstract: The process for synthesizing a poly(amic acid) polymer or a polyimide polymer is improved by using a solvent system consisting essentially of: (A) a first component consisting essentially of at least one of a sulfoxide, e.g., DMSO, and an alkyl phosphate, e.g., triethyl phosphate, and (B) optionally, a second component consisting essentially of at least one aprotic glycol ether, e.g., dipropylene glycol dimethyl ether.

公开(公告)号：US20190219925A1

公开(公告)日：2019-07-18

申请号：US16336307

申请日：2016-09-28

Applicant: Dow Global Technologies LLC

Inventor： Qi Jiang ,  Hua Ren ,  Xin Jiang ,  Eungkyu Kim

IPC: G03F7/42

CPC classification number: G03F7/425 ,  C11D7/5009 ,  C11D7/5013 ,  C11D11/0047 ,  G03F7/426

Abstract: Solvents useful for removing, among other things, photoresists and poly(amic acid)/polyimide from display/semiconductor substrates or electronic processing equipment, consist essentially of: (A) a first component consisting of at least one of dimethyl sulfoxide (DMSO) and N-formyl morpholine, and (B) a second component consisting of at least one of N,N-dimethyl propionamide, 3-methoxy-N,N-dimethyl propanamide, N,N-dimethyl acetoacetamide and N-methyl-ε-caprolactam.