公开(公告)号：US10207470B2

公开(公告)日：2019-02-19

申请号：US15026509

申请日：2014-12-04

Applicant: DEXERIALS CORPORATION

Inventor： Yutaka Muramoto ,  Masanao Kikuchi ,  Shunichi Kajiya ,  Takaaki Otowa ,  Yasuhiro Takahashi

IPC: B29D11/00 ,  B29C41/28 ,  G11B7/26 ,  C03C15/00 ,  B29C33/38 ,  B29C59/04 ,  B29C33/42 ,  B29C35/08 ,  G03F7/00 ,  G03F7/24 ,  B29L11/00

Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.

公开(公告)号：US12076890B2

公开(公告)日：2024-09-03

申请号：US16099692

申请日：2017-04-27

Applicant: Dexerials Corporation

Inventor： Akihiro Shibata ,  Shunichi Kajiya ,  Kazuya Hayashibe ,  Masanao Kikuchi

IPC: B29C33/42 ,  B29C33/38 ,  B29C59/02 ,  B29C35/08

CPC classification number: B29C33/424 ,  B29C33/38 ,  B29C33/3842 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B29K2827/06 ,  B29K2833/12 ,  B29K2867/003 ,  B29K2995/0024

Abstract: A replica master mold 10 comprises: a base material layer 11; and a surface shape body 12 formed on the base material layer 11 and having a fine irregular pattern, wherein a softening temperature of the surface shape body 12 is higher than a softening temperature of the base material layer 11.

公开(公告)号：US11090886B2

公开(公告)日：2021-08-17

申请号：US15950596

申请日：2018-04-11

Applicant: DEXERIALS CORPORATION

Inventor： Yutaka Muramoto ,  Masanao Kikuchi ,  Shunichi Kajiya ,  Takaaki Otowa ,  Yasuhiro Takahashi

IPC: B29C33/42 ,  G11B7/26 ,  B29D11/00 ,  B29C41/28 ,  B29C33/38 ,  G03F7/00 ,  G03F7/24 ,  C03C15/00 ,  B29C59/04 ,  B29C35/08 ,  B29L11/00

Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.

公开(公告)号：US10095105B2

公开(公告)日：2018-10-09

申请号：US15326163

申请日：2015-07-14

Applicant: DEXERIALS CORPORATION

Inventor： Yutaka Muramoto ,  Masanao Kikuchi

IPC: G03F7/00 ,  C23C14/08 ,  C23C14/34 ,  C23C16/27 ,  C23C16/44 ,  C23C16/56 ,  C23C28/04 ,  G03F7/20 ,  B29C33/38 ,  G03F7/004 ,  G03F7/11 ,  G03F7/24

Abstract: There is provided a method for manufacturing a master on which an arbitrary pattern is formed, the method including: forming a thin-film layer on an outer circumferential surface of a base material in a round cylindrical or round columnar shape; generating a control signal corresponding to an object on the basis of an input image in which the object is depicted; irradiating the thin-film layer with laser light on the basis of the control signal and thereby forming a thin-film pattern corresponding to the object on the thin-film layer; and forming a pattern corresponding to the object on the outer circumferential surface of the base material using, as a mask, the thin-film layer on which the thin-film pattern is formed.

公开(公告)号：US12032123B2

公开(公告)日：2024-07-09

申请号：US17470339

申请日：2021-09-09

Applicant: DEXERIALS CORPORATION

Inventor： Shunichi Kajiya ,  Hideki Terashima ,  Yutaka Muramoto ,  Masanao Kikuchi ,  Takaaki Otowa

IPC: G02B1/118 ,  B29C33/42 ,  B29C59/02 ,  B29C59/04 ,  G02B1/12 ,  G02B5/02 ,  G02F1/1335

CPC classification number: G02B1/118 ,  B29C33/42 ,  G02B1/12 ,  B29C2059/023 ,  B29C59/046 ,  G02B5/0273 ,  G02F1/133502 ,  G02F2201/38

Abstract: There is provided an optical body with improved antireflection capability, a display device, and a method for manufacturing an optical body, the optical body including: a first concave-convex structure formed on a surface of a base material; and a second concave-convex structure superimposed on the first concave-convex structure. An average concave-convex period of the first concave-convex structure is larger than a wavelength in a visible light region, an average concave-convex period of the second concave-convex structure is less than or equal to the wavelength in the visible light region, and projecting parts of the second concave-convex structure extend in a direction normal to a flat plane of the base material.

公开(公告)号：US11543746B2

公开(公告)日：2023-01-03

申请号：US17144670

申请日：2021-01-08

Applicant: DEXERIALS CORPORATION

Inventor： Yutaka Muramoto ,  Masanao Kikuchi

IPC: B32B3/00 ,  G03F7/00 ,  B29C59/04 ,  B05D1/28 ,  B29C59/02 ,  B05D1/40 ,  B29C35/10 ,  B29K105/16 ,  B29C35/08

Abstract: There is provided an embossed film in which the frequency of loss of concavities is smaller, the embossed film including: a film main body; and a plurality of concavities formed on a surface of the film main body. A diameter of an opening surface of the concavity is larger than a visible light wavelength, an arrangement pattern of the concavities has periodicity along a length direction of the film main body, and the difference between the rate of loss of concavities in one end portion of the film main body and the rate of loss of concavities in the other end portion of the film main body is 10 ppm or less.

公开(公告)号：US10883676B2

公开(公告)日：2021-01-05

申请号：US16335126

申请日：2017-09-27

Applicant: DEXERIALS CORPORATION

Inventor： Masanao Kikuchi ,  Shunichi Kajiya ,  Asahiko Nogami ,  Kyoko Sakurai ,  Kazuya Hayashibe

IPC: G02B6/00 ,  G02B1/118 ,  G02B5/00 ,  F21S2/00 ,  F21V8/00 ,  G02B5/08

Abstract: There is provided a new and improved optical body, a new and improved method for manufacturing an optical body, and a new and improved light emitting device that can emit light derived from a light source in more various manners. The optical body includes: a base material; and a first concave-convex structure that is formed on at least one surface of the base material and that extracts internally propagating light that is injected into an inside of the base material from a side surface of the base material. An average period of concavity and convexity of the first concave-convex structure is more than or equal to a minimum value of a visible light wavelength band and less than or equal to 10 μm.

公开(公告)号：US12097675B2

公开(公告)日：2024-09-24

申请号：US17393963

申请日：2021-08-04

Applicant: DEXERIALS CORPORATION

Inventor： Yutaka Muramoto ,  Masanao Kikuchi ,  Shunichi Kajiya ,  Takaaki Otowa ,  Yasuhiro Takahashi

IPC: B29D11/00 ,  B29C33/38 ,  B29C33/42 ,  B29C35/08 ,  B29C41/28 ,  B29C59/04 ,  C03C15/00 ,  G03F7/00 ,  G03F7/24 ,  G11B7/26 ,  B29L11/00

CPC classification number: B29D11/0074 ,  B29C33/38 ,  B29C33/3842 ,  B29C33/424 ,  B29C35/0805 ,  B29C41/28 ,  B29C59/04 ,  C03C15/00 ,  G03F7/0002 ,  G03F7/24 ,  G11B7/261 ,  B29C35/0888 ,  B29C59/046 ,  B29K2909/08 ,  B29L2011/00 ,  C03C2218/34

Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.

公开(公告)号：US11602878B2

公开(公告)日：2023-03-14

申请号：US16332464

申请日：2017-09-05

Applicant: DEXERIALS CORPORATION

Inventor： Yutaka Muramoto ,  Masanao Kikuchi

IPC: B29C33/38 ,  B29C33/42 ,  B29C59/16 ,  G03F7/00 ,  B29C35/08 ,  B29C59/04 ,  B29C59/02

Abstract: There are provided a master and a method for manufacturing the master, the master having, on its outer peripheral surface, a concave-convex structure in which concavities or convexities are continuously arranged with high precision. The master includes: a substrate with a hollow cylindrical shape or cylindrical shape; and a concave-convex structure on an outer peripheral surface of the substrate. The concave-convex structure has concavities or convexities continuously arranged at a predetermined pitch in a circumferential direction of the substrate. The concavities or convexities are arranged with a predetermined phase difference between circumferential rows adjacent in an axial direction of the substrate.

公开(公告)号：US10245780B2

公开(公告)日：2019-04-02

申请号：US15523182

申请日：2015-10-28

Applicant: DEXERIALS CORPORATION

Inventor： Yutaka Muramoto ,  Masanao Kikuchi

IPC: B32B3/00 ,  B29C59/02 ,  B05D1/28 ,  B29C59/04 ,  B05D1/40 ,  B29C35/10 ,  B29K105/16 ,  B29C35/08

Abstract: There is provided an embossed film in which the frequency of loss of concavities is smaller, the embossed film including: a film main body; and a plurality of concavities formed on a surface of the film main body. A diameter of an opening surface of the concavity is larger than a visible light wavelength, an arrangement pattern of the concavities has periodicity along a length direction of the film main body, and the difference between the rate of loss of concavities in one end portion of the film main body and the rate of loss of concavities in the other end portion of the film main body is 10 ppm or less.