公开(公告)号：US12097675B2

公开(公告)日：2024-09-24

申请号：US17393963

申请日：2021-08-04

Applicant: DEXERIALS CORPORATION

Inventor： Yutaka Muramoto ,  Masanao Kikuchi ,  Shunichi Kajiya ,  Takaaki Otowa ,  Yasuhiro Takahashi

IPC: B29D11/00 ,  B29C33/38 ,  B29C33/42 ,  B29C35/08 ,  B29C41/28 ,  B29C59/04 ,  C03C15/00 ,  G03F7/00 ,  G03F7/24 ,  G11B7/26 ,  B29L11/00

CPC classification number: B29D11/0074 ,  B29C33/38 ,  B29C33/3842 ,  B29C33/424 ,  B29C35/0805 ,  B29C41/28 ,  B29C59/04 ,  C03C15/00 ,  G03F7/0002 ,  G03F7/24 ,  G11B7/261 ,  B29C35/0888 ,  B29C59/046 ,  B29K2909/08 ,  B29L2011/00 ,  C03C2218/34

Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.

公开(公告)号：US10207470B2

公开(公告)日：2019-02-19

申请号：US15026509

申请日：2014-12-04

Applicant: DEXERIALS CORPORATION

Inventor： Yutaka Muramoto ,  Masanao Kikuchi ,  Shunichi Kajiya ,  Takaaki Otowa ,  Yasuhiro Takahashi

IPC: B29D11/00 ,  B29C41/28 ,  G11B7/26 ,  C03C15/00 ,  B29C33/38 ,  B29C59/04 ,  B29C33/42 ,  B29C35/08 ,  G03F7/00 ,  G03F7/24 ,  B29L11/00

Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.

公开(公告)号：US11090886B2

公开(公告)日：2021-08-17

申请号：US15950596

申请日：2018-04-11

Applicant: DEXERIALS CORPORATION

Inventor： Yutaka Muramoto ,  Masanao Kikuchi ,  Shunichi Kajiya ,  Takaaki Otowa ,  Yasuhiro Takahashi

IPC: B29C33/42 ,  G11B7/26 ,  B29D11/00 ,  B29C41/28 ,  B29C33/38 ,  G03F7/00 ,  G03F7/24 ,  C03C15/00 ,  B29C59/04 ,  B29C35/08 ,  B29L11/00

Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.