公开(公告)号：US20160195387A1

公开(公告)日：2016-07-07

申请号：US15054238

申请日：2016-02-26

Applicant: Carl Zeiss SMT GmbH ,  Carl Zeiss Meditec AG

Inventor： Michael Arnz ,  Dirk Seidel ,  Gerd Klose

IPC: G01B11/26

CPC classification number: G01B11/26 ,  G01B11/00 ,  G03F1/42 ,  G03F1/84

Abstract: A method for determining a registration error of a feature on a mask, including providing a first aerial image that was captured by means of a position measuring device and includes at least the feature, simulating, from pattern specifications of the mask, a second aerial image that includes at least the feature, taking into account at least one effect that causes distortion of the first aerial image, and determining the registration error of the feature as the distance of the position of the feature in the first aerial image from the position of the feature in the second aerial image. Also provided is a method for simulating an aerial image from pattern specifications of a mask and a position measuring device for carrying out the method.

Abstract translation: 一种用于确定掩模上的特征的配准误差的方法，包括提供通过位置测量装置捕获的第一空间图像，并且至少包括从掩模的图案规格模拟第二空间图像的特征 考虑到引起第一空间图像失真的至少一个效应，以及确定特征的登记误差作为第一空间图像中的特征的位置与第一空间图像的位置的距离，至少包括该特征 功能在第二个航空图像。 还提供了一种用于从掩模的图案规格和用于执行该方法的位置测量装置模拟空中图像的方法。

公开(公告)号：US09797805B2

公开(公告)日：2017-10-24

申请号：US14707533

申请日：2015-05-08

Applicant: Carl Zeiss SMT GmbH ,  Carl Zeiss AG

Inventor： Lars Stoppe ,  Robert Pomraenke ,  Michael Arnz

IPC: G01M11/02 ,  G03F7/20

CPC classification number: G01M11/0264 ,  G03F7/706

Abstract: A test object for measuring the point spread function (PSF) of an optical system having a given Airy diameter (dAiry) comprises a structure to be imaged having a plurality of structure elements to be imaged, wherein the structure elements are embodied and arranged in such a way that the structure has at least two axes of symmetry.

公开(公告)号：US09377415B2

公开(公告)日：2016-06-28

申请号：US14501220

申请日：2014-09-30

Applicant: Carl Zeiss SMT GmbH

Inventor： Michael Arnz ,  Markus Deguenther

IPC: G01N21/95 ,  G01J1/00 ,  G01J1/42 ,  G01N21/88 ,  G03F1/84

CPC classification number: G01N21/95 ,  G01J1/00 ,  G01J1/4257 ,  G01J1/429 ,  G01N21/8806 ,  G01N21/9501 ,  G03F1/84

Abstract: A measuring device (40) for measuring an illumination property of an illumination system (12), which is configured for two-dimensional irradiation of a substrate (24) arranged in an illumination plane (21) with illumination radiation (20). Two differing measurement beam paths (52, 54) are formed in the measuring device, each arranged to guide the illumination radiation emitted by the illumination system onto a spatially resolving intensity detector (42) of the measuring device. A first (52) of the measurement beam paths is arranged to measure an intensity distribution in the illumination plane and the second (54) of the measurement beam paths is arranged to measure an intensity distribution in a pupil of the illumination system. The measuring device also includes an imaging optical unit (44) arranged in the first measurement beam path (52) such that the illumination radiation guided in the first measurement beam path passes through the imaging optical unit.

Abstract translation: 一种用于测量照明系统（12）的照明特性的测量装置（40），其被配置为用照射辐射（20）布置在照明平面（21）中的基板（24）的二维照射。 两个不同的测量光束路径（52,54）形成在测量装置中，每个测量光束路径被布置成将照明系统发射的照射辐射引导到测量装置的空间分辨强度检测器（42）上。 测量光束路径的第一（52）布置成测量照明平面中的强度分布，并且第二测量光束路径（54）被布置成测量照明系统的光瞳中的强度分布。 测量装置还包括配置在第一测量光束路径（52）中的成像光学单元（44），使得在第一测量光束路径中引导的照明辐射通过成像光学单元。

公开(公告)号：US10113864B2

公开(公告)日：2018-10-30

申请号：US15054238

申请日：2016-02-26

Applicant: Carl Zeiss SMT GmbH ,  Carl Zeiss Meditec AG

Inventor： Michael Arnz ,  Dirk Seidel ,  Gerd Klose

IPC: G06K9/00 ,  G01B11/26 ,  G01B11/00 ,  G03F1/42 ,  G03F1/84

Abstract: A method for determining a registration error of a feature on a mask, including providing a first aerial image that was captured by means of a position measuring device and includes at least the feature, simulating, from pattern specifications of the mask, a second aerial image that includes at least the feature, taking into account at least one effect that causes distortion of the first aerial image, and determining the registration error of the feature as the distance of the position of the feature in the first aerial image from the position of the feature in the second aerial image. Also provided is a method for simulating an aerial image from pattern specifications of a mask and a position measuring device for carrying out the method.

公开(公告)号：US20160104275A1

公开(公告)日：2016-04-14

申请号：US14881513

申请日：2015-10-13

Applicant: Carl Zeiss SMT GmbH

Inventor： Michael Arnz ,  Dirk Seidel

IPC: G06T7/00

CPC classification number: G06T7/001 ,  G06T7/33 ,  G06T2207/10056 ,  G06T2207/30148 ,  G06T2207/30208

Abstract: A method for determining a lateral offset of a pattern on a substrate relative to a desired position with the steps: a) providing a plurality of measurement and simulation images of the pattern with equidistant defocus positions, b) forming a plurality of first and second pairs, which each has a measurement image and a simulation image, wherein each first pair has the same first focal distance and each second pair has the same second focal distance, being different from the first focal distance, of the defocus positions thereof, and determining a first and second lateral distance of the patterns for each first and second pair, respectively, c) determining a first and a second linear fit line based on the determined first and second lateral distances, respectively, and d) determining the lateral offset of the pattern on the substrate relative to the desired position using the linear fit lines of step c).

Abstract translation: 一种用于通过以下步骤确定衬底上图案的横向偏移的方法：a）提供具有等距散焦位置的图案的多个测量和模拟图像，b）形成多个第一和第二对 ，每个具有测量图像和模拟图像，其中每个第一对具有相同的第一焦距，并且每个第二对具有与其第一焦距不同的第二焦距与其散焦位置的相关性，并且确定一个 分别对于每个第一和第二对的图案的第一和第二横向距离，c）分别基于确定的第一和第二横向距离来确定第一和第二线性拟合线，以及d）确定图案的横向偏移 使用步骤c）的线性拟合线相对于所需位置在衬底上。

公开(公告)号：US10012911B2

公开(公告)日：2018-07-03

申请号：US15618395

申请日：2017-06-09

Applicant: Carl Zeiss SMT GmbH

Inventor： Michael Arnz ,  Sascha Bleidistel ,  Toralf Gruner ,  Joachim Hartjes ,  Markus Schwab

IPC: G03B27/68 ,  G03F7/20

CPC classification number: G03F7/706 ,  G03F7/70258 ,  G03F7/70266

Abstract: A projection exposure apparatus includes a projection lens, a wavefront manipulator and a wavefront measuring device for measuring a wavefront in the projection lens. The wavefront measuring device includes a Moiré grating arrangement having an object grating and an image grating which are designed to be arranged in an object plane and an image plane, respectively, of the projection lens. The object grating and the image grating are coordinated with one another in a manner true to scale in such a way as to generate a Moiré superimposition pattern from an imaging of the object grating onto the image plane and the image grating. The Moiré grating arrangement is designed in such a way as to simultaneously generate the Moiré superimposition pattern for a plurality of field points of an object field in the object plane and/or of an image field in the image plane.

公开(公告)号：US20170336714A1

公开(公告)日：2017-11-23

申请号：US15618395

申请日：2017-06-09

Applicant: Carl Zeiss SMT GmbH

Inventor： Michael Arnz ,  Sascha Bleidistel ,  Toralf Gruner ,  Joachim Hartjes ,  Markus Schwab

IPC: G03F7/20

CPC classification number: G03F7/706 ,  G03F7/70258 ,  G03F7/70266

Abstract: A projection exposure apparatus includes a projection lens, a wavefront manipulator and a wavefront measuring device for measuring a wavefront in the projection lens. The wavefront measuring device includes a Moiré grating arrangement having an object grating and an image grating which are designed to be arranged in an object plane and an image plane, respectively, of the projection lens. The object grating and the image grating are coordinated with one another in a manner true to scale in such a way as to generate a Moiré superimposition pattern from an imaging of the object grating onto the image plane and the image grating. The Moiré grating arrangement is designed in such a way as to simultaneously generate the Moiré superimposition pattern for a plurality of field points of an object field in the object plane and/or of an image field in the image plane.

公开(公告)号：US09786046B2

公开(公告)日：2017-10-10

申请号：US14881513

申请日：2015-10-13

Applicant: Carl Zeiss SMT GmbH

Inventor： Michael Arnz ,  Dirk Seidel

IPC: G06K9/00 ,  G06F17/50 ,  G06T7/00 ,  G06T7/33

CPC classification number: G06T7/001 ,  G06T7/33 ,  G06T2207/10056 ,  G06T2207/30148 ,  G06T2207/30208

Abstract: A method for determining a lateral offset of a pattern on a substrate relative to a desired position with the steps: a) providing a plurality of measurement and simulation images of the pattern with equidistant defocus positions, b) forming a plurality of first and second pairs, which each has a measurement image and a simulation image, wherein each first pair has the same first focal distance and each second pair has the same second focal distance, being different from the first focal distance, of the defocus positions thereof, and determining a first and second lateral distance of the patterns for each first and second pair, respectively, c) determining a first and a second linear fit line based on the determined first and second lateral distances, respectively, and d) determining the lateral offset of the pattern on the substrate relative to the desired position using the linear fit lines of step c).

公开(公告)号：US20150355052A1

公开(公告)日：2015-12-10

申请号：US14707533

申请日：2015-05-08

Applicant: Carl Zeiss SMT GmbH ,  Carl Zeiss AG

Inventor： Lars Stoppe ,  Robert Pomraenke ,  Michael Arnz

IPC: G01M11/02

CPC classification number: G01M11/0264 ,  G03F7/706

Abstract: A test object for measuring the point spread function (PSF) of an optical system having a given Airy diameter (dAiry) comprises a structure to be imaged having a plurality of structure elements to be imaged, wherein the structure elements are embodied and arranged in such a way that the structure has at least two axes of symmetry.

Abstract translation: 用于测量具有给定通气直径（dAiry）的光学系统的点扩散函数（PSF）的测试对象包括要成像的结构，其具有多个待成像的结构元件，其中结构元件被实施和布置成 该结构具有至少两个对称轴的方式。

公开(公告)号：US20150015875A1

公开(公告)日：2015-01-15

申请号：US14501220

申请日：2014-09-30

Applicant: Carl Zeiss SMT GmbH

Inventor： Michael Arnz ,  Markus Deguenther

IPC: G01N21/95 ,  G01J1/00

CPC classification number: G01N21/95 ,  G01J1/00 ,  G01J1/4257 ,  G01J1/429 ,  G01N21/8806 ,  G01N21/9501 ,  G03F1/84

Abstract: A measuring device (40) for measuring an illumination property of an illumination system (12), which is configured for two-dimensional irradiation of a substrate (24) arranged in an illumination plane (21) with illumination radiation (20). Two differing measurement beam paths (52, 54) are formed in the measuring device, each arranged to guide the illumination radiation emitted by the illumination system onto a spatially resolving intensity detector (42) of the measuring device. A first (52) of the measurement beam paths is arranged to measure an intensity distribution in the illumination plane and the second (54) of the measurement beam paths is arranged to measure an intensity distribution in a pupil of the illumination system. The measuring device also includes an imaging optical unit (44) arranged in the first measurement beam path (52) such that the illumination radiation guided in the first measurement beam path passes through the imaging optical unit.

Abstract translation: 一种用于测量照明系统（12）的照明特性的测量装置（40），其被配置为用照射辐射（20）布置在照明平面（21）中的基板（24）的二维照射。 两个不同的测量光束路径（52,54）形成在测量装置中，每个测量光束路径被布置成将照明系统发射的照射辐射引导到测量装置的空间分辨强度检测器（42）上。 测量光束路径的第一（52）布置成测量照明平面中的强度分布，并且第二测量光束路径（54）被布置成测量照明系统的光瞳中的强度分布。 测量装置还包括配置在第一测量光束路径（52）中的成像光学单元（44），使得在第一测量光束路径中引导的照明辐射通过成像光学单元。