Invention Application
US20160195387A1 Method For Determining The Registration Of A Structure On A Photomask And Apparatus To Perform The Method
审中-公开
用于确定光掩模上的结构的注册和执行该方法的装置的方法
- Patent Title: Method For Determining The Registration Of A Structure On A Photomask And Apparatus To Perform The Method
- Patent Title (中): 用于确定光掩模上的结构的注册和执行该方法的装置的方法
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Application No.: US15054238Application Date: 2016-02-26
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Publication No.: US20160195387A1Publication Date: 2016-07-07
- Inventor: Michael Arnz , Dirk Seidel , Gerd Klose
- Applicant: Carl Zeiss SMT GmbH , Carl Zeiss Meditec AG
- Priority: DE102010045135.5 20100910
- Main IPC: G01B11/26
- IPC: G01B11/26
Abstract:
A method for determining a registration error of a feature on a mask, including providing a first aerial image that was captured by means of a position measuring device and includes at least the feature, simulating, from pattern specifications of the mask, a second aerial image that includes at least the feature, taking into account at least one effect that causes distortion of the first aerial image, and determining the registration error of the feature as the distance of the position of the feature in the first aerial image from the position of the feature in the second aerial image. Also provided is a method for simulating an aerial image from pattern specifications of a mask and a position measuring device for carrying out the method.
Public/Granted literature
- US10113864B2 Method for determining the registration of a structure on a photomask and apparatus to perform the method Public/Granted day:2018-10-30
Information query
