公开(公告)号：US10078142B2

公开(公告)日：2018-09-18

申请号：US15019863

申请日：2016-02-09

Applicant: California Institute of Technology

Inventor： Michael E. Hoenk ,  John J. Hennessy ,  Shouleh Nikzad ,  April D. Jewell

IPC: G01T1/20 ,  H01L31/107 ,  H01L31/102 ,  G01T1/24 ,  G01T1/29 ,  H01L27/146 ,  H01L27/148

CPC classification number: G01T1/2018 ,  G01T1/244 ,  G01T1/2985 ,  H01L27/14621 ,  H01L27/14643 ,  H01L27/14685 ,  H01L27/148 ,  H01L31/02165 ,  H01L31/102 ,  H01L31/107

Abstract: A filter for electromagnetic radiation including one or more dielectric spacer regions and one or more reflective regions integrated on a semiconductor substrate, the semiconductor substrate including a semiconductor photodetector, such that the filter transmits ultraviolet radiation to the semiconductor photodetector, the ultraviolet radiation having a range of wavelengths, and the filter suppresses transmission of electromagnetic radiation, having wavelengths outside the range of wavelengths, to the semiconductor photodetector.

公开(公告)号：US20240030269A1

公开(公告)日：2024-01-25

申请号：US18356970

申请日：2023-07-21

Applicant: California Institute of Technology

Inventor： Michael E. Hoenk ,  April D. Jewell ,  Todd J. Jones ,  Shouleh Nikzad

IPC: H01L27/146

CPC classification number: H01L27/14685 ,  H01L27/1462 ,  H01L27/14687

Abstract: Disclosed herein is a method of coating a detector. The method includes: providing the detector including a detector surface; performing a planarization process to the detector surface; performing a piranha clean process to the planarized surface; performing a slight etch to the piranha cleaned surface; performing an ammonium fluoride etching step to the slight etched surface to create a decontaminated surface. The decontaminated surface is an atomically flat silicon surface with surface and subsurface damage and contamination significantly reduced. A multilayer 2D-doped layer may be epitaxially grown on the decontaminated surface. The detector may provide high quantum efficiency with uniform and stable performance from room temperature to cryogenic temperatures.

公开(公告)号：US20160273958A1

公开(公告)日：2016-09-22

申请号：US15019863

申请日：2016-02-09

Applicant: California Institute of Technology

Inventor： Michael E. Hoenk ,  John J. Hennessy ,  Shouleh Nikzad ,  April D. Jewell

IPC: G01J1/02 ,  H01L31/102 ,  G01T1/20 ,  H01L27/146 ,  G01N23/22 ,  H01L31/107 ,  H01L27/148

CPC classification number: G01T1/2018 ,  G01T1/244 ,  G01T1/2985 ,  H01L27/14621 ,  H01L27/14643 ,  H01L27/14685 ,  H01L27/148 ,  H01L31/02165 ,  H01L31/102 ,  H01L31/107

Abstract: A filter for electromagnetic radiation including one or more dielectric spacer regions and one or more reflective regions integrated on a semiconductor substrate, the semiconductor substrate including a semiconductor photodetector, such that the filter transmits ultraviolet radiation to the semiconductor photodetector, the ultraviolet radiation having a range of wavelengths, and the filter suppresses transmission of electromagnetic radiation, having wavelengths outside the range of wavelengths, to the semiconductor photodetector.

Abstract translation: 一种用于电磁辐射的滤光器，包括一个或多个电介质间隔物区域和集成在半导体衬底上的一个或多个反射区域，所述半导体衬底包括半导体光电检测器，使得所述过滤器向半导体光电检测器透射紫外线辐射，所述紫外线辐射具有范围 的波长，并且滤波器抑制具有波长范围外的波长的电磁辐射的传输到半导体光电检测器。

公开(公告)号：US20240038803A1

公开(公告)日：2024-02-01

申请号：US18360969

申请日：2023-07-28

Applicant: California Institute of Technology

Inventor： April D. Jewell ,  Shouleh Nikzad ,  John J. Hennessy ,  Ghazaleh Kafaie Shirmanesh ,  Erika T. Hamden

IPC: H01L27/146 ,  G02B5/28 ,  G02B1/115

CPC classification number: H01L27/14623 ,  G02B5/288 ,  G02B1/115 ,  H01L27/14685

Abstract: A process for fabricating a light detector with one or more antireflection (AR) and/or bandpass filter coatings deposited thereon by area-selective atomic layer deposition (ALD). The AR coatings may comprise a metal oxide or a metal fluoride, such as AlF3, Al2O3, and/or HfO2, and the bandpass filter coatings may comprise solar-blind bandpass filter coatings. The AR and/or bandpass filter coatings may be deposited with different thicknesses on different portions of the light detector using an intentional and controllable patterning by a lithography-based process. As a result, the AR and/or bandpass filter coatings provide a butcher-block style response profile with each of the different portions of the light detector targeting a specific bandpass of light. The AR and/or bandpass filter coatings comprise a linear variable filter (LVF) that provides a spatially varying response by the light detector.