公开(公告)号：US20240038803A1

公开(公告)日：2024-02-01

申请号：US18360969

申请日：2023-07-28

Applicant: California Institute of Technology

Inventor： April D. Jewell ,  Shouleh Nikzad ,  John J. Hennessy ,  Ghazaleh Kafaie Shirmanesh ,  Erika T. Hamden

IPC: H01L27/146 ,  G02B5/28 ,  G02B1/115

CPC classification number: H01L27/14623 ,  G02B5/288 ,  G02B1/115 ,  H01L27/14685

Abstract: A process for fabricating a light detector with one or more antireflection (AR) and/or bandpass filter coatings deposited thereon by area-selective atomic layer deposition (ALD). The AR coatings may comprise a metal oxide or a metal fluoride, such as AlF3, Al2O3, and/or HfO2, and the bandpass filter coatings may comprise solar-blind bandpass filter coatings. The AR and/or bandpass filter coatings may be deposited with different thicknesses on different portions of the light detector using an intentional and controllable patterning by a lithography-based process. As a result, the AR and/or bandpass filter coatings provide a butcher-block style response profile with each of the different portions of the light detector targeting a specific bandpass of light. The AR and/or bandpass filter coatings comprise a linear variable filter (LVF) that provides a spatially varying response by the light detector.