MEASUREMENT GAP PATTERNS
    9.
    发明申请
    MEASUREMENT GAP PATTERNS 审中-公开
    测量差距图

    公开(公告)号:US20150245235A1

    公开(公告)日:2015-08-27

    申请号:US14582998

    申请日:2014-12-24

    IPC分类号: H04W24/10 H04W72/04 H04W36/00

    摘要: Technology for configuring measurement gap patterns is disclosed. An evolved node B (eNB) can generate multiple measurement gap patterns for a user equipment (UE), wherein each measurement gap pattern indicates at least one set of consecutive subframes within a defined time period during which the UE is to perform inter-frequency measurements for a selected cell. The eNB can configure the multiple measurement gap patterns from the eNB to the UE, the UE being configured to perform the inter-frequency measurements for selected cells within a group of cells according to the multiple measurement gap patterns.

    摘要翻译: 公开了用于配置测量间隙图案的技术。 演进节点B(eNB)可以为用户设备(UE)生成多个测量间隙模式,其中每个测量间隙模式指示在UE将执行频率间测量的定义的时间段内的至少一组连续子帧 对于所选择的单元格。 eNB可以配置从eNB到UE的多个测量间隙模式,UE被配置为根据多个测量间隙模式对一组小区内的所选小区执行频率间测量。