公开(公告)号：US20240395827A1

公开(公告)日：2024-11-28

申请号：US18273139

申请日：2022-08-30

Applicant: HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. ,  BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Ning Liu ,  Bin Zhou ,  Ce Zhao ,  Liangchen Yan

IPC: H01L27/12

Abstract: The present disclosure provides a display substrate, a manufacturing method and a display device. The display substrate includes a base substrate, a driving circuit layer and a light-emitting unit. The driving circuit layer includes a source/drain metal layer, the source/drain metal layer includes a source electrode, a drain electrode and an auxiliary electrode, the light-emitting unit includes a first electrode structure, a light-emitting layer and a second electrode structure, the display substrate further includes an auxiliary connection structure and a protection hole, an orthogonal projection of the auxiliary connection structure onto the base substrate is located within an orthogonal projection of the protection hole onto the base substrate, and a distance between a surface of the auxiliary connection structure away from the base substrate and the base substrate is less than a distance between a surface of the planarization layer away from the base substrate and the base substrate.

公开(公告)号：US12144204B2

公开(公告)日：2024-11-12

申请号：US17432217

申请日：2021-02-04

Applicant: Hefei Xinsheng Optoelectronics Technology Co., Ltd. ,  BOE Technology Group Co., Ltd.

Inventor： Ning Liu ,  Qinghe Wang ,  Liusong Ni ,  Tao Sun ,  Bin Zhou ,  Liangchen Yan

IPC: H10K59/12 ,  H10K59/121 ,  H10K59/122 ,  H10K59/124 ,  H10K59/126 ,  H10K59/35

Abstract: A displaying substrate, a manufacturing method thereof, and a display panel. The displaying substrate includes: a first capacitor electrode at least partially located in luminous zones, a buffer layer covering the first capacitor electrode, and a second capacitor electrode and an active layer that are disposed on the buffer layer and do not overlap with each other, wherein the active layer is located in a non-luminous zone, and the first capacitor electrode, the buffer layer and the second capacitor electrode form a storage capacitor.

公开(公告)号：US12133417B2

公开(公告)日：2024-10-29

申请号：US17432462

申请日：2021-02-24

Applicant: Hefei Xinsheng Optoelectronics Technology Co., Ltd. ,  BOE Technology Group Co., Ltd.

Inventor： Leilei Cheng ,  Yongchao Huang ,  Qinghe Wang ,  Yang Zhang ,  Bin Zhou

IPC: H10K59/12 ,  H10K59/121 ,  H10K59/32 ,  H10K59/80 ,  H10K59/82 ,  H10K71/20 ,  H10K77/10 ,  G02F1/13

CPC classification number: H10K59/1201 ,  H10K59/1213 ,  H10K59/32 ,  H10K59/82 ,  H10K59/87 ,  H10K71/20 ,  H10K77/10 ,  G02F1/1306

Abstract: The disclosure relates to the technical field of display, in particular to a displaying substrate, a manufacturing method thereof and a display panel. The displaying substrate comprises a passivation layer (28) and a flat layer (29) covering the passivation layer (28), wherein the flat layer (29) comprises a first flat via hole and a plurality of second flat via holes, the passivation layer (28) comprises a first passivation via hole, and the first flat via hole and the first passivation via hole form a first sleeve hole (31); and the hole depth of the first flat via hole is smaller than that of each second flat via hole, and the hole depth of the first passivation via hole is greater than or equal to the difference between the maximum hole depth of all the second flat via holes and the hole depth of the first flat via hole.

公开(公告)号：US12062711B2

公开(公告)日：2024-08-13

申请号：US17449607

申请日：2021-09-30

Applicant: HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. ,  BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Jun Liu ,  Luke Ding ,  Jingang Fang ,  Bin Zhou ,  Leilei Cheng ,  Wei Li

IPC: H01L29/66 ,  H01L21/027 ,  H01L21/311 ,  H01L21/3213 ,  H01L21/44 ,  H01L21/475 ,  H01L21/4757 ,  H01L21/4763 ,  H01L27/12 ,  H01L29/40 ,  H01L29/417 ,  H01L29/786

CPC classification number: H01L29/66969 ,  H01L21/0274 ,  H01L21/31116 ,  H01L21/31144 ,  H01L21/32139 ,  H01L21/44 ,  H01L21/475 ,  H01L21/47573 ,  H01L21/47635 ,  H01L27/1288 ,  H01L29/401 ,  H01L29/7869 ,  H01L29/41733 ,  H01L29/78633

Abstract: A manufacturing method of a display substrate, a display substrate, and a display device. The manufacturing method includes: forming an active layer; forming a gate insulation film layer, a gate film layer and a photoresist film layer; exposing the photoresist film layer to a light and developing the exposed photoresist film layer until the developed photoresist film layer has a thickness of 1.8-2.2 μm and a slope angle not less than 70°; over-etching the gate film layer to form a gate electrode, an orthographic projection of the gate electrode being located within a region of an orthographic projection of the developed photoresist film layer; over-etching the gate insulation film layer by a gaseous corrosion method to form a gate insulation layer; peeling off the photoresist film layer remaining on a surface of the gate electrode; and performing a conductive treatment to the active layer.

公开(公告)号：US20240251636A1

公开(公告)日：2024-07-25

申请号：US18005676

申请日：2022-02-28

Applicant: Hefei BOE Joint Technology Co., Ltd. ,  BOE TECHNOLOGY GROUP CO., LTD.

Inventor： XinXin Wang ,  Dacheng Zhang ,  Ning Liu ,  Yu Wang ,  Bin Zhou ,  Can Yuan

IPC: H10K59/80 ,  H10K59/12 ,  H10K59/124

CPC classification number: H10K59/80522 ,  H10K59/1201 ,  H10K59/124

Abstract: An OLED display panel includes a base substrate and an OLED device on the base substrate. The OLED device includes: an auxiliary electrode in the non-light-emitting region, the auxiliary electrode includes a conductive layer and a conductive column on a side of the conductive layer away from the base substrate, and an orthographic projection of the conductive column on the base substrate is within an orthographic projection of the conductive layer on the base substrate; and an insulating layer between the conductive layer and the base substrate; a groove is arranged on a surface of the insulating layer away from the base substrate, and an orthographic projection of the groove on the base substrate at least partially overlaps with the orthographic projection of the isolation structure on the base substrate.

公开(公告)号：US11961848B2

公开(公告)日：2024-04-16

申请号：US17265789

申请日：2020-05-14

Applicant: Hefei Xinsheng Optoelectronics Technology Co., Ltd. ,  BOE Technology Group Co., Ltd.

Inventor： Jun Liu ,  Liangchen Yan ,  Bin Zhou ,  Yadong Liang ,  Ning Liu ,  Leilei Cheng ,  Jingang Fang

IPC: H01L27/12 ,  H01L21/02 ,  H01L21/4757 ,  H01L21/4763

CPC classification number: H01L27/1248 ,  H01L27/124 ,  H01L27/127 ,  H01L21/02178 ,  H01L21/02244 ,  H01L21/02252 ,  H01L21/47573 ,  H01L21/47635 ,  H01L27/1225

Abstract: Disclosed are a display substrate and a manufacturing method therefor, and a display device. The display substrate comprises: a substrate base, and an active layer, a gate insulating layer, a first metal film layer, an interlayer insulating layer, a second metal film layer, and a passivation layer stacked in sequence on the substrate base. The first metal film layer comprises a pattern of a gate and a gate line. The second metal film layer comprises a pattern of a source/drain and a data line. The gate line and the data line are partially arranged opposite to each other. An oxide metal layer is provided on the surface of the side of the region of the gate line opposite to the data line facing the data line.

公开(公告)号：US11930679B2

公开(公告)日：2024-03-12

申请号：US17264283

申请日：2020-05-12

Applicant: Hefei Xinsheng Optoelectronics Technology Co., Ltd. ,  BOE Technology Group Co., Ltd.

Inventor： Jingang Fang ,  Luke Ding ,  Jun Liu ,  Bin Zhou ,  Jun Cheng

IPC: H10K59/35 ,  H01L27/12 ,  H10K50/86 ,  H10K59/12 ,  H10K59/121 ,  H10K59/123 ,  H10K59/124 ,  H10K71/00

CPC classification number: H10K59/353 ,  H10K50/865 ,  H10K59/1213 ,  H10K71/00 ,  H10K59/1201

Abstract: The present disclosure relates to the technical field of display, and discloses an array substrate, a preparation method therefor, and a display device. When dielectric layers, such as a buffer layer, an interlayer dielectric layer, and a gate insulation layer, are formed between a source-drain electrode and a substrate, the thickness of at least one dielectric layer among said dielectric layers underneath a first through hole for connecting a drain electrode and an anode is increased, which is to say that the drain electrode is raised to be further away from the substrate, causing the drain electrode to be closer to a surface of a planarization layer that faces away from the substrate, i.e., reducing the thickness of a portion of the planarization layer above the drain electrode.

公开(公告)号：US11785811B2

公开(公告)日：2023-10-10

申请号：US17241703

申请日：2021-04-27

Applicant: HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD. ,  BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Ning Liu ,  Jun Liu ,  Wei Song ,  Qinghe Wang ,  Bin Zhou ,  Liangchen Yan

IPC: H01L29/08 ,  H10K59/124 ,  H10K59/126 ,  H10K59/12

CPC classification number: H10K59/124 ,  H10K59/126 ,  H10K59/1201

Abstract: An array substrate, a method for manufacturing the array substrate and a display device are provided. The array substrate includes: a base substrate, and a thin film transistor, a storage capacitor, and a lapping pattern for connecting the thin film transistor to the storage capacitor arranged on the base substrate; wherein the thin film transistor includes a semiconductor layer, a gate insulation layer, a gate electrode, an interlayer insulation layer, a source electrode and a drain electrode arranged sequentially in that order; the interlayer insulation layer includes at least two inorganic insulation layers and at least one organic insulation layer laminated one on another, and both a layer proximate to the base substrate and a layer distal to the base substrate in the interlayer insulation layer are the inorganic insulation layers.

公开(公告)号：US11751456B2

公开(公告)日：2023-09-05

申请号：US17812598

申请日：2022-07-14

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Dongfang Wang ,  Tongshang Su ,  Ming Wang ,  Ce Zhao ,  Bin Zhou

IPC: H10K59/35 ,  H10K59/126 ,  H10K59/121 ,  H10K102/10

CPC classification number: H10K59/351 ,  H10K59/126 ,  H10K59/1213 ,  H10K2102/103

Abstract: An OLED display substrate, a manufacturing method and a display device are provided. The OLED display substrate includes a base substrate and a plurality of pixel units arranged on the base substrate, each pixel unit includes a plurality of subpixel units, and each subpixel unit includes a switching TFT and a bottom-emission OLED, the OLED display substrate further includes a light-shielding layer arranged between the OLED and the switching TFT, and an orthogonal projection of the light-shielding layer onto the base substrate completely covers an orthogonal projection of a semiconductor region of the switching TFT onto the base substrate.

公开(公告)号：US11592742B2

公开(公告)日：2023-02-28

申请号：US16320041

申请日：2018-05-22

Applicant: Hefei Xinsheng Optoelectronics Technology Co., Ltd. ,  BOE Technology Group Co., Ltd.

Inventor： Wei Li ,  Guangcai Yuan ,  Bin Zhou ,  Dongfang Wang ,  Jun Cheng ,  Yingbin Hu ,  Jingjing Xia ,  Tongshang Su

IPC: G03F7/021 ,  G03F7/038 ,  G03F7/039 ,  G03F7/027 ,  H01L21/027 ,  H01L21/283 ,  H01L21/3213 ,  H01L21/77

Abstract: A photoresist composition and manufacturing method thereof, a manufacturing method of a metal pattern, and a manufacturing method of an array substrate are provided. The photoresist composition includes a base material and an ion adsorbent, and the ion adsorbent is chelating resin.