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11 条记录 (耗时 0.014 秒)

    Biasable flux optimizer / collimator for PVD sputter chamber
    1.
    发明授权
    Biasable flux optimizer / collimator for PVD sputter chamber 有权

    公开(公告)号：US10727033B2

    公开(公告)日：2020-07-28

    申请号：US16426964

    申请日：2019-05-30

    申请人： Applied Materials, Inc.

    发明人： Martin Lee Riker ,  Fuhong Zhang ,  Anthony Infante ,  Zheng Wang

    IPC分类号： H01J37/34 ,  C23C14/04 ,  H01J37/32

    摘要： A collimator that is biasable is provided. The ability to bias the collimator allows control of the electric field through which the sputter species pass. In some implementations of the present disclosure, a collimator that has a high effective aspect ratio while maintaining a low aspect ratio along the periphery of the collimator of the hexagonal array of the collimator is provided. In some implementations, a collimator with a steep entry edge in the hexagonal array is provided. It has been found that use of a steep entry edge in the collimator reduces deposition overhang and clogging of the cells of the hexagonal array. These various features lead to improve film uniformity and extend the life of the collimator and process kit.

    Biasable flux optimizer / collimator for PVD sputter chamber
    2.
    发明授权
    Biasable flux optimizer / collimator for PVD sputter chamber 有权

    公开(公告)号：US09960024B2

    公开(公告)日：2018-05-01

    申请号：US15277674

    申请日：2016-09-27

    申请人： Applied Materials, Inc.

    发明人： Martin Lee Riker ,  Fuhong Zhang ,  Anthony Infante ,  Zheng Wang

    IPC分类号： H01J37/34 ,  C23C14/04

    CPC分类号： H01J37/3447 ,  C23C14/046 ,  H01J37/34

    摘要： In some implementations described herein, a collimator that is biasable is provided. The ability to bias the collimator allows control of the electric field through which the sputter species pass. In some implementations of the present disclosure a collimator that has a high effective aspect ratio while maintaining a low aspect ratio along the periphery of the collimator of the hexagonal array of the collimator is provided. In some implementations, a collimator with a steep entry edge in the hexagonal array is provided. It has been found that use of a steep entry edge in the collimator reduces deposition overhang and clogging of the cells of the hexagonal array. These various features lead to improve film uniformity and extend the life of the collimator and process kit.

    Biasable flux optimizer / collimator for PVD sputter chamber
    3.
    发明授权
    Biasable flux optimizer / collimator for PVD sputter chamber 有权

    公开(公告)号：US11309169B2

    公开(公告)日：2022-04-19

    申请号：US16910151

    申请日：2020-06-24

    申请人： Applied Materials, Inc.

    发明人： Martin Lee Riker ,  Fuhong Zhang ,  Anthony Infante ,  Zheng Wang

    IPC分类号： H01J37/34 ,  C23C14/04 ,  H01J37/32

    摘要： A collimator that is biasable is provided. The ability to bias the collimator allows control of the electric field through which the sputter species pass. In some implementations of the present disclosure, a collimator that has a high effective aspect ratio while maintaining a low aspect ratio along the periphery of the collimator of the hexagonal array of the collimator is provided. In some implementations, a collimator with a steep entry edge in the hexagonal array is provided. It has been found that use of a steep entry edge in the collimator reduces deposition overhang and clogging of the cells of the hexagonal array. These various features lead to improve film uniformity and extend the life of the collimator and process kit.

    Biasable flux optimizer / collimator for PVD sputter chamber
    4.
    发明授权
    Biasable flux optimizer / collimator for PVD sputter chamber 有权

    公开(公告)号：US10347474B2

    公开(公告)日：2019-07-09

    申请号：US15940398

    申请日：2018-03-29

    申请人： Applied Materials, Inc.

    发明人： Martin Lee Riker ,  Fuhong Zhang ,  Anthony Infante ,  Zheng Wang

    IPC分类号： H01J37/34 ,  C23C14/04

    摘要： In some implementations described herein, a collimator that is biasable is provided. The ability to bias the collimator allows control of the electric field through which the sputter species pass. In some implementations of the present disclosure, a collimator that has a high effective aspect ratio while maintaining a low aspect ratio along the periphery of the collimator of the hexagonal array of the collimator is provided. In some implementations, a collimator with a steep entry edge in the hexagonal array is provided. It has been found that use of a steep entry edge in the collimator reduces deposition overhang and clogging of the cells of the hexagonal array. These various features lead to improve film uniformity and extend the life of the collimator and process kit.