公开(公告)号：US20240412985A1

公开(公告)日：2024-12-12

申请号：US18731436

申请日：2024-06-03

Applicant: Applied Materials, Inc.

Inventor： Clinton SAKATA ,  Ricardo MARTINEZ ,  Robert DUES ,  Shih-Yu LIU ,  Tarun Kumar ABICHANDANI ,  Brian K. KIRKPATRICK ,  Jagan RANGARAJAN ,  Adrian S. BLANK ,  Edward GOLUBOVSKY ,  Justin H. WONG

IPC: H01L21/67 ,  B65G47/90 ,  H01L21/687

Abstract: A substrate cleaning system to remove particulates from multiple substrates includes a cleaning tank for applying a cleaning liquid to substrates, a rinse tank for applying a rinsing liquid to substrates, and a robot system. The cleaning tank includes a stationary lid, an input lid, and an output lid. The input and output lids allow a substrate carrier designed to carry an individual substrate to access an inner volume of the cleaning tank for processing. A transport system moves the substrate in the substrate carrier through the inner volume of the cleaning tank by creating a series of gaps between substrates to allow proper processing. The robot system transports substrates through the input and output lids of the cleaning tank, and transports substrates into the rinse tank.

公开(公告)号：US20240222152A1

公开(公告)日：2024-07-04

申请号：US18101555

申请日：2023-01-25

Applicant: Applied Materials, Inc.

Inventor： Jason A. RYE ,  Adrian S. BLANK ,  Ekaterina MIKHAYLICHENKO ,  Jagan RANGARAJAN ,  Jagadeeshkumar SUKUMARAN ,  Manikandan JAYARAMAN ,  Ricardo MARTINEZ ,  Retheesh MURALIDHARAN

IPC: H01L21/67 ,  B08B3/02 ,  B08B3/12 ,  B08B13/00

CPC classification number: H01L21/67028 ,  B08B3/022 ,  B08B3/123 ,  B08B13/00 ,  B08B2203/0211 ,  B08B2203/0288

Abstract: In one embodiment, a cleaning and drying module includes a process rotor having grip pins for holding a substrate. The process rotor rotates and moves between lowered and raised positions. A plurality of sweep arms each have a nozzle mechanism to apply a cleaning and/or drying fluid to the substrate. A collection rotor rotates synchronously with the process rotor. The collection rotor includes a collection weir defined by a bottom portion of the collection rotor and the inner surface. The collection weir collects fluids and particles from the process rotor and the substrate. Drain holes are positioned in the collection weir to drain fluids and particles from the collection weir. A rotor cover surrounds and extends above the sidewall of the collection rotor defining an annular volume between the rotor cover and the collection rotor. An exhaust draws air through the drain holes and receives the collected fluids and particles.

公开(公告)号：US20250079192A1

公开(公告)日：2025-03-06

申请号：US18241722

申请日：2023-09-01

Applicant: Applied Materials, Inc.

Inventor： Ricardo MARTINEZ ,  Jagan RANGARAJAN ,  Sami MUSTAFA ,  Tarun Kumar ABICHANDANI ,  Lukas SYKORA ,  Shih-Yu LIU ,  Hung X. HOANG

IPC: H01L21/67 ,  F16K27/02

Abstract: A fluid assembly includes a base and at least one first device. The base includes a single-piece body including a base outlet, a base inlet, and a first interface including a first interface inlet and a first interface outlet. The base also includes a first flow path segment formed within the single-piece body that extends from the base inlet to the first interface outlet. The base also includes a second flow path segment formed within the single-piece body that extends from first interface inlet. The base also includes a ground path disposed within the single-piece body. The first device is attachable to the first interface to fluidly connect a first device inlet to the first interface outlet and a second device outlet to the second interface inlet.