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公开(公告)号：US11837478B2
公开(公告)日：2023-12-05
申请号：US17389201
申请日：2021-07-29
Applicant: Applied Materials, Inc.
Inventor： Paul Z. Wirth
CPC classification number: H01L21/67103 , F27D3/0084 , F27D5/0037 , F27D11/02 , F27D19/00 , F27D21/0014 , H01L21/324 , H01L21/67248 , F27D2019/0003
Abstract: A process chamber includes one or more vertical walls at least partially defining a chamber portion of the process chamber, and multiple zones located about a periphery of the one or more vertical walls, wherein one or more of the multiple zones extends from a top to a bottom of the one or more vertical walls. The process chamber further includes a plurality of temperature control devices, each thermally coupled to the one or more vertical walls in one of the multiple zones, and a controller coupled to the plurality of temperature control devices and configured to set temperatures of one or more of the plurality of temperature control devices to obtain temperature uniformity within 2% across a substrate located in the chamber portion.
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公开(公告)号：US11791172B2
公开(公告)日：2023-10-17
申请号：US16905862
申请日：2020-06-18
Applicant: Applied Materials, Inc.
Inventor： Mauro Cimino , Arkaprava Dan , Paul Z. Wirth
IPC: C23C16/455 , H01L21/67 , C23C16/52
CPC classification number: H01L21/67017 , C23C16/45561 , C23C16/52 , H01L21/67253
Abstract: Gas distribution apparatus to provide uniform flows of gases from a single source to multiple processing chambers are described. A valve upstream of a shared volume is controlled by at least two pressurizing sequences during a process it the processing chamber. The first pressurizing sequence opens and closes the upstream valve a first number of cycles and the second pressurizing sequence opens and closes the upstream valve less frequently after the first number of cycles. The open/close timing of the second pressurizing sequence occurs less frequently than the open/close timing of the first pressurizing sequence.
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公开(公告)号：US20220009106A1
公开(公告)日：2022-01-13
申请号：US17473188
申请日：2021-09-13
Applicant: Applied Materials, Inc.
Inventor： Paul Z. Wirth , Charles T. Carlson , Jason M. Schaller
IPC: B25J11/00 , B25J9/12 , B25J9/00 , H01L21/687 , B25J9/04 , H01L21/677
Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a transfer apparatus having a central hub including a shaft extending at a distal end through the transfer region housing into the transfer region. The transfer apparatus may include a lateral translation apparatus coupled with an exterior surface of the transfer region housing, and configured to provide at least one direction of lateral movement of the shaft. The systems may also include an end effector coupled with the shaft within the transfer region. The end effector may include a plurality of arms having a number of arms equal to a number of substrate supports of the plurality of substrate supports in the transfer region.
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公开(公告)号：US20210008727A1
公开(公告)日：2021-01-14
申请号：US16922805
申请日：2020-07-07
Applicant: Applied Materials, Inc.
Inventor： Paul Z. Wirth , Charles T. Carlson , Jason M. Schaller
Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a transfer apparatus having a central hub including a shaft extending at a distal end through the transfer region housing into the transfer region. The transfer apparatus may include a lateral translation apparatus coupled with an exterior surface of the transfer region housing, and configured to provide at least one direction of lateral movement of the shaft. The systems may also include an end effector coupled with the shaft within the transfer region. The end effector may include a plurality of arms having a number of arms equal to a number of substrate supports of the plurality of substrate supports in the transfer region.
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公开(公告)号：US11590662B2
公开(公告)日：2023-02-28
申请号：US17473188
申请日：2021-09-13
Applicant: Applied Materials, Inc.
Inventor： Paul Z. Wirth , Charles T. Carlson , Jason M. Schaller
IPC: H01L21/687 , B25J11/00 , B25J9/12 , B25J9/00 , B25J9/04 , H01L21/677 , B25J15/00
Abstract: Exemplary substrate processing systems may include a transfer region housing defining a transfer region fluidly coupled with a plurality of processing regions. A sidewall of the transfer region housing may define a sealable access for providing and receiving substrates. The systems may include a transfer apparatus having a central hub including a shaft extending at a distal end through the transfer region housing into the transfer region. The transfer apparatus may include a lateral translation apparatus coupled with an exterior surface of the transfer region housing, and configured to provide at least one direction of lateral movement of the shaft. The systems may also include an end effector coupled with the shaft within the transfer region. The end effector may include a plurality of arms having a number of arms equal to a number of substrate supports of the plurality of substrate supports in the transfer region.
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Patent Agency Ranking
公开(公告)号：US20210358777A1
公开(公告)日：2021-11-18
申请号：US17389201
申请日：2021-07-29
Applicant: Applied Materials, Inc.
Inventor： Paul Z. Wirth
Abstract: A process chamber includes one or more vertical walls at least partially defining a chamber portion of the process chamber, and multiple zones located about a periphery of the one or more vertical walls, wherein one or more of the multiple zones extends from a top to a bottom of the one or more vertical walls. The process chamber further includes a plurality of temperature control devices, each thermally coupled to the one or more vertical walls in one of the multiple zones, and a controller coupled to the plurality of temperature control devices and configured to set temperatures of one or more of the plurality of temperature control devices to obtain temperature uniformity within 2% across a substrate located in the chamber portion.
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7.发明申请公开(公告)号：US20210295547A1
公开(公告)日：2021-09-23
申请号：US17341243
申请日：2021-06-07
Applicant: Applied Materials, Inc.
Inventor： Ozkan Celik , Patricia A. Schulze , Gregory J. Freeman , Paul Z. Wirth , Tommaso Vercesi
Abstract: A depth measuring apparatus includes a camera assembly configured to capture a plurality of images of a target at a plurality of distances from the target. The depth measuring apparatus further includes a controller configured to, for each of a plurality of regions within the plurality of images: determine corresponding gradient values within the plurality of images; determine a corresponding maximum gradient value from the corresponding gradient values; and determine, based on the corresponding maximum gradient value, a depth measurement for a region of the plurality of regions.
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8.发明申请公开(公告)号：US20200243354A1
公开(公告)日：2020-07-30
申请号：US16261763
申请日：2019-01-30
Applicant: Applied Materials, Inc.
Inventor： Paul Z. Wirth
Abstract: A temperature-controllable process chamber configured to process substrates may include one or more vertical walls at least partially defining a chamber portion of the process chamber. Multiple zones may be located about a periphery of the one or more vertical walls and multiple temperature control devices are thermally coupled to the periphery of the one or more vertical walls in each of the multiple zones. A controller coupled to the temperature control devices may be configured to individually control temperatures of the multiple temperature control devices to obtain substantial temperature uniformity across a substrate located in the chamber portion. Other systems and methods of manufacturing substrates are disclosed.
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公开(公告)号：US20230195072A1
公开(公告)日：2023-06-22
申请号：US17559061
申请日：2021-12-22
Applicant: APPLIED MATERIALS, INC.
Inventor： Atilla Kilicarslan , Raechel Chu-Hui Tan , Brooke Elise Montgomery , Paul Z. Wirth
IPC: G05B19/18
CPC classification number: G05B19/188 , G05B2219/45031
Abstract: A method includes receiving first sensor data associated with a first iteration of a first recipe operation of a substrate processing recipe. The method further includes determining disturbance data, the disturbance data being a difference between the first sensor data and first setpoint data of the first recipe operation. The method further includes determining, based at least in part on the disturbance data, a first actuation value associated with one or more components of a processing chamber. Actuation of the one or more components according to the first actuation value compensates for the disturbance data. The method further includes causing the actuation of the one or more components based on the first actuation value during a subsequent iteration of the first recipe operation of the substrate processing recipe to compensate for the disturbance data.
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公开(公告)号：US20210301929A1
公开(公告)日：2021-09-30
申请号：US16836231
申请日：2020-03-31
Applicant: APPLIED MATERIALS, INC.
Inventor： Paul Z. Wirth , Ofer Amir , Michael C. Kuchar
IPC: F16K3/02 , F16K31/124 , F16K37/00
Abstract: Disclosed are a slit valve apparatus and a method for controlling a slit valve. The slit valve apparatus includes a slit valve assembly and a servo-control system in communication with the slit valve assembly. The slit valve assembly includes at least one gate able to transition between an open position and a closed position, at least one pneumatic actuator, at least one proportional pneumatic valve including a plurality of controllers, and a continuous position sensor. The servo-control system includes a centralized controller that generates a control signal and adjusts the movement of the at least one gate based on the position trajectory for the gate, a linear position measurement of the gate from the continuous position sensor, and fluid pressure/flow measurements from the plurality of controllers.
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