公开(公告)号：US20240131562A1

公开(公告)日：2024-04-25

申请号：US17970434

申请日：2022-10-19

Applicant: Applied Materials, Inc.

Inventor： Edwin VELAZQUEZ

IPC: B08B5/02 ,  B24B37/30 ,  B24B53/017

CPC classification number: B08B5/02 ,  B24B37/30 ,  B24B53/017

Abstract: A modular gas pallet assembly is disclosed herein, along with a cleaning unit and chemical mechanical polisher having the same. In one example, the gas pallet assembly includes three outlets and two or less inlets. The gas pallet assembly has first and second primary gas conduits secured to a first mounting plate. The second primary gas conduits is split into two branches, each having their own flow control. The modular gas pallet assembly is configured to provide gas towards a base plate of a substrate cleaner, to substrate gripping pins of the substrate cleaner, and to a bottom of a substrate held by the substrate gripping pins of the substrate cleaner.

公开(公告)号：US20200286753A1

公开(公告)日：2020-09-10

申请号：US16423661

申请日：2019-05-28

Applicant: Applied Materials, Inc.

Inventor： Edwin VELAZQUEZ ,  Jim Kellogg ATKINSON

IPC: H01L21/67 ,  H01L21/677 ,  H01L21/687

Abstract: One or more embodiments described herein generally relate to drying environments within semiconductor processing systems. In these embodiments, substrates are cleaned and dried within a drying environment before returning to the factory interface. However, due to an opening between the factory interface and the drying environment, air flows from the factory interface into the drying environment, often reducing the effectiveness of the drying processes. In embodiments described herein, the air flow is blocked by a sliding door that raises up to the closed position when a substrate enters the drying portion of the dryer located within the drying environment. After the substrate exits the dryer and before the substrate enters the factory interface, the sliding door lowers to the opened position such that the substrate can enter the factory interface. As such, these processes allow for multiple substrates to dry quickly and consistently within the system, improving throughput.

公开(公告)号：US20240226970A9

公开(公告)日：2024-07-11

申请号：US17970434

申请日：2022-10-20

Applicant: Applied Materials, Inc.

Inventor： Edwin VELAZQUEZ

IPC: B08B5/02 ,  B24B37/30 ,  B24B53/017

CPC classification number: B08B5/02 ,  B24B37/30 ,  B24B53/017

Abstract: A modular gas pallet assembly is disclosed herein, along with a cleaning unit and chemical mechanical polisher having the same. In one example, the gas pallet assembly includes three outlets and two or less inlets. The gas pallet assembly has first and second primary gas conduits secured to a first mounting plate. The second primary gas conduits is split into two branches, each having their own flow control. The modular gas pallet assembly is configured to provide gas towards a base plate of a substrate cleaner, to substrate gripping pins of the substrate cleaner, and to a bottom of a substrate held by the substrate gripping pins of the substrate cleaner.

公开(公告)号：US20240100713A1

公开(公告)日：2024-03-28

申请号：US18244679

申请日：2023-09-11

Applicant: Applied Materials, Inc.

Inventor： Jagan RANGARAJAN ,  Edward GOLUBOVSKY ,  Edwin VELAZQUEZ ,  Adrian S. BLANK ,  Steven M. ZUNIGA ,  Balasubramaniam C. JAGANNATHAN

IPC: B25J11/00 ,  B25J9/04 ,  B25J15/02

CPC classification number: B25J11/0095 ,  B25J9/042 ,  B25J11/0085 ,  B25J15/0206

Abstract: Embodiments described herein generally relate to equipment used in the manufacturing of electronic devices, and more particularly, to a cleaning system, cleaning system hardware and related methods which may be used to transport and clean the surface of a substrate. According to one embodiment, a blade handling assembly for handling a substrate in a cleaning system includes a gripping assembly including a pair of gripping blades, the blades operable with a gripping actuator to hold a substrate at its edges. The assembly includes a first blade actuator for moving the gripping assembly and substrate between a horizontal and a vertical orientation utilizing a first axis. The assembly includes a second blade actuator for moving the vertically oriented gripping assembly and substrate 180 degrees utilizing a second axis, thereby causing the substrate to face an opposite direction. Movement utilizing the first axis results in rotation of the first and second blade actuators and movement utilizing the second axis results in rotation of only the second blade actuator.

公开(公告)号：US20240091823A1

公开(公告)日：2024-03-21

申请号：US17949091

申请日：2022-09-20

Applicant: Applied Materials, Inc.

Inventor： Edwin VELAZQUEZ

IPC: B08B3/10

CPC classification number: B08B3/106 ,  B08B2203/007

Abstract: A method and apparatus for delivering IPA vapor to a substrate processing chamber. In one aspect, the invention includes a controller, a liquid mass flow controller (LMFC) associated with a vaporizer to convert a first fluid to a vapor, a mass flow controller (MFC) associated with the carrier gas, a mixing unit to mix the vapor with the carrier gas to create the predetermined mixture and a drain circuit including a first flow path having a first valve between the mixing unit and a drain, a second flow path having a second valve between the mixing unit and the processing chamber, whereby the first flow path can be opened until the predetermined mixture is reached and thereafter, the second flow path can be opened allowing the predetermined mixture to be delivered to the chamber.

公开(公告)号：US20220375769A1

公开(公告)日：2022-11-24

申请号：US17878907

申请日：2022-08-02

Applicant: Applied Materials, Inc.

Inventor： Edwin VELAZQUEZ ,  Jim Kellogg ATKINSON

IPC: H01L21/67 ,  H01L21/687 ,  H01L21/677

Abstract: One or more embodiments described herein generally relate to drying environments within semiconductor processing systems. In these embodiments, substrates are cleaned and dried within a drying environment before returning to the factory interface. However, due to an opening between the factory interface and the drying environment, air flows from the factory interface into the drying environment, often reducing the effectiveness of the drying processes. In embodiments described herein, the air flow is blocked by a sliding door that raises up to the closed position when a substrate enters the drying portion of the dryer located within the drying environment. After the substrate exits the dryer and before the substrate enters the factory interface, the sliding door lowers to the opened position such that the substrate can enter the factory interface. As such, these processes allow for multiple substrates to dry quickly and consistently within the system, improving throughput.

公开(公告)号：US20200176279A1

公开(公告)日：2020-06-04

申请号：US16700738

申请日：2019-12-02

Applicant: Applied Materials, Inc.

Inventor： Edwin VELAZQUEZ ,  Jagan RANGARAJAN

IPC: H01L21/67 ,  H01L21/02

Abstract: A method and apparatus for Marangoni substrate drying is disclosed which includes an adjustable spray bar assembly having mounting brackets coupled to a support structure of a drying system, a base assembly coupled to the mounting brackets and disposed parallel to a face of the support structure, and a mounting assembly coupled to and parallel with the base assembly. The mounting assembly is adjustable in a vertical direction at two distal ends. The mounting assembly includes arms onto which one or more spray bars may be disposed. While secured to the mounting assembly, the one or more spray bars may be rotated about a longitudinal axis.