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公开(公告)号：US20230384694A1
公开(公告)日：2023-11-30
申请号：US18269387
申请日：2021-12-02
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Abdullah ALIKHAN , Tammo UITTERDIJK , Johannes Bernardus Charles ENGELEN , Daniel KAMIENIECKI , Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN , Thomas POIESZ , Leon Martin LEVASIER , Jim Vincent OVERKAMP , Johannes Adrianus Cornelis Maria PIJNENBURG , Koos VAN BERKEL , Gregory James DIGUIDO , Anthony C. SOCCI, JR. , Iliya SIGAL , Bram Antonius Gerardus LOMANS , Michel Ben Isel HABETS
IPC: G03F7/00 , H01L21/683 , H01L21/687
CPC classification number: G03F7/70708 , G03F7/7095 , G03F7/70783 , H01L21/6838 , H01L21/68757
Abstract: Systems, apparatuses, and methods are provided for manufacturing a substrate table. An example method can include forming a vacuum sheet including a plurality of vacuum connections and a plurality of recesses configured to receive a plurality of burls disposed on a core body for supporting an object such as a wafer. Optionally, at least one burl can be surrounded, partially or wholly, by a trench. The example method can further include using the vacuum sheet to mount the core body to an electrostatic sheet including a plurality of apertures configured to receive the plurality of burls. Optionally, the example method can include using the vacuum sheet to mount the core body to the electrostatic sheet such that the plurality of recesses of the vacuum sheet line up with the plurality of burls of the core body and the plurality of apertures of the electrostatic sheet.
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公开(公告)号：US20240280909A1
公开(公告)日：2024-08-22
申请号：US18567931
申请日：2022-06-23
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70266 , G02B26/0825 , G03F7/70233 , G03F7/70833
Abstract: A deformable mirror system (300, 400, 500), comprising a monolithic support structure (310, 410, 510), comprising a first side (311) configured to receive a mirror (350, 450, 550); and a second side (312) configured to receive a plurality of actuators (460, 560) such that the actuators are positioned to enable selective deformation of a reflective surface (351, 451, 551) of the mirror.
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Patent Agency Ranking
公开(公告)号：US20210018847A1
公开(公告)日：2021-01-21
申请号：US17061641
申请日：2020-10-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Emil Peter SCHMITT-WEAVER , Kaustuve BHATTACHARYYA , Wim Tjibbo TEL , Frank STAALS , Leon Martin LEVASIER
Abstract: A method for monitoring a lithographic process, and associated lithographic apparatus. The method includes obtaining height variation data relating to a substrate supported by a substrate support and fitting a regression through the height variation data, the regression approximating the shape of the substrate; residual data between the height variation data and the regression is determined; and variation of the residual data is monitored over time. The residual data may be deconvolved based on known features of the substrate support.
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公开(公告)号：US20170115578A1
公开(公告)日：2017-04-27
申请号：US15311548
申请日：2015-04-24
Applicant: ASML Netherlands B.V.
Inventor： Christianus Wilhelmus Johannes BERENDSEN , Marcel BECKERS , Henricus Jozef CASTELIJNS , Hubertus Antonius GERAETS , Adrianus Hendrik KOEVOETS , Leon Martin LEVASIER , Peter SCHAAP , Bob STREEFKERK , Siegfried Alexander TROMP
IPC: G03F7/20
CPC classification number: G03F7/70883 , G03F7/70033 , G03F7/70625 , G03F7/70783 , G03F7/70875 , G03F7/70891 , G03F7/70941
Abstract: A method for compensating for an exposure error in an exposure process of a lithographic apparatus that comprises a substrate table, the method comprising: obtaining a dose measurement indicative of a dose of IR radiation that reaches substrate level, wherein the dose measurement can be used to calculate an amount of IR radiation absorbed by an object in the lithographic apparatus during an exposure process; and using the dose measurement to control the exposure process so as to compensate for an exposure error associated with the IR radiation absorbed by the object during the exposure process.
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5.发明申请Support Structure, Method of Controlling the Temperature Of The Same, and Apparatuses Including the Same 审中-公开支撑结构，控制其温度的方法以及包括其的装置公开(公告)号：US20160035605A1
公开(公告)日：2016-02-04
申请号：US14775237
申请日：2014-03-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Roger Wilhelmus Antonius Henricus SCHMITZ , Sander Catharina Reinier DERKS , Leon Martin LEVASIER
IPC: H01L21/67 , G05D23/19 , G05B15/02 , H01L21/687 , H01L21/66
CPC classification number: H01L21/67248 , G03F7/70875 , G05B15/02 , G05D23/1917 , H01L21/67069 , H01L21/68785 , H01L22/12
Abstract: Disclosed are support structure apparatuses for holding a substrate or patterning device, for example in a lithographic apparatus, and apparatuses comprising such support structure apparatuses. The support structure apparatus comprises a temperature regulation system for controlling the temperature of the support structure and one or more temperature sensors located on the periphery of said support structure being operable to measure the temperature of the support structure at said periphery. The temperature regulation system may be operable to calculate an average temperature of the substrate holder from temperature values measured by said temperature sensors and position dependent correlation factors, which depend upon the position of an applied heat load on a substrate or patterning device mounted upon the support structure.
Abstract translation: 公开了用于保持基板或图案形成装置的支撑结构装置，例如在光刻设备中，以及包括这种支撑结构装置的装置。 支撑结构装置包括用于控制支撑结构的温度的温度调节系统和位于所述支撑结构的周边上的一个或多个温度传感器，其可操作以测量所述外围处的支撑结构的温度。 温度调节系统可以用于根据由所述温度传感器测量的温度值和与位置相关的相关因素来计算衬底保持器的平均温度，这取决于施加的热负荷在安装在支撑件上的衬底或图案形成装置上的位置 结构体。
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公开(公告)号：US20200004164A1
公开(公告)日：2020-01-02
申请号：US16480706
申请日：2018-01-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Emil Peter SCHMITT-WEAVER , Kaustuve BHATTACHARYYA , Wim Tjibbo TEL , Frank STAALS , Leon Martin LEVASIER
Abstract: A method for monitoring a lithographic process, and associated lithographic apparatus. The method includes obtaining height variation data relating to a substrate supported by a substrate support and fitting a regression through the height variation data, the regression approximating the shape of the substrate; residual data between the height variation data and the regression is determined; and variation of the residual data is monitored over time. The residual data may be deconvolved based on known features of the substrate support.
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公开(公告)号：US20180173116A1
公开(公告)日：2018-06-21
申请号：US15568122
申请日：2016-04-04
Applicant: ASML Netherlands B.V.
Inventor： Adrianus Hendrik KOEVOETS , Erik Johan ARLEMARK , Sander Catharina Reinier DERKS , Sjoerd Nicolaas Lambertus DONDERS , Wilfred Edward ENDENDIJK , Franciscus Johannes Joseph JANSSEN , Raymond Wilhelmus Louis LAFARRE , Leon Martin LEVASIER , Jim Vincent OVERKAMP , Nicolaas TEN KATE , Jacobus Cornelis Gerardus VAN DER SANDEN
CPC classification number: G03F7/70875 , G03F7/2041 , G03F7/70258 , G03F7/70783 , H01L21/67098 , H01L21/683
Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
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