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公开(公告)号：US20160255708A1
公开(公告)日：2016-09-01
申请号：US15148255
申请日：2016-05-06
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , John Tom Stewart, IV , Jordan Jur , Daniel Brown
IPC: H05G2/00
Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.
Abstract translation: 产生辐射的初始脉冲; 提取辐射的初始脉冲的一部分以形成修改的辐射脉冲，所述修改的辐射脉冲包括第一部分和第二部分，所述第一部分在时间上连接到所述第二部分，并且所述第一部分具有最大值 能量小于第二部分的最大能量; 修改的辐射脉冲的第一部分与靶材料相互作用以形成修饰的靶; 并且修改的辐射脉冲的第二部分与修饰的靶相互作用以产生发射极紫外（EUV）光的等离子体。
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公开(公告)号：US20160029471A1
公开(公告)日：2016-01-28
申请号：US14874164
申请日：2015-10-02
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert Jay Rafac , Igor Vladimirovich Fomenkov , Daniel John William Brown , Daniel James Golich
IPC: H05G2/00
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
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公开(公告)号：US09155179B2
公开(公告)日：2015-10-06
申请号：US14550421
申请日：2014-11-21
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J. W. Brown , Daniel J. Golich
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
Abstract translation: 用于形成靶和用于产生极紫外光的技术包括向目标位置释放初始目标材料，目标材料包括当转换成等离子体时发射极紫外（EUV）光的材料; 将第一放大光束引向初始目标材料，第一放大光束具有足以从初始目标材料形成目标材料的集合的能量，每个片段小于初始靶材料并且在空间上 分布在整个半球形体积上; 以及将第二放大光束引导到所述收集件，以将所述目标材料片转换成发射EUV光的等离子体。
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公开(公告)号：US09107279B2
公开(公告)日：2015-08-11
申请号：US14563186
申请日：2014-12-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Robert J. Rafac , Yezheng Tao
CPC classification number: H05G2/008 , G03F7/70033 , G21K5/00 , H05G2/005
Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.
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公开(公告)号：US20140299791A1
公开(公告)日：2014-10-09
申请号：US14310972
申请日：2014-06-20
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J.W. Brown , Daniel J. Golich
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
Abstract translation: 用于形成靶和用于产生极紫外光的技术包括向目标位置释放初始目标材料，目标材料包括当转换成等离子体时发射极紫外（EUV）光的材料; 将第一放大光束引向初始目标材料，第一放大光束具有足以从初始目标材料形成目标材料的集合的能量，每个片段小于初始靶材料并且在空间上 分布在整个半球形体积上; 以及将第二放大光束引导到所述收集件，以将所述目标材料片转换成发射EUV光的等离子体。
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Patent Agency Ranking
公开(公告)号：US10663866B2
公开(公告)日：2020-05-26
申请号：US15270072
申请日：2016-09-20
Applicant: ASML Netherlands B.V.
Inventor： Alexander Anthony Schafgans , Igor Vladimirovich Fomenkov , Yezheng Tao , Rostislav Rokitski , Robert Jay Rafac , Daniel John William Brown , Cory Alan Stinson
Abstract: An optical source for an extreme ultraviolet (EUV) photolithography tool includes a light-generation system including a light-generation module; an optical amplifier including a gain medium associated with a gain band, the gain medium configured to amplify light having a wavelength in the gain band; and a wavelength-based optical filter system on a beam path between the light-generation module and the optical amplifier, the wavelength-based optical filter system including at least one optical element configured to allow light having a wavelength in a first set of wavelengths to propagate on the beam path and to remove light having a wavelength in a second set of wavelengths from the beam path, the first set of wavelengths and the second set of wavelengths including different wavelengths in the gain band of the optical amplifier.
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公开(公告)号：US09338870B2
公开(公告)日：2016-05-10
申请号：US14563496
申请日：2014-12-08
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , John Tom Stewart, IV , Daniel J.W. Brown
Abstract: A first remaining plasma that at least partially coincides with a target region is formed; a target including target material in a first spatial distribution to the target region is provided, the target material including material that emits EUV light when converted to plasma; the first remaining plasma and the initial target interact, the interaction rearranging the target material from the first spatial distribution to a shaped target distribution to form a shaped target in the target region, the shaped target including the target material arranged in the shaped spatial distribution; an amplified light beam is directed toward the target region to convert at least some of the target material in the shaped target to a plasma that emits EUV light; and a second remaining plasma is formed in the target region.
Abstract translation: 形成与目标区域至少部分重合的第一剩余等离子体; 提供了包括在目标区域的第一空间分布中的目标材料的目标，所述目标材料包括当转换成等离子体时发射EUV光的材料; 所述第一剩余等离子体和所述初始靶相互作用，所述相互作用将所述目标材料从所述第一空间分布重新排列成成形目标分布，以在所述目标区域中形成成形目标，所述成形靶包括布置在所述成形空间分布中的所述目标材料; 放大的光束被引向目标区域，以将成形靶中的目标材料中的至少一些转换成发射EUV光的等离子体; 并且在目标区域中形成第二剩余等离子体。
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公开(公告)号：US20150076374A1
公开(公告)日：2015-03-19
申请号：US14550421
申请日：2014-11-21
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J.W. Brown , Daniel J. Golich
IPC: H05G2/00
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
Abstract translation: 用于形成靶和用于产生极紫外光的技术包括向目标位置释放初始目标材料，目标材料包括当转换成等离子体时发射极紫外（EUV）光的材料; 将第一放大光束引向初始目标材料，第一放大光束具有足以从初始目标材料形成目标材料的集合的能量，每个片段小于初始靶材料并且在空间上 分布在整个半球形体积上; 以及将第二放大光束引导到所述收集件，以将所述目标材料片转换成发射EUV光的等离子体。
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公开(公告)号：US08872143B2
公开(公告)日：2014-10-28
申请号：US13830461
申请日：2013-03-14
Applicant: ASML Netherlands B.V.
Inventor： Robert J. Rafac , Yezheng Tao
IPC: H05G2/00
CPC classification number: H05G2/008 , G03F7/70033 , G21K5/00 , H05G2/005
Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.
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公开(公告)号：US20220192000A1
公开(公告)日：2022-06-16
申请号：US17433007
申请日：2020-03-02
Applicant: ASML Netherlands B.V.
Inventor： Igor Vladimirovich Fomenkov , Yezheng Tao , Robert Jay Rafac
Abstract: Disclosed is an apparatus and a method in which multiple, e.g., two or more pulses from a single laser source are applied to source material prior to application of a main ionizing pulse in which the multiple pulses are generated by a common laser source. The first pulse is directed towards the source material when the source material is at a first position and the second pulse is directed towards the source material when the source material is at a second position.
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