公开(公告)号：US20160255708A1

公开(公告)日：2016-09-01

申请号：US15148255

申请日：2016-05-06

Applicant: ASML Netherlands B.V.

Inventor： Yezheng Tao ,  John Tom Stewart, IV ,  Jordan Jur ,  Daniel Brown

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/006

Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.

Abstract translation: 产生辐射的初始脉冲; 提取辐射的初始脉冲的一部分以形成修改的辐射脉冲，所述修改的辐射脉冲包括第一部分和第二部分，所述第一部分在时间上连接到所述第二部分，并且所述第一部分具有最大值 能量小于第二部分的最大能量; 修改的辐射脉冲的第一部分与靶材料相互作用以形成修饰的靶; 并且修改的辐射脉冲的第二部分与修饰的靶相互作用以产生发射极紫外（EUV）光的等离子体。

公开(公告)号：US20150208494A1

公开(公告)日：2015-07-23

申请号：US14489411

申请日：2014-09-17

Applicant: ASML Netherlands B.V.

Inventor： Robert J. Rafac ,  Richard L. Sandstrom ,  Daniel Brown ,  Kai-Chung Hou

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/70058

Abstract: A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.

Abstract translation: 目标材料设置在目标位置，目标材料包括当转换成等离子体时发射极紫外光的材料，目标材料沿着第一方向沿第一方向延伸并且沿第二方向延伸到第二范围内; 放大的光束沿着传播方向被引向目标位置; 并且放大的光束聚焦在焦平面中，其中目标位置在焦平面之外，并且放大的光束和目标材料之间的相互作用将至少部分目标材料转换成发射EUV光的等离子体。

公开(公告)号：US09826616B2

公开(公告)日：2017-11-21

申请号：US15148255

申请日：2016-05-06

Applicant: ASML Netherlands B.V.

Inventor： Yezheng Tao ,  John Tom Stewart, IV ,  Jordan Jur ,  Daniel Brown

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/006

Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.

公开(公告)号：US09357625B2

公开(公告)日：2016-05-31

申请号：US14325153

申请日：2014-07-07

Applicant: ASML Netherlands B.V.

Inventor： Yezheng Tao ,  John Tom Stewart, IV ,  Jordan Jur ,  Andrew LaForge ,  Daniel Brown ,  Jason M. Arcand ,  Alexander A. Schafgans ,  Michael A. Purvis

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/006

Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.

Abstract translation: 产生辐射的初始脉冲; 提取辐射的初始脉冲的一部分以形成修改的辐射脉冲，所述修改的辐射脉冲包括第一部分和第二部分，所述第一部分在时间上连接到所述第二部分，并且所述第一部分具有最大值 能量小于第二部分的最大能量; 修改的辐射脉冲的第一部分与靶材料相互作用以形成修饰的靶; 并且修改的辐射脉冲的第二部分与修饰的靶相互作用以产生发射极紫外（EUV）光的等离子体。

公开(公告)号：US09232623B2

公开(公告)日：2016-01-05

申请号：US14489411

申请日：2014-09-17

Applicant: ASML Netherlands B.V.

Inventor： Robert J. Rafac ,  Richard L. Sandstrom ,  Daniel Brown ,  Kai-Chung Hou

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/70058

Abstract: A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.

Abstract translation: 目标材料设置在目标位置，目标材料包括当转换成等离子体时发射极紫外光的材料，目标材料沿着第一方向沿第一方向延伸并且沿第二方向延伸到第二范围内; 放大的光束沿着传播方向被引向目标位置; 并且放大的光束聚焦在焦平面中，其中目标位置在焦平面之外，并且放大的光束和目标材料之间的相互作用将至少部分目标材料转换成发射EUV光的等离子体。

公开(公告)号：US10064261B2

公开(公告)日：2018-08-28

申请号：US15790408

申请日：2017-10-23

Applicant: ASML Netherlands B.V.

Inventor： Yezheng Tao ,  John Tom Stewart, IV ,  Jordan Jur ,  Daniel Brown ,  Alexander A. Schafgans ,  Jason M. Arcand ,  Andrew LaForge

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/006

Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.

公开(公告)号：US20180124906A1

公开(公告)日：2018-05-03

申请号：US15790408

申请日：2017-10-23

Applicant: ASML Netherlands B.V.

Inventor： Yezheng Tao ,  John Tom Stewart, IV ,  Jordan Jur ,  Daniel Brown

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/006

Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.

公开(公告)号：US20160007434A1

公开(公告)日：2016-01-07

申请号：US14325153

申请日：2014-07-07

Applicant: ASML Netherlands B.V.

Inventor： Yezheng Tao ,  John Tom Stewart, IV ,  Jordan Jur ,  Andrew LaForge ,  Daniel Brown ,  Jason M. Arcand ,  Alexander A. Schafgans ,  Michael A. Purvis

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/006

Abstract: An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.