公开(公告)号：US20180267411A1

公开(公告)日：2018-09-20

申请号：US15903392

申请日：2018-02-23

Applicant: ASML Netherlands B.V.

Inventor： Sudhir SRIVASTAVA ,  Sander Bas ROOBOL ,  Simon Gijsbert Josephus MATHIJSSEN ,  Nan LIN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Krijn Frederik BUSTRAAN ,  Petrus Wilhelmus SMORENBURG ,  Gerrit Jacobus Hendrik BRUSSAARD

IPC: G03F7/20

Abstract: Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.

公开(公告)号：US20170315055A1

公开(公告)日：2017-11-02

申请号：US15494056

申请日：2017-04-21

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Simon Gijsbert Josephus MATHIJSSEN ,  Sander Bas ROOBOL ,  Nan LIN

IPC: G01N21/47 ,  G01N21/88 ,  G03F7/20

CPC classification number: G03F7/70616 ,  G01N21/47 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/4704 ,  G01N2021/4735 ,  G01N2021/8822 ,  G01N2021/95615 ,  G01N2201/12 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G03F7/70683 ,  G03F9/7003 ,  H01L22/12

Abstract: A structure of interest (T) is irradiated with radiation for example in the x-ray or EUV waveband, and scattered radiation is detected by a detector (19, 274, 908, 1012). A processor (PU) calculates a property such as linewidth (CD) or overlay (OV), for example by simulating (S16) interaction of radiation with a structure and comparing (S17) the simulated interaction with the detected radiation. The method is modified (S14a, S15a, S19a) to take account of changes in the structure which are caused by the inspection radiation. These changes may be for example shrinkage of the material, or changes in its optical characteristics. The changes may be caused by inspection radiation in the current observation or in a previous observation.

公开(公告)号：US20240004312A1

公开(公告)日：2024-01-04

申请号：US18253734

申请日：2021-10-28

Applicant: ASML Netherlands B.V. ,  STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN ,  STICHTING VU ,  UNIVERSITEIT VAN AMSTERDAM

Inventor： Peter Michael KRAUS ,  Sylvianne Dorothea Christina ROSCAM ABBING ,  Filippo CAMPI ,  ZhuangYan ZHANG ,  Petrus Wilhelmus SMORENBURG ,  Nan LIN ,  Stefan Michiel WITTE ,  Arie Jeffrey DEN BOEF

IPC: G03F7/00 ,  G02F1/35 ,  H05G2/00

CPC classification number: G03F7/70641 ,  G03F7/706849 ,  G02F1/353 ,  G02F1/3505 ,  G02F1/3507 ,  H05G2/00

Abstract: Disclosed is a metrology apparatus for measurement of a target formed on a substrate by a lithographic process and associated method. The metrology apparatus comprises a radiation source operable to provide first radiation; a configured solid high harmonic generation medium being configured to receive and be excited by said first radiation to generate high harmonic second radiation from an output surface of the configured solid high harmonic generation medium; and a detection arrangement operable to detect said second radiation, at least a portion of which having been scattered by said target. The configured solid high harmonic generation medium is configured to shape the beam of said second radiation and/or separate said first and second radiation.

公开(公告)号：US20220382124A1

公开(公告)日：2022-12-01

申请号：US17769725

申请日：2020-10-07

Applicant: ASML Netherlands B.V.

Inventor： Wenjie JIN ,  Nan LIN ,  Christina Lynn PORTER ,  Petrus Wilhelmus SMORENBURG

IPC: G02F1/35 ,  G02F1/355 ,  G03F7/20

Abstract: Disclosed is an illumination source comprising a gas delivery system comprising a gas nozzle. The gas nozzle comprises an opening in an exit plane of the gas nozzle. The gas delivery system is configured to provide a gas flow from the opening for generating an emitted radiation at an interaction region. The illumination source is configured to receive a pump radiation having a propagation direction and to provide the pump radiation in the gas flow. A geometry shape of the gas nozzle is adapted to shape a profile of the gas flow such that gas density of the gas flow first increases to a maximum value and subsequently falls sharply in a cut-off region along the propagation direction.

公开(公告)号：US20190155171A1

公开(公告)日：2019-05-23

申请号：US16254896

申请日：2019-01-23

Applicant: ASML Netherlands B.V.

Inventor： Nan LIN ,  Arie Jeffrey Den Boeff ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Niels Geypen

IPC: G03F7/20 ,  G01N21/95 ,  G02F1/355 ,  H01S3/16 ,  G01B11/24 ,  H01S3/00 ,  H01S3/13 ,  G02F1/37

CPC classification number: G03F7/70616 ,  G01B11/24 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8845 ,  G02F1/3551 ,  G02F1/37 ,  G03F7/70625 ,  G03F7/70633 ,  H01S3/0092 ,  H01S3/1305 ,  H01S3/1625 ,  H01S3/1636

Abstract: Disclosed is a method of performing a measurement in an inspection apparatus; and an associated inspection apparatus and HHG source. The method comprises configuring one or more controllable characteristics of at least one driving laser pulse of a high harmonic generation radiation source to control the output emission spectrum of illumination radiation provided by the high harmonic generation radiation source; and illuminating a target structure with said illuminating radiation. The method may comprise configuring the driving laser pulse so that the output emission spectrum comprises a plurality of discrete harmonic peaks. Alternatively the method may comprise using a plurality of driving laser pulses of different wavelengths such that the output emission spectrum is substantially monochromatic.

公开(公告)号：US20170322497A1

公开(公告)日：2017-11-09

申请号：US15585072

申请日：2017-05-02

Applicant: ASML Netherlands B.V.

Inventor： Nan LIN ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen

IPC: G03F7/20 ,  G21K5/04

CPC classification number: G03F7/70575 ,  G02F1/353 ,  G02F2001/354 ,  G02F2201/16 ,  G03F7/2004 ,  G03F7/70033 ,  G03F7/70625 ,  G03F7/70633 ,  G03F2007/2067 ,  G21K5/04 ,  H05G2/00

Abstract: An method for generating illuminating radiation in an illumination apparatus for use in an inspection apparatus for use in lithographic processes is described. A driving radiation beam is provided that comprises a plurality of radiation pulses. The beam is split into first and second pluralities of driving radiation pulses. Each plurality of driving radiation pulses has a controllable characteristic. The first and second pluralities may be used to generate an illuminating radiation beam with an output wavelength spectrum. The first and second controllable characteristics are controlled so as to control first and second portions respectively of the output wavelength spectrum of the illuminating radiation beam.

公开(公告)号：US20220326152A1

公开(公告)日：2022-10-13

申请号：US17639845

申请日：2020-09-04

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Johannes Hendrikus SCHELLEKENS ,  David O'DWYER ,  Nan LIN ,  Gerrit Jacobus Hendrik BRUSSAARD

IPC: G01N21/47 ,  G02F1/35 ,  G03F7/20

Abstract: A high harmonic generation assembly and method for generating high harmonic radiation. The assembly comprises a cavity configured to receive input radiation and increase the intensity of the input radiation inside the cavity for forming drive radiation suitable for use in high harmonic generation. The assembly further comprises an interaction region within the cavity at which, in use, a medium is present, the medium being configured to generate harmonic radiation by high harmonic generation when the drive radiation is incident thereupon, and an optical assembly configured to direct the drive radiation to pass through the interaction region, and comprising an output coupler comprising an aperture through which at least a part of the generated harmonic radiation is able to exit the cavity. The optical assembly is further configured to shape the drive radiation into a converging hollow beam before the drive radiation passes through the interaction region.

公开(公告)号：US20170315456A1

公开(公告)日：2017-11-02

申请号：US15487558

申请日：2017-04-14

Applicant: ASML Netherlands B.V.

Inventor： Nan LIN ,  Arie Jeffrey DEN BOEF ,  Sander Bas ROOBOL ,  Simon Gijsbert Josephus MATHIJSSEN ,  Niels GEYPEN

IPC: G03F7/20 ,  H01S3/16 ,  H01S3/00 ,  G01B11/24 ,  G02F1/37 ,  G02F1/355 ,  H01S3/13

CPC classification number: G03F7/70616 ,  G01B11/24 ,  G01N21/9501 ,  G02F1/3551 ,  G02F1/37 ,  G03F7/70625 ,  G03F7/70633 ,  H01S3/0092 ,  H01S3/1305 ,  H01S3/1625 ,  H01S3/1636

Abstract: Disclosed is a method of performing a measurement in an inspection apparatus, and an associated inspection apparatus and HHG source. The method comprises configuring one or more controllable characteristics of at least one driving laser pulse of a high harmonic generation radiation source to control the output emission spectrum of illumination radiation provided by the high harmonic generation radiation source; and illuminating a target structure with said illuminating radiation. The method may comprise configuring the driving laser pulse so that the output emission spectrum comprises a plurality of discrete harmonic peaks. Alternatively the method may comprise using a plurality of driving laser pulses of different wavelengths such that the output emission spectrum is substantially monochromatic.

公开(公告)号：US20170184511A1

公开(公告)日：2017-06-29

申请号：US15388463

申请日：2016-12-22

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey DEN BOEF ,  Simon Gijsbert Josephus MATHIJSSEN ,  Nan LIN ,  Sander Bas ROOBOL

IPC: G01N21/88 ,  G03F7/20

CPC classification number: G01N21/8806 ,  G01N2021/8822 ,  G01N2201/061 ,  G03F7/70191 ,  G03F7/70483 ,  G03F7/7065 ,  G03F9/7049 ,  G03F9/7065

Abstract: A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). The lithographic apparatus has an inspection apparatus with an illumination system that utilizes illuminating radiation with a wavelength of 2-40 nm. The illumination system includes an optical element that splits the illuminating radiation into a first and a second illuminating radiation and induces a time delay to the first or the second illuminating radiation. A detector detects the radiation that has been scattered by a target structure. The inspection apparatus has a processing unit operable to control a time delay between the first scattered radiation and the second scattered radiation so as to optimize a property of the combined first and second scattered radiation.