公开(公告)号：US20190155171A1

公开(公告)日：2019-05-23

申请号：US16254896

申请日：2019-01-23

Applicant: ASML Netherlands B.V.

Inventor： Nan LIN ,  Arie Jeffrey Den Boeff ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Niels Geypen

IPC: G03F7/20 ,  G01N21/95 ,  G02F1/355 ,  H01S3/16 ,  G01B11/24 ,  H01S3/00 ,  H01S3/13 ,  G02F1/37

CPC classification number: G03F7/70616 ,  G01B11/24 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8845 ,  G02F1/3551 ,  G02F1/37 ,  G03F7/70625 ,  G03F7/70633 ,  H01S3/0092 ,  H01S3/1305 ,  H01S3/1625 ,  H01S3/1636

Abstract: Disclosed is a method of performing a measurement in an inspection apparatus; and an associated inspection apparatus and HHG source. The method comprises configuring one or more controllable characteristics of at least one driving laser pulse of a high harmonic generation radiation source to control the output emission spectrum of illumination radiation provided by the high harmonic generation radiation source; and illuminating a target structure with said illuminating radiation. The method may comprise configuring the driving laser pulse so that the output emission spectrum comprises a plurality of discrete harmonic peaks. Alternatively the method may comprise using a plurality of driving laser pulses of different wavelengths such that the output emission spectrum is substantially monochromatic.