知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

5 records (took 0.01 seconds)

    Reticle Heater to Keep Reticle Heating Uniform
    1.
    发明申请
    Reticle Heater to Keep Reticle Heating Uniform 审中-公开
    标线加热器保持标线加热均匀

    公开(公告)号：US20150212432A1

    公开(公告)日：2015-07-30

    申请号：US14429340

    申请日：2013-08-26

    Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

    Inventor： Johannes Onvlee ,  Christopher J. Mason ,  Earl William Ebert ,  Peter A. Delmastro

    IPC: G03F7/20

    CPC classification number: G03F7/70875 ,  G03F7/708

    Abstract: Systems and methods are disclosed for controlling the heating of a reticle. In one embodiment, a plurality of radiation sources generates a plurality of radiation beams (206) and delivers them to a patterning device (210) that absorbs a portion of the radiation from the beams and develops a spatially dependent heating profile. In a further embodiment, a plurality of resistive heating sources (906) generates heat in response to an applied voltage or current. The generated heat is absorbed by the patterning device from the resistive heating sources and leads to the development of a spatially dependent heating profile. Thermal stresses, strains, and deformations can be controlled by controlling the spatially dependent heating profile.

    Abstract translation: 公开了用于控制掩模版加热的系统和方法。 在一个实施例中，多个辐射源产生多个辐射束（206）并且将它们传送到图案形成装置（210），该图案形成装置吸收来自光束的一部分辐射并产生空间上依赖的加热曲线。 在另一实施例中，多个电阻加热源（906）响应于所施加的电压或电流产生热量。 产生的热量被图案形成装置从电阻加热源吸收并导致空间依赖的加热曲线的发展。 可以通过控制空间依赖的加热曲线来控制热应力，应变和变形。

    Tunable wavelength illumination system
    2.
    发明授权
    Tunable wavelength illumination system 有权
    可调波长照明系统

    公开(公告)号：US08730476B2

    公开(公告)日：2014-05-20

    申请号：US13898973

    申请日：2013-05-21

    Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

    Inventor： Arie Jeffrey Den Boef ,  Earl William Ebert ,  Harry Sewell ,  Keith Andersen ,  Sanjeev K. Singh

    IPC: G01B11/00

    CPC classification number: G03F7/70141 ,  G01B11/14 ,  G02F1/116 ,  G03F7/70191 ,  G03F9/7065

    Abstract: A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable narrow pass-band filter filters the broad-band radiation into narrow-band linearly polarized radiation. The narrow-band radiation may be focused on alignment targets of a wafer so as to enable alignment of the wafer. In an embodiment, the filter is configured to modulate an intensity and wavelength of radiation produced by the radiation source and to have multiple simultaneous pass-bands. The radiation source generates radiation that has high spatial coherence and low temporal coherence.

    Abstract translation: 光刻设备具有对准系统，其包括被配置为将窄带辐射转换成连续，平坦和宽带辐射的辐射源。 声可调窄带通滤波器将宽带辐射滤波成窄带线偏振辐射。 窄带辐射可以聚焦在晶片的对准目标上，以便能够对准晶片。 在一个实施例中，滤波器被配置为调制由辐射源产生的辐射的强度和波长并且具有多个同时的通带。 辐射源产生具有高空间相干性和低时间相干性的辐射。

Patent Agency Ranking