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公开(公告)号：US10598483B2
公开(公告)日：2020-03-24
申请号：US15683010
申请日：2017-08-22
摘要： Disclosed is a method of determining a characteristic of a target on a substrate and corresponding metrology apparatus and computer program. The method comprises determining a plurality of intensity asymmetry measurements from pairs of complementary pixels comprising a first image pixel in a first image of the target and a second image pixel in a second image of the target. The first image is obtained from first radiation scattered by the target and the second image is obtained from second radiation scattered by the target, the first radiation and second radiation comprising complementary non-zero diffraction orders. The characteristic of the target is then determined from said plurality of intensity asymmetry measurements.
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公开(公告)号：US12105432B2
公开(公告)日：2024-10-01
申请号：US17625640
申请日：2020-07-07
发明人： Narjes Javaheri , Maurits Van Der Schaar , Tieh-Ming Chang , Hilko Dirk Bos , Patrick Warnaar , Samira Bahrami , Mohammadreza Hajiahmadi , Sergey Tarabrin , Mykhailo Semkiv
IPC分类号： G03F7/00
CPC分类号： G03F7/70633
摘要： Disclosed is a method comprising measuring radiation reflected from a metrology target and decomposing the measured radiation in components, for example Fourier components or spatial components. Further, there is disclosed a recipe selection method which provides an algorithm to select a parameter of the metrology apparatus based on re-calculated dependencies of 5 the measured radiation based on single components.
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公开(公告)号：US10691031B2
公开(公告)日：2020-06-23
申请号：US16116437
申请日：2018-08-29
发明人： Sergey Tarabrin
IPC分类号： G03F7/20
摘要： A method, includes illuminating a structure of a metrology target with radiation having a linear polarization in a first direction, receiving radiation redirected from the structure to a polarizing element, wherein the polarizing element has a polarization splitting axis at an angle to the first direction, and measuring, using the sensor system, an optical characteristic of the redirected radiation.
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公开(公告)号：US10795269B2
公开(公告)日：2020-10-06
申请号：US16170786
申请日：2018-10-25
发明人： Zili Zhou , Gerbrand Van Der Zouw , Nitesh Pandey , Markus Gerardus Martinus Maria Van Kraaij , Martinus Hubertus Maria Van Weert , Anagnostis Tsiatmas , Sergey Tarabrin , Hilko Dirk Bos
摘要： The disclosure relates to methods of determining a value of a parameter of interest of a patterning process, and of cleaning a signal containing information about the parameter of interest. In one arrangement, first and second detected representations of radiation are obtained. The radiation is provided by redirection of polarized incident radiation by a structure. The first and second detected representations are derived respectively from first and second polarization components of the redirected radiation. An asymmetry in the first detected representation comprises a contribution from the parameter of interest and a contribution from one or more other sources of asymmetry. An asymmetry in the second detected representation comprises a larger contribution from said one or more other sources of asymmetry relative to a contribution from the parameter of interest. A combination of the first and second detected representations is used to determine a value of the parameter of interest.
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公开(公告)号：US20180073866A1
公开(公告)日：2018-03-15
申请号：US15683010
申请日：2017-08-22
摘要： Disclosed is a method of determining a characteristic of a target on a substrate and corresponding metrology apparatus and computer program. The method comprises determining a plurality of intensity asymmetry measurements from pairs of complementary pixels comprising a first image pixel in a first image of the target and a second image pixel in a second image of the target. The first image is obtained from first radiation scattered by the target and the second image is obtained from second radiation scattered by the target, the first radiation and second radiation comprising complementary non-zero diffraction orders. The characteristic of the target is then determined from said plurality of intensity asymmetry measurements.
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公开(公告)号：US11409204B2
公开(公告)日：2022-08-09
申请号：US16881991
申请日：2020-05-22
发明人： Sergey Tarabrin
IPC分类号： G03F7/20
摘要： A method, includes illuminating a structure of a metrology target with radiation having a linear polarization in a first direction, receiving radiation redirected from the structure to a polarizing element, wherein the polarizing element has a polarization splitting axis at an angle to the first direction, and measuring, using the sensor system, an optical characteristic of the redirected radiation.
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公开(公告)号：US11150563B2
公开(公告)日：2021-10-19
申请号：US16708509
申请日：2019-12-10
发明人： Sergei Sokolov , Sergey Tarabrin , Su-Ting Cheng , Armand Eugene Albert Koolen , Markus Franciscus Antonius Eurlings , Koenraad Remi André Maria Schreel
IPC分类号： G03F7/20
摘要： A technique of measuring a parameter of a patterning process is disclosed. In one arrangement, a target, formed by the patterning process, is illuminated. A sub-order diffraction component of radiation scattered from the target is detected and used to determine the parameter of the patterning process.
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公开(公告)号：US11042100B2
公开(公告)日：2021-06-22
申请号：US16410250
申请日：2019-05-13
发明人： Jin Lian , Zili Zhou , Duygu Akbulut , Sergey Tarabrin
IPC分类号： G03F7/20
摘要： The disclosure relates to measuring a target. In one arrangement, a measurement apparatus is provided that has an optical system configured to illuminate a target with radiation and direct reflected radiation from the target to a sensor. A programmable spatial light modulator in a pupil plane of the optical system is programmed to redirect light in each of a plurality of pupil plane zones in such a way as to form a corresponding plurality of images at different locations on the sensor. Each image is formed by radiation passing through a different respective one of the pupil plane zones.
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公开(公告)号：US10599048B2
公开(公告)日：2020-03-24
申请号：US16169514
申请日：2018-10-24
摘要： Metrology apparatus and methods are disclosed for measuring a structure formed on a substrate. In one arrangement, different components of a radiation beam are selectively extracted after reflection from the structure and independently detected. For each component, radiation is selected from one of a plurality of predetermined regions in a downstream pupil plane of the optical system downstream from the structure. Radiation is further selected from one of two predetermined orthogonal polarization states. The predetermined orthogonal polarization states are oriented differently as a pair for each of at least a subset of components comprising radiation selected from different predetermined regions in the downstream pupil plane.
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10.发明授权公开(公告)号：US10585048B2
公开(公告)日：2020-03-10
申请号：US16385651
申请日：2019-04-16
发明人： Samee Ur Rehman , Anagnostis Tsiatmas , Sergey Tarabrin , Joannes Jitse Venselaar , Alexandru Onose , Mariya Vyacheslavivna Medvedyeva
IPC分类号： G03F7/20 , G01N21/95 , G01N21/956 , G03F9/00
摘要： Methods of determining a value of a parameter of interest are disclosed. In one arrangement, a symmetric component and an asymmetric component of a detected pupil representation from illuminating a target are derived. A first metric characterizing the symmetric component and a second metric characterizing the asymmetric component vary non-monotonically as a function of the parameter of interest over a reference range of values of the parameter of interest. A combination of the derived symmetric component and the derived asymmetric component are used to identify a correct value from a plurality of candidate values of the parameter of interest.
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