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公开(公告)号：US11703771B2
公开(公告)日：2023-07-18
申请号：US17773003
申请日：2020-10-12
发明人： Ali Alsaqqa , Fadi El-Ghussein , Lambertus Gerardus Maria Kessels , Roxana Rezvani Naraghi , Krishanu Shome , Timothy Allan Brunner , Sergei Sokolov
CPC分类号： G03F9/7019 , G03F9/7076
摘要： A calibration system includes a plate, a fixed alignment mark, and a variable diffraction grating. The plate is adjacent to a wafer alignment mark disposed on a wafer. The fixed alignment mark is disposed on the plate and is configured to act as a reference mark for an initial calibration of the calibration system. The variable diffraction grating is disposed on the plate and includes a plurality of unit cells configured to form a plurality of variable alignment marks. The variable diffraction grating is configured to calibrate a shift-between-orders of one of the variable alignment marks and the fixed alignment mark.
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2.发明授权公开(公告)号：US11022899B2
公开(公告)日：2021-06-01
申请号：US16693453
申请日：2019-11-25
发明人： Fahong Li , Sergei Sokolov
摘要： Disclosed is a method of measuring a focus parameter relating to formation of a structure using a lithographic process, and associated metrology device. The method comprises obtaining measurement data relating to a cross-polarized measurement of said structure; and determining a value for said focus parameter based on the measurement data.
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公开(公告)号：US11762305B2
公开(公告)日：2023-09-19
申请号：US17782570
申请日：2020-11-16
IPC分类号： G03F9/00
CPC分类号： G03F9/7088 , G03F9/7065 , G03F9/7092
摘要： Disclosed is a method for determining a stage position or correction therefor in a lithographic process. The method comprises obtaining transmission data describing the transmission of alignment radiation onto the substrate; obtaining position data relating to a stage position of said stage and/or a sensor position of said sensor. A weighting is determined for the position data based on said transmission data. The position based on said transmission data, position data and weighting.
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公开(公告)号：US10788757B2
公开(公告)日：2020-09-29
申请号：US16379267
申请日：2019-04-09
摘要： Disclosed is a method of mitigating for a process dependent stray light artifact on a measurement a structure. The method comprises obtaining a calibration scaling factor for the process dependent stray light artifact based on a reference angle resolved measurement and target angle resolved measurement, and a correction of an image with the obtained calibration scaling factor.
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公开(公告)号：US20190317413A1
公开(公告)日：2019-10-17
申请号：US16379267
申请日：2019-04-09
摘要： Disclosed is a method of mitigating for a process dependent stray light artifact on a measurement a structure. The method comprises obtaining a calibration scaling factor for the process dependent stray light artifact based on a reference angle resolved measurement and target angle resolved measurement, and a correction of an image with the obtained calibration scaling factor.
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公开(公告)号：US11181828B2
公开(公告)日：2021-11-23
申请号：US16601778
申请日：2019-10-15
发明人： Patrick Warnaar , Hilko Dirk Bos , Hendrik Jan Hidde Smilde , Mohammadreza Hajiahmadi , Lukasz Jerzy Macht , Karel Hendrik Wouter Van Den Bos , Sergei Sokolov , Lucas Tijn Kunneman
摘要： Techniques for determining a value of a parameter of interest of a patterning process are described. One such technique involves obtaining a plurality of calibration data units from one or more targets in a metrology process. Each calibration data unit of at least two of the calibration data units represents detected radiation obtained using different respective polarization settings in the metrology process, each polarization setting defining a polarization property of incident radiation of the metrology process and of detected radiation of the metrology process. The calibration data units are used to obtain calibration information about the metrology process. A measurement data unit representing detected radiation scattered from a further target is obtained, the further target having a structure formed using the patterning process on the substrate or on a further substrate. A value of the parameter of interest is determined using the measurement data unit and the obtained calibration information.
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公开(公告)号：US11150563B2
公开(公告)日：2021-10-19
申请号：US16708509
申请日：2019-12-10
发明人： Sergei Sokolov , Sergey Tarabrin , Su-Ting Cheng , Armand Eugene Albert Koolen , Markus Franciscus Antonius Eurlings , Koenraad Remi André Maria Schreel
IPC分类号： G03F7/20
摘要： A technique of measuring a parameter of a patterning process is disclosed. In one arrangement, a target, formed by the patterning process, is illuminated. A sub-order diffraction component of radiation scattered from the target is detected and used to determine the parameter of the patterning process.
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8.发明授权公开(公告)号：US10831107B2
公开(公告)日：2020-11-10
申请号：US16556685
申请日：2019-08-30
发明人： Sergei Sokolov , Jin Lian
IPC分类号： G03F7/20
摘要： Disclosed method of measuring a parameter relating to a structure formed using a lithographic process, and more specifically focus or line edge roughness. The method includes measuring a structure having a dimension, e.g., a critical dimension, which is sufficiently large to enable radiation diffracted by at least one edge of said structure to be (e.g., individually) optically resolved. The method comprises obtaining an intensity metric from an image of the at least one edge and determining a value for said parameter based on the intensity metric.
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