公开(公告)号：US20160056024A1

公开(公告)日：2016-02-25

申请号：US14522066

申请日：2014-10-23

Applicant: APPLIED MATERIALS, INC.

Inventor： WILLIAM JOHANSON ,  FUHONG ZHANG ,  ADOLPH MILLER ALLEN ,  YU LIU

IPC: H01J37/34 ,  C23C14/34

CPC classification number: H01J37/347 ,  C23C14/3492 ,  C23C14/50 ,  C23C14/54 ,  C23C14/542 ,  H01J37/32623 ,  H01J37/32733 ,  H01J2237/026

Abstract: Embodiments of improved methods and apparatus for maintaining low non-uniformity over the course of the life of a target are provided herein. In some embodiments, a method of processing a substrate in a physical vapor deposition chamber includes: disposing a substrate atop a substrate support having a cover ring that surrounds the substrate support such that an upper surface of the substrate is positioned at a first distance above an upper surface of the cover ring; sputtering a source material from a target disposed opposite the substrate support to deposit a film atop the substrate while maintaining the first distance; and lowering the substrate support with respect to the cover ring and sputtering the source material from the target to deposit films atop subsequent substrates over a life of the target.

Abstract translation: 本文提供了用于在目标寿命期间保持低不均匀性的改进方法和装置的实施例。 在一些实施例中，在物理气相沉积室中处理衬底的方法包括：在衬底支撑件顶部设置衬底，衬底支撑件具有围绕衬底支撑件的覆盖环，使得衬底的上表面位于第一距离 盖环的上表面; 从与衬底支撑件相对布置的靶溅射源材料，以在保持第一距离的同时在衬底上沉积膜; 以及相对于所述盖环降低所述基板支撑件并从所述靶溅射所述源材料以在所述目标的寿命期间将膜沉积在随后的基板上。

公开(公告)号：US20190259586A1

公开(公告)日：2019-08-22

申请号：US16403970

申请日：2019-05-06

Applicant: APPLIED MATERIALS, INC.

Inventor： WILLIAM JOHANSON ,  FUHONG ZHANG ,  YU Y. LIU ,  ADOLPH MILLER ALLEN

IPC: H01J37/34 ,  C23C14/54 ,  C23C14/50 ,  C23C14/34 ,  H01J37/32

Abstract: Embodiments of improved apparatus for maintaining low non-uniformity over the life of a target are provided herein. In some embodiments, an apparatus includes a substrate support within a volume of a chamber body, opposite a target assembly of a lid atop the chamber body, with a surface; a shield disposed within the chamber body comprising one or more sidewalls surrounding the volume, the shield extending downward to below a top surface of the substrate support, radially inward, and returning upward forming an extending lip; and a first ring having (i) a first portion comprising an opening having a ceramic isolator, disposed therein, resting on top of the extending lip, and (ii) a second portion extending away from the first portion toward the surface, wherein the substrate support, over a life of the target, is configured to raise and lower, relative to the first ring, a substrate disposed on the surface.

公开(公告)号：US20150075982A1

公开(公告)日：2015-03-19

申请号：US14483909

申请日：2014-09-11

Applicant: Applied Materials, Inc.

Inventor： GOICHI YOSHIDOME ,  FUHONG ZHANG

IPC: H01J37/34 ,  H01F38/00 ,  C23C14/35 ,  H01F7/02

CPC classification number: H01J37/3455 ,  C23C14/35 ,  H01F7/0273 ,  H01J37/3452

Abstract: A magnetic field forming apparatus includes a support member having a first side and a second side coupling a first end to a second end and an axis of rotation between the first end and the second end; a first body coupled to the first end of the support member and extending away from the first side of the support member, wherein the first body has a plurality of first magnets coupled to a bottom of the first body; a second body rotatably coupled to the second end of the support member and extending away from the second side of the support member, wherein the second body has a plurality of second magnets coupled to a bottom of the second body, wherein the plurality of the first magnets are disposed about 180 degrees from the plurality of second magnets with respect to the axis of rotation of the support member.

Abstract translation: 磁场形成装置包括：支撑构件，其具有将第一端与第二端和第一端与第二端之间的旋转轴线联接的第一侧和第二侧; 第一主体，其联接到所述支撑构件的第一端并且远离所述支撑构件的第一侧延伸，其中所述第一主体具有联接到所述第一主体的底部的多个第一磁体; 第二主体，其可旋转地联接到所述支撑构件的第二端并且远离所述支撑构件的第二侧延伸，其中所述第二主体具有联接到所述第二主体的底部的多个第二磁体，其中所述多个所述第一主体 磁体相对于支撑构件的旋转轴线从多个第二磁体设置为大约180度。

公开(公告)号：US20200051795A1

公开(公告)日：2020-02-13

申请号：US16285043

申请日：2019-02-25

Applicant: APPLIED MATERIALS, INC.

Inventor： CHAO DU ,  YONG CAO ,  CHEN GONG ,  MINGDONG LI ,  FUHONG ZHANG ,  RONGJUN WANG ,  XIANMIN TANG

IPC: H01J37/34 ,  C23C14/34 ,  H01J37/32

Abstract: Embodiments of a process chamber are provided herein. In some embodiments, a process chamber includes a chamber body having an interior volume, a substrate support disposed in the interior volume, a target disposed within the interior volume and opposing the substrate support, a process shield disposed in the interior volume and having an upper portion surrounding the target and a lower portion surrounding the substrate support, the upper portion having an inner diameter that is greater than an outer diameter of the target to define a gap between the process shield and the target, and a gas inlet to provide a gas to the interior volume through the gap or across a front opening of the gap to substantially prevent particles from the interior volume from entering the gap during use.

公开(公告)号：US20160035547A1

公开(公告)日：2016-02-04

申请号：US14725527

申请日：2015-05-29

Applicant: APPLIED MATERIALS, INC.

Inventor： WILLIAM JOHANSON ,  BRIJ DATTA ,  FUHONG ZHANG ,  ADOLPH MILLER ALLEN ,  YU Y. LIU ,  PRASHANTH KOTHNUR

IPC: H01J37/34 ,  C23C14/35

CPC classification number: H01J37/3405 ,  C23C14/35 ,  H01J37/3452 ,  H01J37/3455 ,  H01J37/3461

Abstract: Methods and apparatus for a magnetron assembly are provided herein. In some embodiments, a magnetron assembly includes a shunt plate having a central axis and rotatable about the central axis, a closed loop magnetic pole coupled to a first surface of the shunt plate and disposed 360 degrees along a peripheral edge of the shunt plate, and an open loop magnetic pole coupled at a the first surface of the shunt plate wherein the open loop magnetic pole comprises two rows of magnets disposed about the central axis.

Abstract translation: 本文提供了磁控管组件的方法和装置。 在一些实施例中，磁控管组件包括具有中心轴线并可围绕中心轴线旋转的分流板，耦合到分流板的第一表面并沿分流板的周边边缘设置360度的闭环磁极，以及 耦合在分流板的第一表面处的开环磁极，其中开环磁极包括围绕中心轴设置的两排磁体。