公开(公告)号：US20200051795A1

公开(公告)日：2020-02-13

申请号：US16285043

申请日：2019-02-25

Applicant: APPLIED MATERIALS, INC.

Inventor： CHAO DU ,  YONG CAO ,  CHEN GONG ,  MINGDONG LI ,  FUHONG ZHANG ,  RONGJUN WANG ,  XIANMIN TANG

IPC: H01J37/34 ,  C23C14/34 ,  H01J37/32

Abstract: Embodiments of a process chamber are provided herein. In some embodiments, a process chamber includes a chamber body having an interior volume, a substrate support disposed in the interior volume, a target disposed within the interior volume and opposing the substrate support, a process shield disposed in the interior volume and having an upper portion surrounding the target and a lower portion surrounding the substrate support, the upper portion having an inner diameter that is greater than an outer diameter of the target to define a gap between the process shield and the target, and a gas inlet to provide a gas to the interior volume through the gap or across a front opening of the gap to substantially prevent particles from the interior volume from entering the gap during use.