公开(公告)号：US09799489B2

公开(公告)日：2017-10-24

申请号：US15402500

申请日：2017-01-10

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Hitoshi Tanaka ,  Atsushi Tokuno ,  Shinichi Kojima ,  Akio Yamada

IPC: G03B27/02 ,  G03B27/52 ,  H01J37/30 ,  H01J37/317 ,  H01J37/09 ,  H01J37/065

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/065 ,  H01J37/09 ,  H01J37/10 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/06308 ,  H01J2237/0835 ,  H01J2237/31754

Abstract: The invention provides an exposure apparatus (100) including a formation module (122) which forms charged particle beams with different irradiation positions on a specimen. The formation module (122) includes: a particle source (20) which emits the charged particle beams from an emission region (21) in which a width in a longitudinal direction is different from and a width in a lateral direction orthogonal to the longitudinal direction; an aperture array device (60) provided with openings (62) arranged in an illuminated region (61) in which a width in a longitudinal direction is different from a width in a lateral direction orthogonal to the longitudinal direction; illumination lenses (30, 50) provided between the particle source (20) and the aperture array device (60); and a beam cross-section deformation device (40) which is provided between the particle source (20) and the aperture array device (60), and deforms a cross-sectional shape of the charged particle beams into an anisotropic shape by an action of a magnetic field or an electric field.

公开(公告)号：US09213240B2

公开(公告)日：2015-12-15

申请号：US14632944

申请日：2015-02-26

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Masaki Kurokawa ,  Masahiro Takizawa

IPC: G03F7/20 ,  G03F1/20 ,  H01J37/317 ,  G03F1/50

CPC classification number: G03F7/2037 ,  G03F1/20 ,  G03F1/50 ,  G03F7/2063 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/31776

Abstract: An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.

Abstract translation: 电子束曝光方法包括以下步骤：制备具有通过将绘制对象图案划分为可曝光区域而形成的多个开口图案的曝光掩模; 以及通过利用穿过曝光掩模的开口图案的电子束进行曝光来画出绘制对象图案。 作为曝光掩模的每个开口图案中的接头的每个端部设置有在开口图案的宽度上渐缩的接合部。 以这样的方式进行曝光，使得通过相邻的接合部分拉出的部分彼此重叠。

公开(公告)号：US20150243482A1

公开(公告)日：2015-08-27

申请号：US14632944

申请日：2015-02-26

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Masaki Kurokawa ,  Masahiro Takizawa

IPC: H01J37/317

CPC classification number: G03F7/2037 ,  G03F1/20 ,  G03F1/50 ,  G03F7/2063 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/31776

Abstract: An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.

Abstract translation: 电子束曝光方法包括以下步骤：制备具有通过将绘制对象图案划分为可曝光区域而形成的多个开口图案的曝光掩模; 以及通过利用穿过曝光掩模的开口图案的电子束进行曝光来画出绘制对象图案。 作为曝光掩模的每个开口图案中的接头的每个端部设置有在开口图案的宽度上渐缩的接合部。 以这样的方式进行曝光，使得通过相邻的接合部分拉出的部分彼此重叠。

公开(公告)号：US11458561B2

公开(公告)日：2022-10-04

申请号：US16344359

申请日：2017-01-12

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Shinji Sugatani ,  Masayuki Takahashi ,  Masahiro Takizawa

IPC: B23K15/00 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  H01J37/06 ,  H01J37/141 ,  H01J37/147 ,  H01J37/305 ,  H01J29/56

Abstract: To provide a three-dimensional printing device that irradiates approximately the same ranges on the surface of a powder layer simultaneously with a plurality of electron beams having different beam shapes. An electron beam column 200 of the three-dimensional printing device 100 includes a plurality of electron sources 20 including electron sources having anisotropically-shaped beam generating units, and beam shape deforming elements 30 that deform the beam shapes of electron beams output from the electron sources 20 on a surface 63 of a powder layer 62. A deflector 50 included in the electron beam column 200 deflects an electron beam output from each of the plurality of electron sources 20 by a distance larger than the beam space between electron beams before passing through the deflector 50.

公开(公告)号：US20150200074A1

公开(公告)日：2015-07-16

申请号：US14562095

申请日：2014-12-05

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Masaki Kurokawa ,  Shinji Sugatani ,  Akio Yamada

IPC: H01J37/317 ,  H01J37/30

CPC classification number: H01J37/3177 ,  H01J37/3007 ,  H01J2237/0435 ,  H01J2237/0453

Abstract: Provided is a charged particle beam exposure apparatus configured as follows. An electron beam emitted from an electron gun is deformed by an asymmetric illumination optical system to have an elongated section. The electron beam is then applied to a beam shaping aperture plate provided with a plurality of apertures arranged in a line, thereby generating a plurality of electron beams. Exposure of a predetermined pattern is performed on a semiconductor substrate by moving a stage device in a direction orthogonal to line patterns on the semiconductor substrate and turning the plurality of electron beams on or off in synchronization with the movement of the stage device by use of a blanker plate and a final aperture plate.

Abstract translation: 提供如下配置的带电粒子束曝光装置。 从电子枪发射的电子束由不对称的照明光学系统变形以具有细长的部分。 然后将电子束施加到具有布置成一行的多个孔的束形成孔板，从而产生多个电子束。 通过在半导体衬底上沿垂直于线图案的方向移动舞台装置，并且通过使用第二装置与舞台装置的移动同步地打开或关闭多个电子束来对预定图案进行曝光 挡板和最终孔板。

公开(公告)号：US20170229285A1

公开(公告)日：2017-08-10

申请号：US15402500

申请日：2017-01-10

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Hitoshi Tanaka ,  Atsushi Tokuno ,  Shinichi Kojima ,  Akio Yamada

IPC: H01J37/317 ,  H01J37/065 ,  H01J37/09

CPC classification number: H01J37/3177 ,  H01J37/045 ,  H01J37/065 ,  H01J37/09 ,  H01J37/10 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/06308 ,  H01J2237/0835 ,  H01J2237/31754

Abstract: The invention provides an exposure apparatus (100) including a formation module (122) which forms charged particle beams with different irradiation positions on a specimen. The formation module (122) includes: a particle source (20) which emits the charged particle beams from an emission region (21) in which a width in a longitudinal direction is different from and a width in a lateral direction orthogonal to the longitudinal direction; an aperture array device (60) provided with openings (62) arranged in an illuminated region (61) in which a width in a longitudinal direction is different from a width in a lateral direction orthogonal to the longitudinal direction; illumination lenses (30, 50) provided between the particle source (20) and the aperture array device (60); and a beam cross-section deformation device (40) which is provided between the particle source (20) and the aperture array device (60), and deforms a cross-sectional shape of the charged particle beams into an anisotropic shape by an action of a magnetic field or an electric field.

公开(公告)号：US09478396B2

公开(公告)日：2016-10-25

申请号：US14562095

申请日：2014-12-05

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Masaki Kurokawa ,  Shinji Sugatani ,  Akio Yamada

IPC: H01J37/317 ,  H01J37/30

CPC classification number: H01J37/3177 ,  H01J37/3007 ,  H01J2237/0435 ,  H01J2237/0453

Abstract: Provided is a charged particle beam exposure apparatus configured as follows. An electron beam emitted from an electron gun is deformed by an asymmetric illumination optical system to have an elongated section. The electron beam is then applied to a beam shaping aperture plate provided with a plurality of apertures arranged in a line, thereby generating a plurality of electron beams. Exposure of a predetermined pattern is performed on a semiconductor substrate by moving a stage device in a direction orthogonal to line patterns on the semiconductor substrate and turning the plurality of electron beams on or off in synchronization with the movement of the stage device by use of a blanker plate and a final aperture plate.

Abstract translation: 提供如下配置的带电粒子束曝光装置。 从电子枪发射的电子束由不对称的照明光学系统变形以具有细长的部分。 然后将电子束施加到具有布置成一行的多个孔的束形成孔板，从而产生多个电子束。 通过在半导体衬底上沿垂直于线图案的方向移动舞台装置，并且通过使用第二装置与舞台装置的移动同步地打开或关闭多个电子束来对预定图案进行曝光 挡板和最终孔板。

公开(公告)号：US09116434B2

公开(公告)日：2015-08-25

申请号：US14056651

申请日：2013-10-17

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Masaki Kurokawa ,  Masahiro Takizawa

IPC: G03F1/20 ,  G03F7/20 ,  H01J37/317 ,  G03F1/50

CPC classification number: G03F7/2037 ,  G03F1/20 ,  G03F1/50 ,  G03F7/2063 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/31776

Abstract: An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.

公开(公告)号：US20140120475A1

公开(公告)日：2014-05-01

申请号：US14056651

申请日：2013-10-17

Applicant: ADVANTEST CORPORATION

Inventor： Shinichi Hamaguchi ,  Masaki Kurokawa ,  Masahiro Takizawa

IPC: G03F7/20

CPC classification number: G03F7/2037 ,  G03F1/20 ,  G03F1/50 ,  G03F7/2063 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/31776

Abstract: An electron beam exposure method includes the steps of: preparing an exposure mask having a plurality of opening patterns formed by dividing a drawing object pattern into exposable regions; and drawing the drawing object pattern by performing exposure with an electron beam passing through the opening patterns of the exposure mask. Each end portion serving as a joint in each opening pattern of the exposure mask is provided with a joining portion tapered in a width of the opening pattern. The exposure is performed in such a way that portions drawn through adjacent joining portions overlap each other.

Abstract translation: 电子束曝光方法包括以下步骤：制备具有通过将绘制对象图案划分为可曝光区域而形成的多个开口图案的曝光掩模; 以及通过利用穿过曝光掩模的开口图案的电子束进行曝光来画出绘制对象图案。 作为曝光掩模的每个开口图案中的接头的每个端部设置有在开口图案的宽度上渐缩的接合部。 以这样的方式进行曝光，使得通过相邻的接合部分拉出的部分彼此重叠。