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    Salt, photoresist composition and method for producing photoresist pattern
    2.
    发明授权
    Salt, photoresist composition and method for producing photoresist pattern 有权
    盐，光致抗蚀剂组合物和制造光致抗蚀剂图案的方法

    公开(公告)号：US09051251B2

    公开(公告)日：2015-06-09

    申请号：US13569787

    申请日：2012-08-08

    申请人： Tatsuro Masuyama ,  Yuichi Mukai

    发明人： Tatsuro Masuyama ,  Yuichi Mukai

    IPC分类号： G03F7/004 ,  C07C309/17 ,  C07C309/08 ,  C07C381/12 ,  G03F7/20

    CPC分类号： C07C381/12 ,  C07C309/08 ,  C07C309/17 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/20

    摘要： A photoresist composition which comprises a salt represented by formula (I): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, R1, R2 and R3 each independently represent a hydrogen atom or a C1-C10 monovalent aliphatic saturated hydrocarbon group, X1 and X2 each independently represent a single bond, a carbonyl group, or a C1-C10 divalent aliphatic saturated hydrocarbon group where a hydrogen atom can be replaced by a hydroxy group and where a methylene group can be replaced by an oxygen atom, a sulfonyl group or a carbonyl group, A1 represents a C1-C30 organic group, m1 represents an integer of 1 to 4, and Z+ represents an organic cation, and a resin which is hardly soluble or insoluble but soluble in an aqueous alkali solution by action of an acid.

    摘要翻译： 一种光致抗蚀剂组合物，其包含式（I）表示的盐：其中Q1和Q2各自独立地表示氟原子或C1-C6全氟烷基，R1，R2和R3各自独立地表示氢原子或C1-C10单价脂族 饱和烃基，X 1和X 2各自独立地表示单键，羰基或C 1 -C 10二价脂族饱和烃基，其中氢原子可以被羟基代替，并且其中亚甲基可被氧代替 原子，磺酰基或羰基，A1表示C1-C30有机基团，m1表示1〜4的整数，Z +表示有机阳离子，难溶于或不溶而溶于碱水溶液的树脂 溶液通过酸的作用。

    Photoresist composition
    3.
    发明授权
    Photoresist composition 有权
    光刻胶组成

    公开(公告)号：US08753796B2

    公开(公告)日：2014-06-17

    申请号：US13443155

    申请日：2012-04-10

    申请人： Koji Ichikawa ,  Hiromu Sakamoto ,  Yuichi Mukai

    发明人： Koji Ichikawa ,  Hiromu Sakamoto ,  Yuichi Mukai

    IPC分类号： G03F7/039 ,  G03F7/38

    CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2041

    摘要： The present invention provides a photoresist composition comprising a salt represented by the formula (I): wherein R1 and R2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, X1 represents a C1-C17 divalent saturated hydrocarbon group, etc., s1 represents 1 or 2, and t1 represents 0 or 1, with proviso that sum of s1 and t1 is 1 or 2, R3 represents a C1-C12 saturated hydrocarbon group, etc., u1 represents an integer of 0 to 8, and (Z1)+ represents an organic cation,a salt represented by the formula (II-0): wherein R4 represents a C1-C24 hydrocarbon group etc., X2 represents a C1-C6 alkanediyl group etc., and (Z2)+ represents an organic cation, anda resin being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid.

    摘要翻译： 本发明提供了包含式（I）表示的盐的光致抗蚀剂组合物：其中R1和R2各自独立地表示氟原子或C1-C6全氟烷基，X1表示C1-C17二价饱和烃基等， s1表示1或2，t1表示0或1，条件是s1和t1之和为1或2，R3表示C1-C12饱和烃基等，u1表示0〜8的整数，（ Z1）+表示有机阳离子，式（II-0）表示的盐：其中，R4表示C1-C24烃基等，X2表示C1-C6烷二基等，（Z2）+表示 有机阳离子和在碱性水溶液中不溶或难溶的树脂，但通过酸的作用变得可溶于碱性水溶液。

    Photoresist composition
    4.
    发明授权
    Photoresist composition 有权
    光刻胶组成

    公开(公告)号：US08753795B2

    公开(公告)日：2014-06-17

    申请号：US13428555

    申请日：2012-03-23

    申请人： Koji Ichikawa ,  Hiromu Sakamoto ,  Yuichi Mukai

    发明人： Koji Ichikawa ,  Hiromu Sakamoto ,  Yuichi Mukai

    IPC分类号： G03F7/039 ,  G03F7/30

    CPC分类号： C07D411/12 ,  C07D305/06 ,  C07D307/93 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

    摘要： The present invention provides a photoresist composition containing: a resin which contains a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator and a compound represented by the formula (I): wherein R1, X1, R2, u1, s1, t1 are each defined in the specification, with the proviso that sum of s1 and t1 is 1 or 2.

    摘要翻译： 本发明提供一种光致抗蚀剂组合物，其含有：含有来自具有酸不稳定基团的化合物的结构单元的树脂，其在碱性水溶液中不溶或难溶于碱性水溶液，但通过 酸; 酸产生剂和由式（I）表示的化合物：其中R1，X1，R2，u1，s1，t1各自在说明书中定义，条件是s1和t1的和为1或2。

    Resin, resist composition and method for producing resist pattern
    6.
    发明授权
    Resin, resist composition and method for producing resist pattern 有权
    树脂，抗蚀剂组合物和抗蚀剂图案的制造方法

    公开(公告)号：US08592129B2

    公开(公告)日：2013-11-26

    申请号：US12872817

    申请日：2010-08-31

    申请人： Koji Ichikawa ,  Akira Kamabuchi ,  Yuichi Mukai

    发明人： Koji Ichikawa ,  Akira Kamabuchi ,  Yuichi Mukai

    IPC分类号： G03F7/004 ,  C08F26/06

    CPC分类号： G03F7/0397 ,  C08F220/18 ,  C08F220/30 ,  C08F220/60 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/20 ,  G03F7/2041

    摘要： A resin comprises a structural unit derived from a compound represented by the formula (I); wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that optionally has one or more halogen atoms; X1 represents a C2 to C36 heterocyclic group, one or more hydrogen atoms contained in the heterocyclic group may be replaced by a halogen atom, a hydroxy group, a C1 to C24 hydrocarbon group, a C1 to C12 alkoxyl group, a C2 to C4 acyl group, or a C2 to C4 acyloxy group, and one or more —CH2— contained in the heterocyclic group may be replaced by —CO— or —O—.

    摘要翻译： 树脂包含衍生自由式（I）表示的化合物的结构单元; 其中R1表示任选具有一个或多个卤素原子的氢原子，卤素原子或C1-C6烷基; X1表示C2〜C36杂环基，杂环基中含有的一个或多个氢原子可以被卤素原子，羟基，C1〜C24烃基，C1〜C12烷氧基，C2〜C4酰基 基团或C2〜C4酰氧基，杂环基中所含的一个或多个-CH 2可以被-CO-或-O-代替。

    PHOTORESIST COMPOSITION
    9.
    发明申请
    PHOTORESIST COMPOSITION 有权
    光电组合物

    公开(公告)号：US20120251945A1

    公开(公告)日：2012-10-04

    申请号：US13428555

    申请日：2012-03-23

    申请人： Koji ICHIKAWA ,  Hiromu SAKAMOTO ,  Yuichi MUKAI

    发明人： Koji ICHIKAWA ,  Hiromu SAKAMOTO ,  Yuichi MUKAI

    IPC分类号： G03F7/004 ,  C07D411/12 ,  C07D305/06 ,  G03F7/027 ,  G03F7/20

    CPC分类号： C07D411/12 ,  C07D305/06 ,  C07D307/93 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

    摘要： The present invention provides a photoresist composition containing: a resin which contains a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator and a compound represented by the formula (I): wherein R1, X1, R2, u1, s1, t1 are each defined in the specification, with the proviso that sum of s1 and t1 is 1 or 2.

    摘要翻译： 本发明提供一种光致抗蚀剂组合物，其含有：含有来自具有酸不稳定基团的化合物的结构单元的树脂，其在碱性水溶液中不溶或难溶于碱性水溶液，但通过 酸; 酸产生剂和由式（I）表示的化合物：其中R1，X1，R2，u1，s1，t1各自在说明书中定义，条件是s1和t1的和为1或2。

    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
    10.
    发明申请
    RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN 有权
    耐蚀组合物及其制造方法

    公开(公告)号：US20120219904A1

    公开(公告)日：2012-08-30

    申请号：US13404226

    申请日：2012-02-24

    申请人： Koji ICHIKAWA ,  Yuichi MUKAI ,  Satoshi YAMAMOTO

    发明人： Koji ICHIKAWA ,  Yuichi MUKAI ,  Satoshi YAMAMOTO

    IPC分类号： G03F7/20 ,  G03F7/027

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/124 ,  Y10S430/126

    摘要： A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, and (B) an acid generator represented by the formula (II). wherein R1 represents a hydrogen atom or a methyl group; A1 represents a C1 to C6 alkanediyl group; R2 represents a C1 to C10 hydrocarbon group having a fluorine atom; R3 and R4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; X1 represents an C1 to C17 divalent saturated hydrocarbon group; R5 represents a group having cyclic ether structure; and Z1+ represents an organic cation.

    摘要翻译： 抗蚀剂组合物含有（A1）具有由式（I）表示的结构单元的树脂，（A2）不溶于碱性水溶液或难溶于碱性水溶液的树脂，但通过酸的作用变得可溶于碱性水溶液 ，（B）由式（II）表示的酸发生剂。 其中R1表示氢原子或甲基; A1表示C1〜C6烷二基; R2表示具有氟原子的C1〜C10烃基; R3和R4独立地表示氟原子或C1〜C6全氟烷基; X1表示C1〜C17二价饱和烃基; R5表示具有环醚结构的基团; Z1 +表示有机阳离子。