公开(公告)号：US20100147681A1

公开(公告)日：2010-06-17

申请号：US12334279

申请日：2008-12-12

Applicant: Youming Li ,  Jeffrey Birkmeyer

Inventor： Youming Li ,  Jeffrey Birkmeyer

IPC: C23C14/35

CPC classification number: C23C14/35 ,  H01J37/32623 ,  H01J37/34

Abstract: A physical vapor deposition apparatus includes a vacuum chamber with side walls, a cathode, a radio frequency power supply, a substrate support, and anode, and a shield. The cathode is inside the vacuum chamber and includes a sputtering target. The radio frequency power supply is configured to apply power to the cathode. The substrate support is inside and electrically isolated from the side walls of the vacuum chamber. The anode is inside and electrically connected to the side walls of the vacuum chamber. The shield is inside and electrically connected to the side walls of the vacuum chamber and includes an annular body and a plurality of concentric annular projections extending from the annular body.

Abstract translation: 物理气相沉积装置包括具有侧壁的真空室，阴极，射频电源，基板支撑件和阳极以及屏蔽件。 阴极在真空室内，并包括溅射靶。 射频电源被配置为向阴极施加电力。 衬底支撑件与真空室的侧壁在内部并与之电隔离。 阳极在真空室的侧壁内部并电连接。 屏蔽体内部并电连接到真空室的侧壁，并且包括环形体和从环形体延伸的多个同心的环形突起。

公开(公告)号：US09085152B2

公开(公告)日：2015-07-21

申请号：US12991901

申请日：2009-05-12

Applicant: Jeffrey Birkmeyer ,  Youming Li

Inventor： Jeffrey Birkmeyer ,  Youming Li

IPC: C23F1/12 ,  B41J2/16 ,  H01L21/311 ,  H01L41/332

CPC classification number: B41J2/161 ,  B41J2/1623 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1632 ,  B41J2/1646 ,  H01L21/31138 ,  H01L41/332 ,  Y10T428/24802 ,  Y10T428/24917

Abstract: Piezoelectric material is shaped by plasma etching to form deep features with high aspect ratios, and desired geometries.

Abstract translation: 压电材料通过等离子体蚀刻成形，以形成具有高纵横比和所需几何形状的深度特征。

公开(公告)号：US20130284589A1

公开(公告)日：2013-10-31

申请号：US13460332

申请日：2012-04-30

Applicant: Youming Li ,  Jeffrey Birkmeyer

Inventor： Youming Li ,  Jeffrey Birkmeyer

IPC: C23C14/34

CPC classification number: C23C14/345 ,  C23C14/35 ,  H01J37/32183 ,  H01J37/32651 ,  H01J37/3444

Abstract: A method of physical vapor deposition includes applying a radio frequency signal to a cathode in a physical vapor deposition apparatus, wherein the cathode includes a sputtering target, electrically connecting a chuck in the physical vapor deposition apparatus to an impedance matching network, wherein the chuck supports a substrate, and wherein the impedance matching network includes at least one capacitor, and depositing material from the sputtering target onto the substrate.

Abstract translation: 一种物理气相沉积方法包括在物理气相沉积设备中向阴极施加射频信号，其中阴极包括溅射靶，将物理气相沉积设备中的卡盘电连接到阻抗匹配网络，其中卡盘支撑 衬底，并且其中所述阻抗匹配网络包括至少一个电容器，以及将材料从所述溅射靶材沉积到所述衬底上。

公开(公告)号：US20100147680A1

公开(公告)日：2010-06-17

申请号：US12334253

申请日：2008-12-12

Applicant: Youming Li ,  Jeffrey Birkmeyer

Inventor： Youming Li ,  Jeffrey Birkmeyer

IPC: C23C14/35

CPC classification number: C23C14/08 ,  C23C14/35 ,  H01J37/3408 ,  H01J37/3438 ,  H01J37/3447

Abstract: A physical vapor deposition apparatus includes a vacuum chamber with side walls, a cathode, a radio frequency power supply, a substrate support, a shield, and an anode. The cathode is inside the vacuum chamber, and the cathode includes a sputtering target. The radio frequency power supply is configured to apply power to the cathode. The substrate support is inside and electrically isolated from the side walls of the vacuum chamber. The shield is inside and electrically connected to the side walls of the vacuum chamber. The anode is inside and electrically connected to the side walls of the vacuum chamber. The anode includes an annular body and an annular flange projecting inwardly from the annular body, and the annular flange is positioned to define a volume below the target for the generation of plasma.

Abstract translation: 物理气相沉积装置包括具有侧壁的真空室，阴极，射频电源，基板支撑件，屏蔽件和阳极。 阴极在真空室内，阴极包括溅射靶。 射频电源被配置为向阴极施加电力。 衬底支撑件与真空室的侧壁在内部并与之电隔离。 屏蔽层内部并电连接到真空室的侧壁。 阳极在真空室的侧壁内部并电连接。 阳极包括环形体和从环形体向内突出的环形凸缘，并且环形凸缘被定位成限定靶下方的体积以产生等离子体。

公开(公告)号：US10442195B2

公开(公告)日：2019-10-15

申请号：US15630590

申请日：2017-06-22

Applicant: Yoshikazu Hishinuma ,  Shinya Sugimoto ,  Youming Li ,  Christoph Menzel ,  Mats G. Ottoson ,  Darren Imai

Inventor： Yoshikazu Hishinuma ,  Shinya Sugimoto ,  Youming Li ,  Christoph Menzel ,  Mats G. Ottoson ,  Darren Imai

IPC: B41J2/14 ,  B41J2/145 ,  B41J2/16 ,  H01L41/312 ,  H01L41/047 ,  H01L41/293 ,  H01L41/297

Abstract: A piezoelectric device and method of manufacturing the same and an inkjet head are described. In one embodiment, the inkjet print head comprises a plurality of jets, wherein each of the plurality of jets comprises a nozzle, a pressure chamber connected with the nozzle, a piezoelectric body coupled to the pressure chamber, and an electrode coupled to the piezoelectric body to cause displacement of the piezoelectric body to apply pressure to the pressure chamber in response to a voltage applied to the electrode; and wherein electrodes of two or more of the plurality of jets have different sizes to cause their associated piezoelectric bodies to have a uniform displacement amount when the voltage is applied to the electrodes.

公开(公告)号：US20180370234A1

公开(公告)日：2018-12-27

申请号：US15630590

申请日：2017-06-22

Applicant: Yoshikazu Hishinuma ,  Shinya Sugimoto ,  Youming Li ,  Christoph Menzel ,  Mats G. Ottoson ,  Darren Imai

Inventor： Yoshikazu Hishinuma ,  Shinya Sugimoto ,  Youming Li ,  Christoph Menzel ,  Mats G. Ottoson ,  Darren Imai

IPC: B41J2/14 ,  B41J2/145 ,  B41J2/16 ,  H01L41/047 ,  H01L41/293 ,  H01L41/297 ,  H01L41/312

CPC classification number: B41J2/14201 ,  B41J2/14233 ,  B41J2/145 ,  B41J2/1607 ,  B41J2/161 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/1642 ,  B41J2/1646 ,  B41J2002/14266 ,  B41J2002/14459 ,  B41J2002/14491 ,  H01L41/047 ,  H01L41/0472 ,  H01L41/29 ,  H01L41/293 ,  H01L41/297 ,  H01L41/312

Abstract: A piezoelectric device and method of manufacturing the same and an inkjet head are described. In one embodiment, the inkjet print head comprises a plurality of jets, wherein each of the plurality of jets comprises a nozzle, a pressure chamber connected with the nozzle, a piezoelectric body coupled to the pressure chamber, and an electrode coupled to the piezoelectric body to cause displacement of the piezoelectric body to apply pressure to the pressure chamber in response to a voltage applied to the electrode; and wherein electrodes of two or more of the plurality of jets have different sizes to cause their associated piezoelectric bodies to have a uniform displacement amount when the voltage is applied to the electrodes.

公开(公告)号：US20120177815A1

公开(公告)日：2012-07-12

申请号：US13425003

申请日：2012-03-20

Applicant: Youming Li ,  Jeffrey Birkmeyer

Inventor： Youming Li ,  Jeffrey Birkmeyer

IPC: B05D5/12

CPC classification number: H01L41/0973 ,  B41J2/14233 ,  B41J2/161 ,  B41J2/1642 ,  B41J2/1646 ,  H01L41/1876 ,  H01L41/316 ,  Y10T29/42

Abstract: Piezoelectric actuators having a composition of Pb1.00+x(Zr0.52Ti0.48)1.00−yO3Nby, where x>−0.02 and y>0 are described. The piezoelectric material can have a Perovskite, which can enable good bending action when a bias is applied across the actuator.

Abstract translation: 描述了具有Pb1.00 + x（Zr0.52Ti0.48）1.00-yO3Nby的组成的压电致动器，其中x> -0.02和y> 0。 压电材料可以具有钙钛矿，当跨越致动器施加偏压时，可以实现良好的弯曲作用。

公开(公告)号：US08164234B2

公开(公告)日：2012-04-24

申请号：US12393644

申请日：2009-02-26

Applicant: Youming Li ,  Jeffrey Birkmeyer

Inventor： Youming Li ,  Jeffrey Birkmeyer

IPC: H01L41/087

CPC classification number: H01L41/0973 ,  B41J2/14233 ,  B41J2/161 ,  B41J2/1642 ,  B41J2/1646 ,  H01L41/1876 ,  H01L41/316 ,  Y10T29/42

Abstract: Piezoelectric actuators having a composition of Pb1.00+x(Zr0.52Ti0.48)1.00−yO3Nby, where x>−0.02 and y>0 are described. The piezoelectric material can have a Perovskite, which can enable good bending action when a bias is applied across the actuator.

Abstract translation: 描述了具有Pb1.00 + x（Zr0.52Ti0.48）1.00-yO3Nby的组成的压电致动器，其中x> -0.02和y> 0。 压电材料可以具有钙钛矿，当跨越致动器施加偏压时，可以实现良好的弯曲作用。

公开(公告)号：US08053951B2

公开(公告)日：2011-11-08

申请号：US12603800

申请日：2009-10-22

Applicant: Youming Li ,  Jeffrey Birkmeyer

Inventor： Youming Li ,  Jeffrey Birkmeyer

IPC: H01L41/09

CPC classification number: H01L41/316 ,  H01L41/0815 ,  H01L41/331

Abstract: A MEMS device with a thin piezoelectric actuator is described. A substrate with a first surface has a crystalline orientation prompting layer on the first surface. A piezoelectric portion contacts the crystalline orientation prompting layer and has an orientation corresponding to the orientation of the crystalline orientation prompting layer. A dielectric material surrounds the piezoelectric portion. The dielectric material is formed of an inorganic material.

Abstract translation: 描述了具有薄压电致动器的MEMS器件。 具有第一表面的基底在第一表面上具有结晶取向促进层。 压电部分接触晶体取向促进层并且具有与晶体取向促进层的取向相对应的取向。 电介质材料围绕压电部分。 介电材料由无机材料形成。

公开(公告)号：US08043487B2

公开(公告)日：2011-10-25

申请号：US12334279

申请日：2008-12-12

Applicant: Youming Li ,  Jeffrey Birkmeyer

Inventor： Youming Li ,  Jeffrey Birkmeyer

IPC: C23C14/00

CPC classification number: C23C14/35 ,  H01J37/32623 ,  H01J37/34

Abstract: A physical vapor deposition apparatus includes a vacuum chamber with side walls, a cathode, a radio frequency power supply, a substrate support, and anode, and a shield. The cathode is inside the vacuum chamber and includes a sputtering target. The radio frequency power supply is configured to apply power to the cathode. The substrate support is inside and electrically isolated from the side walls of the vacuum chamber. The anode is inside and electrically connected to the side walls of the vacuum chamber. The shield is inside and electrically connected to the side walls of the vacuum chamber and includes an annular body and a plurality of concentric annular projections extending from the annular body.

Abstract translation: 物理气相沉积装置包括具有侧壁的真空室，阴极，射频电源，基板支撑件和阳极以及屏蔽件。 阴极在真空室内，并包括溅射靶。 射频电源被配置为向阴极施加电力。 衬底支撑件与真空室的侧壁在内部并与之电隔离。 阳极在真空室的侧壁内部并电连接。 屏蔽体内部并电连接到真空室的侧壁，并且包括环形体和从环形体延伸的多个同心的环形突起。