Method and materials for purifying hydride gases, inert gases, and non-reactive gases
    6.
    发明授权
    Method and materials for purifying hydride gases, inert gases, and non-reactive gases 有权
    用于净化氢化物气体,惰性气体和非反应性气体的方法和材料

    公开(公告)号:US06461411B1

    公开(公告)日:2002-10-08

    申请号:US09954239

    申请日:2001-09-17

    Abstract: The invention provides an efficient process by which trace impurities are removed from matrix hydride, inert gases and non-reactive gases, thus decreasing the concentration of the trace gases by a factor of 100-to-10,000, and more specifically to part-per-billion (ppb) or part-per-trillion (ppt) levels. Hydride gases such as ammonia, phosphine and arsine, and inert gases such as nitrogen, helium, hydrogen, and argon are purified by removing trace contaminants such as silane (SiH4), hydrogen sulfide (H2S) and germane (GeH4), along with traces of moisture. The gas purifier materials of this invention include thermally activated aluminas from organic sources, thermally activated modified organic alumina materials, and thermally activated modified aluminas from an inorganic source. The thermally activated alumina materials of this invention are activated by heating the alumina material at a temperature between about 200-1000° C. in an inert atmosphere and maintaining the activated material in an inert atmosphere.

    Abstract translation: 本发明提供了一种从基质氢化物,惰性气体和非反应性气体中除去痕量杂质的有效方法,从而将痕量气体的浓度降低了100至10,000倍,更具体地说, 十亿(ppb)或百万分之一(ppt)。 通过除去痕量污染物如硅烷(SiH4),硫化氢(H2S)和锗烷(GeH4)等痕量的痕迹,可以净化氢气,如氨,膦和胂,以及惰性气体如氮气,氦气,氢气和氩气。 的水分。 本发明的气体净化器材料包括来自有机源的热活化氧化铝,热活化改性有机氧化铝材料和来自无机源的热活化改性氧化铝。 通过在惰性气氛中在约200-1000℃之间的温度下加热氧化铝材料并将活化的材料保持在惰性气氛中来活化本发明的热活化氧化铝材料。

    Removal of impurities from hydrogen-containing materials
    9.
    发明授权
    Removal of impurities from hydrogen-containing materials 有权
    从含氢材料中去除杂质

    公开(公告)号:US08268046B2

    公开(公告)日:2012-09-18

    申请号:US12466272

    申请日:2009-05-14

    Abstract: Methods of purifying hydrogen-containing materials are described. The methods may include the steps of providing a purifier material comprising silica. The silica may be heated at temperature of about 100° C. or more in a dry atmosphere to form activated silica. The activated silica may be contacted with a starting hydrogen-containing material, where the activated silica reduces a concentration of one or more impurity from the starting hydrogen-containing material to form the purified hydrogen-containing material, and where the activated silica does not decompose the purified hydrogen-containing material.

    Abstract translation: 描述了纯化含氢材料的方法。 所述方法可以包括提供包含二氧化硅的净化剂材料的步骤。 二氧化硅可以在约100℃或更高的温度下在干燥气氛中加热以形成活性二氧化硅。 活化的二氧化硅可以与起始含氢材料接触,其中活性二氧化硅从起始含氢材料中降低一种或多种杂质的浓度以形成纯化的含氢材料,并且其中活性二氧化硅不分解 纯化的含氢材料。

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