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    BICYCLE CASSETTE WITH INCREASED TOOTH RATIO
    1.
    发明申请
    BICYCLE CASSETTE WITH INCREASED TOOTH RATIO 有权

    公开(公告)号：US20220258833A1

    公开(公告)日：2022-08-18

    申请号：US17734013

    申请日：2022-04-30

    申请人： Yuan-Shun Li

    发明人： Yuan-Shun Li

    IPC分类号： B62M9/121

    摘要： A bicycle cassette with increased tooth ratio includes a driver body connected to a bicycle rear hub, and multiple cogs which are sequentially mounted to the driver body with equal spacing. An additional cog is mounted to the driver body and located opposite to the rear hub. The additional cog has 8-10 teeth. The tooth ratio is increased by the additional cog and the chainring to break through the limitation of tooth ratio of existing bicycle cassettes, and to increase the number of the gears of the bicycle cassette.

    Method and layout of an integrated circuit
    3.
    发明授权
    Method and layout of an integrated circuit 有权
    集成电路的方法和布局

    公开(公告)号：US09323881B2

    公开(公告)日：2016-04-26

    申请号：US14341130

    申请日：2014-07-25

    申请人： Hsiang-Jen Tseng ,  Ting-Wei Chiang ,  Wei-Yu Chen ,  Ruei-Wun Sun ,  Hung-Jung Tseng ,  Shun Li Chen ,  Li-Chun Tien

    发明人： Hsiang-Jen Tseng ,  Ting-Wei Chiang ,  Wei-Yu Chen ,  Ruei-Wun Sun ,  Hung-Jung Tseng ,  Shun Li Chen ,  Li-Chun Tien

    IPC分类号： G06F17/50 ,  H01L23/482

    CPC分类号： G06F17/5077 ,  G06F17/5068 ,  G06F17/5072 ,  H01L23/4824 ,  H01L2924/0002 ,  H01L2924/00

    摘要： An integrated circuit layout includes a P-type active region and an N-type active region, and a plurality of trunks. The integrated circuit layout further includes a first metal connection connected to the P-type active region; and a second metal connection connected to the N-type active region. Each trunk of the plurality of trunks is electrically connected with the first metal connection and the second metal connection. Each trunk of the plurality of trunks is substantially perpendicular to the first metal connection and the second metal connection. A first trunk of the plurality of trunks has a width wider than a width of other trunks of the plurality of trunks.

    摘要翻译： 集成电路布局包括P型有源区和N型有源区，以及多个树干。 集成电路布局还包括连接到P型有源区的第一金属连接; 以及连接到N型有源区的第二金属连接。 多个树干的每个中继线与第一金属连接和第二金属连接电连接。 多个树干的每个树干基本上垂直于第一金属连接和第二金属连接。 多个树干的第一树干具有比多个树干中的其他树干的宽度宽的宽度。

    METHOD AND LAYOUT OF AN INTEGRATED CIRCUIT
    4.
    发明申请
    METHOD AND LAYOUT OF AN INTEGRATED CIRCUIT 有权
    集成电路的方法和布局

    公开(公告)号：US20140332971A1

    公开(公告)日：2014-11-13

    申请号：US14341130

    申请日：2014-07-25

    申请人： Hsiang-Jen TSENG ,  Ting-Wei CHIANG ,  Wei-Yu CHEN ,  Ruei-Wun SUN ,  Hung-Jung TSENG ,  Shun Li CHEN ,  Li-Chun TIEN

    发明人： Hsiang-Jen TSENG ,  Ting-Wei CHIANG ,  Wei-Yu CHEN ,  Ruei-Wun SUN ,  Hung-Jung TSENG ,  Shun Li CHEN ,  Li-Chun TIEN

    IPC分类号： G06F17/50 ,  H01L23/482

    CPC分类号： G06F17/5077 ,  G06F17/5068 ,  G06F17/5072 ,  H01L23/4824 ,  H01L2924/0002 ,  H01L2924/00

    摘要： An integrated circuit layout includes a P-type active region and an N-type active region, and a plurality of trunks. The integrated circuit layout further includes a first metal connection connected to the P-type active region; and a second metal connection connected to the N-type active region. Each trunk of the plurality of trunks is electrically connected with the first metal connection and the second metal connection. Each trunk of the plurality of trunks is substantially perpendicular to the first metal connection and the second metal connection. A first trunk of the plurality of trunks has a width wider than a width of other trunks of the plurality of trunks.

    摘要翻译： 集成电路布局包括P型有源区和N型有源区，以及多个树干。 集成电路布局还包括连接到P型有源区的第一金属连接; 以及连接到N型有源区的第二金属连接。 多个树干的每个中继线与第一金属连接和第二金属连接电连接。 多个树干的每个树干基本上垂直于第一金属连接和第二金属连接。 多个树干的第一树干具有比多个树干中的其他树干的宽度宽的宽度。

    Lightscribe optical disc drive
    5.
    发明授权
    Lightscribe optical disc drive 失效
    Lightscribe光盘驱动器

    公开(公告)号：US08040367B2

    公开(公告)日：2011-10-18

    申请号：US12369275

    申请日：2009-02-11

    申请人： Wei-Chieh Hu ,  Shih-Ming Hsu ,  Ying-Shun Li ,  Hao-Wen Chang ,  Jung-Fu Chen ,  Chun-Jen Tseng ,  Chih-Ming Yang

    发明人： Wei-Chieh Hu ,  Shih-Ming Hsu ,  Ying-Shun Li ,  Hao-Wen Chang ,  Jung-Fu Chen ,  Chun-Jen Tseng ,  Chih-Ming Yang

    IPC分类号： B41J2/435 ,  G01D15/14

    CPC分类号： G11B23/40

    摘要： An optical disc drive for marking a label side of a lightscribe disc is provided. The optical disc drive includes a spoke detecting device, a traverse assembly frame, a spindle motor PCB and an insulating base. The spoke detecting device is used for detecting spoke patterns on the lightscribe disc. The spindle motor PCB is communicated with the spoke detecting device through a flexible cable. The insulating base is coupled with the frame for supporting the spoke detecting device such that the spoke detecting device is separated from the lightscribe disc by a specified gap.

    摘要翻译： 提供了用于标记光刻盘的标签侧的光盘驱动器。 光盘驱动器包括轮辐检测装置，横动组合框架，主轴电机PCB和绝缘基座。 辐条检测装置用于检测光刻盘上的辐射图案。 主轴电动机PCB通过柔性电缆与辐条检测装置连通。 绝缘基座与框架连接，用于支撑辐条检测装置，使得辐条检测装置与光刻盘分离指定间隙。

    Structure applied to a photolithographic process
    7.
    发明授权
    Structure applied to a photolithographic process 有权
    结构应用于光刻工艺

    公开(公告)号：US07683487B2

    公开(公告)日：2010-03-23

    申请号：US11307006

    申请日：2006-01-19

    申请人： Shun-Li Lin ,  Yun-Chu Lin ,  Wen-Chung Chang ,  Ching-Yi Lee

    发明人： Shun-Li Lin ,  Yun-Chu Lin ,  Wen-Chung Chang ,  Ching-Yi Lee

    IPC分类号： H01L23/48

    CPC分类号： H01L21/0276 ,  H01L21/31144 ,  H01L21/76802

    摘要： A structure applied to a photolithographic process is provided. The structure includes at least a film layer, an optical isolation layer, an anti-reflection coating and a photoresist layer sequentially formed over a substrate. In the photolithographic process, the optical isolation layer stops light from penetrating down to the film layer. Since the optical isolation layer is set up underneath the photoresist layer, light emitted from a light source during photo-exposure is prevented from reflecting from the substrate surface after passing through the film layer. Thus, the critical dimensions of the photolithographic process are unaffected by any change in the thickness of the film layer.

    摘要翻译： 提供了应用于光刻工艺的结构。 该结构至少包括在衬底上顺序形成的膜层，光隔离层，抗反射涂层和光刻胶层。 在光刻工艺中，光隔离层阻止光穿透到膜层。 由于光隔离层被设置在光致抗蚀剂层的下方，因此防止了在曝光期间从光源发出的光在通过膜层之后从基板表面反射。 因此，光刻工艺的临界尺寸不受膜层厚度的任何变化的影响。

    IN-SITU MONITORING AND CONTROLLING SYSTEM FOR CHEMICAL VESSELS OR TANKS
    9.
    发明申请
    IN-SITU MONITORING AND CONTROLLING SYSTEM FOR CHEMICAL VESSELS OR TANKS 审中-公开
    化学船舶或油罐的现场监测和控制系统

    公开(公告)号：US20060011475A1

    公开(公告)日：2006-01-19

    申请号：US10710271

    申请日：2004-06-30

    申请人： Hung-Hsiang Lin ,  Kun-Yang Lin ,  Shun-Li Hong ,  Yuh-Lang Lee ,  Yu-Zen Shen

    发明人： Hung-Hsiang Lin ,  Kun-Yang Lin ,  Shun-Li Hong ,  Yuh-Lang Lee ,  Yu-Zen Shen

    IPC分类号： G01N27/26

    CPC分类号： G01N27/205 ,  G01N17/00

    摘要： An in-situ and real-time monitoring and controlling system for chemical vessels, tanks, reactors or the like is disclosed. The chemical vessels, tanks, or reactors are employed to contain high-purity corrosive chemicals such as acids, alkaline liquids or the like. The monitoring and controlling system encompasses a vessel including a conductive shell and insulating interior lining coated therein. A robust detection electrode is dipped into the chemical liquid contained by the vessel. The detection electrode is electrically connected to a measurement means such as an ohmmeter that is mounted outside the vessel. The measurement means is further electrically connected to the conductive shell. When the interior lining is pitted due to the chemical attack by the chemical liquid and the chemical liquid contacts the conductive shell, the measurement means promptly receives a corresponding signal. According to one preferred embodiment, the measurement means is further connected to a controller unit that can control a semi-conductor-processing unit.

    摘要翻译： 公开了一种用于化学容器，罐，反应器等的原位和实时监测和控制系统。 使用化学容器，罐或反应器来容纳高纯度的腐蚀性化学物质，如酸，碱性液体等。 监测和控制系统包括一个容器，它包括一个导电壳体和一个涂覆在其中的绝缘内部衬里。 将坚固的检测电极浸入容器所含的化学液体中。 检测电极电连接到诸如安装在容器外部的欧姆计的测量装置。 测量装置进一步电连接到导电外壳。 当内衬由于化学液体的化学侵蚀而引起内部化学液体接触导电外壳时，测量装置会迅速接收相应的信号。 根据一个优选实施例，测量装置进一步连接到可控制半导体处理单元的控制器单元。

    [STRUCTURE APPLIED TO A PHOTOLITHOGRAPHIC PROCESS AND METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE]
    10.
    发明申请
    [STRUCTURE APPLIED TO A PHOTOLITHOGRAPHIC PROCESS AND METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE] 有权
    [应用于光刻方法的结构和用于制造半导体器件的方法]

    公开(公告)号：US20050148166A1

    公开(公告)日：2005-07-07

    申请号：US10707632

    申请日：2003-12-26

    申请人： SHUN-LI LIN ,  YUN CHU LIN ,  WEN CHUNG CHANG ,  CHING YI LEE

    发明人： SHUN-LI LIN ,  YUN CHU LIN ,  WEN CHUNG CHANG ,  CHING YI LEE

    IPC分类号： H01L21/027 ,  H01L21/311 ,  H01L21/4763 ,  H01L21/768

    CPC分类号： H01L21/0276 ,  H01L21/31144 ,  H01L21/76802

    摘要： A structure applied to a photolithographic process is provided. The structure comprises at least a film layer, an optical isolation layer, an anti-reflection coating and a photoresist layer sequentially formed over a substrate. In the photolithographic process, the optical isolation layer stops light from penetrating down to the film layer. Since the optical isolation layer is set up underneath the photoresist layer, light emitted from a light source during photo-exposure is prevented from reflecting from the substrate surface after passing through the film layer. Thus, the critical dimensions of the photolithographic process are unaffected by any change in the thickness of the film layer.

    摘要翻译： 提供了应用于光刻工艺的结构。 该结构至少包括在衬底上顺序形成的膜层，光学隔离层，抗反射涂层和光致抗蚀剂层。 在光刻工艺中，光隔离层阻止光穿透到膜层。 由于光隔离层被设置在光致抗蚀剂层的下方，因此防止了在曝光期间从光源发出的光在通过膜层之后从基板表面反射。 因此，光刻工艺的临界尺寸不受膜层厚度的任何变化的影响。