公开(公告)号：US08520217B2

公开(公告)日：2013-08-27

申请号：US12765037

申请日：2010-04-22

Applicant: Toshiyuki Naoi ,  Seima Kato ,  Naoki Kohara ,  Chidane Ouchi

Inventor： Toshiyuki Naoi ,  Seima Kato ,  Naoki Kohara ,  Chidane Ouchi

IPC: G01B11/02 ,  G01B9/02

CPC classification number: G01B9/02097 ,  G01B9/02024 ,  G01B2290/30

Abstract: A Talbot interferometer includes a diffraction grating, an image pickup device, a moving unit configured to move at least one of the diffraction grating and the image pickup device in an optical axis direction of the test object, and a computer configured to adjust a position of the at least one of the diffraction grating and the image pickup device using the moving unit so that a Talbot condition can be met, based on a spatial frequency spectrum obtained from a plurality of interference fringes captured by the image pickup device while moving the at least one of the diffraction grating and the image pickup device using the moving unit.

Abstract translation: Talbot干涉仪包括衍射光栅，图像拾取装置，被配置为沿着测试对象的光轴方向移动衍射光栅和图像拾取装置中的至少一个的移动单元，以及计算机，被配置为调整 所述至少一个所述衍射光栅和所述图像拾取装置使用所述移动单元，从而可以基于从所述图像拾取装置捕获的多个干涉条纹获得的空间频谱，同时至少移动所述至少一个 衍射光栅中的一个和使用移动单元的图像拾取装置。

公开(公告)号：US08472013B2

公开(公告)日：2013-06-25

申请号：US12644714

申请日：2009-12-22

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G01N21/41

CPC classification number: G01N21/41 ,  G01M11/0228 ,  G01M11/0257

Abstract: A refractive index distribution measurement method includes the steps of measuring a first transmission wavefront of a test object by introducing reference light to the test object immersed in a first medium having a first refractive index lower than that of the test object by 0.01 or more, measuring a second transmission wavefront of the test object by introducing the reference light to the test object immersed in a second medium having a second refractive index lower than that of the test object by 0.01 or more and different from the first refractive index, and obtaining a refractive index distribution of the test object based on a measurement result of the first transmission wavefront and a measurement result of the second transmission wavefront.

Abstract translation: 折射率分布测量方法包括以下步骤：通过将参考光引入浸入第一折射率低于测试对象的第一介质的测试对象0.01或更大，测量测试对象的第一透射波前，测量 通过将参考光引入浸入第二折射率低于测试对象的第二折射率的第二介质并且与第一折射率不同的测试对象，将测试对象的第二透射波前， 基于第一发送波阵面的测量结果和第二发送波阵面的测量结果的测试对象的索引分布。

公开(公告)号：US07692799B2

公开(公告)日：2010-04-06

申请号：US12020726

申请日：2008-01-28

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G01B9/02

CPC classification number: G01M11/0264 ,  B82Y10/00 ,  B82Y40/00 ,  G01M11/0271 ,  G03F1/24 ,  G03F1/44 ,  G03F7/706

Abstract: The invention provides a measurement apparatus which measures a wavefront aberration of an optical system to be measured, the apparatus includes a measurement mask which is inserted on an object plane of the optical system to be measured, and includes a plurality of reflection units configured to generate spherical waves by reflecting light, the measurement mask including a reflection layer configured to reflect the light, a first layer which is stacked on the reflection layer, has a plurality of openings, and is made of a first substance, and a second layer which is stacked on the first layer, has a window configured to expose a region in which the plurality of openings are arrayed, and is made of a second substance different from the first substance, wherein the plurality of reflection units are formed by portions of the reflection layer, which are exposed through the plurality of openings.

Abstract translation: 本发明提供了一种测量待测量的光学系统的波前像差的测量装置，该装置包括插入待测量的光学系统的物平面上的测量掩模，并且包括多个反射单元，其被配置为产生 通过反射光的球面波，包括被配置为反射光的反射层的测量掩模，堆叠在反射层上的第一层具有多个开口，并且由第一物质制成，第二层是 堆叠在第一层上，具有窗口，其被配置为暴露多个开口排列的区域，并且由不同于第一物质的第二物质制成，其中多个反射单元由反射层的一部分形成 ，其通过多个开口暴露。

公开(公告)号：US20050117171A1

公开(公告)日：2005-06-02

申请号：US10996381

申请日：2004-11-26

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G01J9/02 ,  G01M11/02 ,  G03F7/20 ,  H01L21/027 ,  G01B9/02

CPC classification number: G03F7/706

Abstract: A measuring method for measuring an interference fringe includes the steps of generating the interference fringe between light that has passed a target optical system, and a reference wave that is generated from part of the light that has passed a mask, determining whether contrast of the interference fringe is higher than a predetermined threshold, and changing a condition of generating the reference wave when the contrast is below the predetermined threshold.

Abstract translation: 用于测量干涉条纹的测量方法包括以下步骤：产生通过目标光学系统的光之间的干涉条纹，以及从已经通过掩模的部分光产生的参考波，确定干涉的对比度 边缘高于预定阈值，并且当对比度低于预定阈值时改变产生参考波的条件。

公开(公告)号：US08508725B2

公开(公告)日：2013-08-13

申请号：US12917521

申请日：2010-11-02

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G01N21/41

CPC classification number: G01N21/41 ,  G01M11/0228 ,  G01M11/025 ,  G01M11/0264

Abstract: The measuring method includes a step of causing reference light to enter an object placed in a first medium to measure a first transmitted wavefront, a step of causing the reference light to enter the object placed in a second medium to measure a second transmitted wavefront, a step of measuring first and second placement positions where the object is placed in the first and second media, and a calculating step of calculating an internal refractive index distribution of the object by using measurement results of the first and second transmitted wavefronts. The calculating step calculates the internal refractive index distribution from which a shape component of the object is removed by using the measurement results of the first and second transmitted wavefronts, and first and second reference transmitted wavefronts of a reference object to be placed at positions identical to the first and second placement positions.

Abstract translation: 测量方法包括使参考光进入放置在第一介质中的物体以测量第一透射波前的步骤，使参考光进入放置在第二介质中的物体以测量第二透射波前的步骤， 测量物体放置在第一和第二介质中的第一和第二放置位置的步骤，以及通过使用第一和第二发射波前的测量结果来计算物体的内部折射率分布的计算步骤。 计算步骤通过使用第一和第二发送波前的测量结果以及参考对象的第一和第二参考发射波阵面来计算内部折射率分布，该折射率分布从物体的形状分量被去除， 第一和第二放置位置。

公开(公告)号：US08477297B2

公开(公告)日：2013-07-02

申请号：US13305827

申请日：2011-11-29

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G01N21/41

CPC classification number: B29D11/0098 ,  G01M11/0228

Abstract: The method measures first transmitted wavefronts and second transmitted wavefronts by respectively causing reference light to enter an object placed in plural placement states in a first medium and a second medium, calculates an aberration sensitivity with respect to changes of the placement state of the object, and calculates an alignment error of the object in each placement state by using the aberration sensitivity and the first and second transmitted wavefronts measured in each placement state. The method further calculates first and second reference transmitted wavefronts respectively acquirable when causing the reference light to enter the reference object placed in placement states including the alignment errors in the first medium and the second medium, and calculates a refractive index distribution of the object which a shape component thereof is removed, by using the first and second transmitted wavefronts and the first and second reference transmitted wavefronts.

Abstract translation: 该方法通过分别使参考光进入第一介质和第二介质中放置在多个放置状态的物体来测量第一透射波前和第二透射波前，相对于物体的放置状态的变化计算像差灵敏度，以及 通过使用像差灵敏度和在每个放置状态下测量的第一和第二发射波前来计算每个放置状态中物体的对准误差。 该方法进一步计算当引用参考光进入放置在包括第一介质和第二介质中的对准误差的放置状态的参考对象时的第一和第二参考传输波阵面，并计算物体的折射率分布 通过使用第一和第二传输波前以及第一和第二参考传输波前去除其形状分量。

公开(公告)号：US20100190115A1

公开(公告)日：2010-07-29

申请号：US12280926

申请日：2007-02-28

Applicant: Seima Kato ,  Chidane Ouchi

Inventor： Seima Kato ,  Chidane Ouchi

IPC: G03F7/20 ,  G01B11/02 ,  G03B27/54

CPC classification number: G03F7/706

Abstract: A measurement apparatus includes a first mask that is arranged on an object plane of a target optical system, and has a window that transmits measurement light, a second mask that has a reflection surface for reducing coherence of the measurement light, and a diffraction grating configured to split the measurement light that has been reflected on the second mask, has passed the first mask and the target optical system, wherein a distance Lg between the diffraction grating and an image plane of the target optical system satisfies Lg=m·Pg2/λ where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measurement light, and m is an integer except for 0.

Abstract translation: 测量装置包括布置在目标光学系统的物平面上并具有透射测量光的窗口的第一掩模，具有用于减小测量光的相干性的反射表面的第二掩模和配置在所述衍射光栅中的衍射光栅 通过第一掩模和目标光学系统，将衍射光栅与目标光学系统的像面之间的距离Lg分别满足Lg = m·Pg2 /λ 其中Pg是衍射光栅的光栅间距，λ是测量光的波长，m是除0之外的整数。

公开(公告)号：US20090268188A1

公开(公告)日：2009-10-29

申请号：US12419194

申请日：2009-04-06

Applicant: Seima Kato ,  Chidane Ouchi

Inventor： Seima Kato ,  Chidane Ouchi

IPC: G03B27/72

CPC classification number: G03F7/706 ,  G03F7/70066

Abstract: An exposure apparatus includes an illumination optical system. The illumination optical system includes a first member configured to define an illuminated region of a reflective mask having a pattern to be projected onto a substrate; a second member configured to define an illuminated region in which a measurement pattern used in measuring wavefront aberration of a projection optical system is illuminated, the second member being able to be inserted into and removed from an optical path of the illumination optical system; and a condensing mirror configured to condense light from the first member on the pattern to be projected onto the substrate and light from the second member on the measurement pattern. The illuminated region defined by the second member is smaller than the illuminated region defined by the first member.

Abstract translation: 曝光装置包括照明光学系统。 所述照明光学系统包括：第一构件，被配置为限定具有要投影到衬底上的图案的反射掩模的照明区域; 第二构件，被配置为限定照明区域，其中用于测量投影光学系统的波前像差的测量图案被照射，所述第二构件能够插入到所述照明光学系统的光路中并从所述照明光学系统的光路中移除; 以及会聚镜，其被配置为将来自第一构件的光在要投影到衬底上的图案上聚集，并且来自第二构件的光在测量图案上。 由第二构件限定的照明区域小于由第一构件限定的照明区域。

公开(公告)号：US08786863B2

公开(公告)日：2014-07-22

申请号：US12728878

申请日：2010-03-22

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G01B9/02

CPC classification number: G01M11/0271 ,  G01M11/0228 ,  G01M11/0257 ,  G01N21/45

Abstract: A transmitted wavefront measuring method comprises the steps of emitting light 101 from a light source 100 onto an object to be measured 120 to receive interfering light transmitted through the object and a diffraction grating 130 on a light receiving portion 140 disposed at a predetermined distance from the diffraction grating to measure an intensity distribution of the interfering light T10, performing a Fourier transform of the intensity distribution to calculate a frequency distribution T20, and obtaining a transmitted wavefront of the object based on a primary frequency spectrum in the frequency distribution T30 to T90. The step of obtaining the transmitted wavefront comprises the steps of performing an inverse Fourier transform of the primary frequency spectrum with reference to a grating frequency of the diffraction grating to calculate a complex amplitude of the interfering light T60, and obtaining the transmitted wavefront based on the complex amplitude T90.

Abstract translation: 透射波面测量方法包括以下步骤：将光101从光源100发射到待测物体120上以接收透过物体的干涉光;以及在受光部分140上的衍射光栅130，所述衍射光栅130设置在距离物体预定距离处 用于测量干涉光T10的强度分布，执行强度分布的傅里叶变换以计算频率分布T20，并且基于频率分布T30至T90中的主频谱获得对象的发射波阵面。 获得发送波前的步骤包括以下步骤：参考衍射光栅的光栅频率执行主频谱的傅里叶逆变换，以计算干涉光T60的复振幅，并且基于 复振幅T90。

公开(公告)号：US20120139136A1

公开(公告)日：2012-06-07

申请号：US13305827

申请日：2011-11-29

Applicant: Seima Kato

Inventor： Seima Kato

IPC: G01N21/41 ,  B29D11/00

CPC classification number: B29D11/0098 ,  G01M11/0228

Abstract: The method measures first transmitted wavefronts and second transmitted wavefronts by respectively causing reference light to enter an object placed in plural placement states in a first medium and a second medium, calculates an aberration sensitivity with respect to changes of the placement state of the object, and calculates an alignment error of the object in each placement state by using the aberration sensitivity and the first and second transmitted wavefronts measured in each placement state. The method further calculates first and second reference transmitted wavefronts respectively acquirable when causing the reference light to enter the reference object placed in placement states including the alignment errors in the first medium and the second medium, and calculates a refractive index distribution of the object which a shape component thereof is removed, by using the first and second transmitted wavefronts and the first and second reference transmitted wavefronts.

Abstract translation: 该方法通过分别使参考光进入第一介质和第二介质中放置在多个放置状态的物体来测量第一透射波前和第二透射波前，相对于物体的放置状态的变化计算像差灵敏度，以及 通过使用像差灵敏度和在每个放置状态下测量的第一和第二发射波前来计算每个放置状态中物体的对准误差。 该方法进一步计算当引用参考光进入放置在包括第一介质和第二介质中的对准误差的放置状态的参考对象时的第一和第二参考传输波阵面，并计算物体的折射率分布 通过使用第一和第二传输波前以及第一和第二参考传输波前去除其形状分量。