Invention Grant
US08508725B2 Refractive index distribution measuring method and apparatus using position measurement and a reference object 失效
折射率分布测量方法和使用位置测量的装置和参考对象

  • Patent Title: Refractive index distribution measuring method and apparatus using position measurement and a reference object
  • Patent Title (中): 折射率分布测量方法和使用位置测量的装置和参考对象
  • Application No.: US12917521
    Application Date: 2010-11-02
  • Publication No.: US08508725B2
    Publication Date: 2013-08-13
  • Inventor: Seima Kato
  • Applicant: Seima Kato
  • Applicant Address: JP
  • Assignee: Canon Kabushiki Kaisha
  • Current Assignee: Canon Kabushiki Kaisha
  • Current Assignee Address: JP
  • Agency: Rossi, Kimms & McDowell LLP
  • Priority: JP2009-277496 20091207
  • Main IPC: G01N21/41
  • IPC: G01N21/41
Refractive index distribution measuring method and apparatus using position measurement and a reference object
Abstract:
The measuring method includes a step of causing reference light to enter an object placed in a first medium to measure a first transmitted wavefront, a step of causing the reference light to enter the object placed in a second medium to measure a second transmitted wavefront, a step of measuring first and second placement positions where the object is placed in the first and second media, and a calculating step of calculating an internal refractive index distribution of the object by using measurement results of the first and second transmitted wavefronts. The calculating step calculates the internal refractive index distribution from which a shape component of the object is removed by using the measurement results of the first and second transmitted wavefronts, and first and second reference transmitted wavefronts of a reference object to be placed at positions identical to the first and second placement positions.
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