摘要:
Systems and methods for performing photoreactions in a photoreactive material using scattered actinic light from at least one light-diffusing optical fiber are disclosed. The systems and methods include disposing a light-diffusing optical fiber relative to the photoreactive material. The light-diffusing optical fiber has a glass core, a surrounding cladding, and nano-sized structures situated either within the glass core or at the core-cladding boundary. The nano-sized structures are configured to scatter guided actinic light that travels in the light-diffusing optical fiber from an actinic light source. The scattered actinic light is provided throughout the photoreactive material and causes a photoreaction throughout the photoreactive material.
摘要:
A polarization switching apparatus has a first birefringent polarizer formed as a composite prism and disposed to direct incident light of a first polarization along a first optical path and light of a second polarization along a second optical path, wherein the second optical path is oblique to the first optical path. A beam redirector is disposed to redirect the first optical path from the first birefringent polarizer toward an input face of a second birefringent polarizer; wherein the second birefringent polarizer is also formed as a composite prism and is disposed to combine incident light of the first and second polarizations onto a common output path. A shutter apparatus is actuable to selectively block light of the first polarization or light of the second polarization from the input face of the second birefringent polarizer.
摘要:
A micro-electro-mechanical (MEMS) based surveillance system and a method for using the MEMS based surveillance system are described herein for imaging an object. In one example, the MEMS based surveillance system can record images of an object from four different wavelength regions including visible light, near-infrared light, infrared light, and far infrared light.
摘要:
An apparatus for providing a pulsed radiation beam has a radiation source providing a pulsed radiation beam at a constant pulse repetition frequency. A beam deflector in the path of the pulsed radiation beam is actuable to redirect the pulsed radiation beam cyclically towards each of a plurality of beam intensity modulators in turn. A beam recombiner combines modulated light from each of the plurality of beam intensity modulators in order to form the modulated pulsed radiation beam at the constant pulse repetition frequency.
摘要:
Disclosed are photo or electron beam polymerizable compositions, and preparation thereof and devices containing them. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 157 nm lithographic tools.
摘要:
Disclosed are photo or electron beam curable polymerizable compositions, and preparation thereof and devices containing such cured material. The composition contains completely or substantially completely hydrogenated hydrocarbon-based material completely free or substantially free of carbon-carbon double and triple bonds containing photo or electron beam curable terminal or pendant groups, low-outgassing photoinitiators, an optional viscosity adjustment component and an optional filler. The composition is visible light, UV or electron beam curable. It cures into a low-modulus, low outgassing polymer material. The composition can be used as an adhesive, sealant or lens potting material. It is ideal for use in lithographic tools and other optical devices involving deep or vacuum ultraviolet radiations, in particular, as lens potting materials for 248 nm, 193 nm and 157 nm lithographic tools, as well as other optical devices involving using high fluence irradiation.
摘要:
The illumination of a photolithographic projection imager is given a variable annular intensity profile by using diverging and counter diverging elements that are movable relative to each other in the illumination path. An upstream element diverges the illumination into an annular configuration, the radius of which is set by the distance downstream to the counter diverging element. Convex and concave conical surfaces on the movable elements can accomplish this.
摘要:
A polarization switching apparatus has a first birefringent polarizer formed as a composite prism and disposed to direct incident light of a first polarization along a first optical path and light of a second polarization along a second optical path, wherein the second optical path is oblique to the first optical path. A beam redirector is disposed to redirect the first optical path from the first birefringent polarizer toward an input face of a second birefringent polarizer; wherein the second birefringent polarizer is also formed as a composite prism and is disposed to combine incident light of the first and second polarizations onto a common output path. A shutter apparatus is actuable to selectively block light of the first polarization or light of the second polarization from the input face of the second birefringent polarizer.
摘要:
A hyperspectral imaging system and method are described herein for providing a hyperspectral image of an area of a remote object (e.g., scene of interest). The hyperspectral imaging system includes at least one optic, a scannable slit mechanism, a spectrometer, a two-dimensional image sensor, and a controller. The scannable slit mechanism can be a micro-electromechanical system spatial light modulator (MEMS SLM), a diffractive Micro-Opto-Electro-Mechanical Systems (MOEMS) spatial light modulator (SLM), a digital light processing (DLP) system, a liquid crystal display, a rotating drum with at least one slit formed therein, or a rotating disk with at least one slit formed therein.
摘要:
The present disclosure is directed to a method for determining the state of cleanliness of an optical component (an optic) before any coating is applied to the surface. In method is particularly applicable to optical elements and components that are intended for uses in the DUV (deep ultraviolet) and EUV (extreme ultraviolet) wavelength regions. The disclosure combines a cleaning procedure with contamination metrology utilizing a spectrometer to provide a method that will determine the state of cleanliness of the component surface by measurement of the fluorescence spectrum of the optic and comparing the measured value with a standard or reference optic of known, acceptable cleanliness. The disclosure is further directed to an optic having a selected coating thereon that is formed according to the method described herein.