公开(公告)号：US20080179549A1

公开(公告)日：2008-07-31

申请号：US12075631

申请日：2008-03-12

申请人： Alexander N. Bykanov ,  J. Martin Algots ,  Oleh Khodykin ,  Oscar Hemberg

发明人： Alexander N. Bykanov ,  J. Martin Algots ,  Oleh Khodykin ,  Oscar Hemberg

IPC分类号： G01J3/02

CPC分类号： H05G2/001

摘要： An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing optical element having a first range of operating center wavelengths; a droplet detection radiation source having a second range of operating center wavelengths; a drive laser steering element comprising a material that is highly reflective within at least some part of the first range of wavelengths and highly transmissive within at least some part of the second range of center wavelengths; a droplet detection radiation aiming mechanism directing the droplet detection radiation through the drive laser steering element and the lens to focus at a selected droplet detection position intermediate the droplet generator and the irradiation site.

摘要翻译： 公开了一种EUV发光系统和方法，其可以包括产生等离子体源材料的液滴发生器，目标液滴朝向等离子体源材料目标照射位置附近行进; 驱动激光器 具有第一操作中心波长范围的驱动激光聚焦光学元件; 具有第二操作中心波长范围的液滴检测辐射源; 驱动激光操纵元件，其包括在第一波长范围的至少一部分内具有高度反射性的材料，并且在第二中心波长范围的至少一部分内具有高度透射性; 液滴检测辐射瞄准机构，其引导液滴检测辐射通过驱动激光转向元件和透镜，以聚焦在液滴发生器和照射部位之间的选定液滴检测位置。

公开(公告)号：US20080093775A1

公开(公告)日：2008-04-24

申请号：US11840898

申请日：2007-08-17

申请人： Carmen Menoni ,  Jorge Rocca ,  Georgiy Vaschenko ,  Scott Bloom ,  Erik Anderson ,  Weilun Chao ,  Oscar Hemberg

发明人： Carmen Menoni ,  Jorge Rocca ,  Georgiy Vaschenko ,  Scott Bloom ,  Erik Anderson ,  Weilun Chao ,  Oscar Hemberg

IPC分类号： B29C67/20 ,  B29B13/08

CPC分类号： B23K26/12 ,  B23K26/032 ,  B23K26/0624 ,  B23K26/066 ,  B23K26/0665 ,  B23K26/1224 ,  B23K26/123 ,  B23K26/127 ,  B23K26/389 ,  B23K26/40 ,  B23K2103/50

摘要： Ablation of holes having diameters as small as 82 nm and having clean walls was obtained in a poly(methyl methacrylate) on a silicon substrate by focusing pulses from a Ne-like Ar, 46.9 nm wavelength, capillary-discharge laser using a freestanding Fresnel zone plate diffracting into third order is described. Spectroscopic analysis of light from the ablation has also been performed. These results demonstrate the use of focused coherent EUV/SXR light for the direct nanoscale patterning of materials.

摘要翻译： 通过聚焦来自Ne-like Ar，46.9nm波长的脉冲，使用独立的菲涅耳带的毛细管放电激光器，在硅衬底上的聚（甲基丙烯酸甲酯）中获得直径小至82nm并具有干净的壁的孔的消融 描述了衍射成三阶的板。 还进行了来自消融的光的光谱分析。 这些结果表明使用聚焦的相干EUV / SXR光用于材料的直接纳米级图案化。

公开(公告)号：US20070146703A1

公开(公告)日：2007-06-28

申请号：US11539166

申请日：2006-10-05

申请人： John Adams ,  Kristina Crousore ,  Cherish Teters ,  Oscar Hemberg

发明人： John Adams ,  Kristina Crousore ,  Cherish Teters ,  Oscar Hemberg

IPC分类号： G01N21/00

CPC分类号： G01N15/147 ,  G01N15/1429 ,  G01N15/1459 ,  G01N15/1475 ,  G01N21/53 ,  G01N2015/0088 ,  G01N2015/1477 ,  G01N2015/1486 ,  G01N2015/1488 ,  G01N2015/1497

摘要： A particle detection system to identify and classify particles is programmed to capture digitized images of the particle generated by directing a light source through a fluid that includes the particle. The particle scatters the light and the scattered light is detected using a detector. The detector creates a digital signal corresponding to the particle, which is used by the system to generate biological optical signal. This biological optical signal can then be used to classify the event, or particle.

摘要翻译： 用于识别和分类粒子的粒子检测系统被编程以捕获通过将光源引导通过包括粒子的流体而产生的粒子的数字化图像。 颗粒散射光，并使用检测器检测散射光。 检测器产生对应于粒子的数字信号，该数字信号被系统用于生成生物光信号。 然后可以将该生物学光信号用于对事件或粒子进行分类。

公开(公告)号：US20060192154A1

公开(公告)日：2006-08-31

申请号：US11067124

申请日：2005-02-25

申请人： J. Algots ,  Igor Fomenkov ,  Alexander Ershov ,  William Partlo ,  Richard Sandstrom ,  Oscar Hemberg ,  Alexander Bykanov ,  Dennis Cobb

发明人： J. Algots ,  Igor Fomenkov ,  Alexander Ershov ,  William Partlo ,  Richard Sandstrom ,  Oscar Hemberg ,  Alexander Bykanov ,  Dennis Cobb

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/006

摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

摘要翻译： 公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

公开(公告)号：US07931850B2

公开(公告)日：2011-04-26

申请号：US12861627

申请日：2010-08-23

申请人： Carmen S. Menoni ,  Jorge J. Rocca ,  Georgiy Vaschenko ,  Scott Bloom ,  Erik H. Anderson ,  Weilun Chao ,  Oscar Hemberg

发明人： Carmen S. Menoni ,  Jorge J. Rocca ,  Georgiy Vaschenko ,  Scott Bloom ,  Erik H. Anderson ,  Weilun Chao ,  Oscar Hemberg

IPC分类号： B29C67/00

CPC分类号： B23K26/12 ,  B23K26/032 ,  B23K26/0624 ,  B23K26/066 ,  B23K26/0665 ,  B23K26/1224 ,  B23K26/123 ,  B23K26/127 ,  B23K26/389 ,  B23K26/40 ,  B23K2103/50

摘要： Ablation of holes having diameters as small as 82 nm and having clean walls was obtained in a poly(methyl methacrylate) on a silicon substrate by focusing pulses from a Ne-like Ar, 46.9 nm wavelength, capillary-discharge laser using a freestanding Fresnel zone plate diffracting into third order is described. Spectroscopic analysis of light from the ablation has also been performed. These results demonstrate the use of focused coherent EUV/SXR light for the direct nanoscale patterning of materials.

摘要翻译： 通过聚焦来自Ne-like Ar，46.9nm波长的脉冲，使用独立的菲涅耳带的毛细管放电激光器，在硅衬底上的聚（甲基丙烯酸甲酯）中获得直径小至82nm并具有干净的壁的孔的消融 描述了衍射成三阶的板。 还进行了来自消融的光的光谱分析。 这些结果表明使用聚焦的相干EUV / SXR光用于材料的直接纳米级图案化。

公开(公告)号：US07616311B2

公开(公告)日：2009-11-10

申请号：US11453278

申请日：2006-06-13

申请人： John A. Adams ,  Scott H. Bloom ,  Victor J. Chan ,  Kristina M. Crousore ,  Joseph S. Gottlieb ,  Oscar Hemberg ,  John J. Lyon ,  Brett A. Spivey

发明人： John A. Adams ,  Scott H. Bloom ,  Victor J. Chan ,  Kristina M. Crousore ,  Joseph S. Gottlieb ,  Oscar Hemberg ,  John J. Lyon ,  Brett A. Spivey

IPC分类号： G01N21/00

CPC分类号： G01N15/1459 ,  G01N15/1434 ,  G01N15/1463 ,  G01N15/147 ,  G01N15/1475 ,  G01N2015/0088

摘要： A particle detection system uses a reflective optic comprising a curved surface to detect high angle scattered light generated by a particle in a liquid medium, when a laser beam is incident on the particle. When the particles transit the laser beam, light is scattered in all directions and is described by MIE scattering theory for particles about the size of the wavelength of light and larger or Rayleigh Scattering when the particles are smaller than the wavelength of light. By using the reflective optic, the scattered light can be detected over angles that are greater than normally obtainable.

摘要翻译： 当激光束入射到粒子上时，粒子检测系统使用包括弯曲表面的反射光学器件来检测由液体介质中的粒子产生的高角散射光。 当粒子通过激光束时，光在所有方向上散射，并且当颗粒小于光的波长时，通过MIE散射理论对关于光的波长大小或Rayleigh散射的粒子的粒子进行描述。 通过使用反射光学元件，可以在大于通常可获得的角度上检测散射光。

公开(公告)号：US07554661B2

公开(公告)日：2009-06-30

申请号：US11539166

申请日：2006-10-05

申请人： John A. Adams ,  Kristina M. Crousore ,  Cherish K. Teters ,  Oscar Hemberg

发明人： John A. Adams ,  Kristina M. Crousore ,  Cherish K. Teters ,  Oscar Hemberg

IPC分类号： G01N21/00

CPC分类号： G01N15/147 ,  G01N15/1429 ,  G01N15/1459 ,  G01N15/1475 ,  G01N21/53 ,  G01N2015/0088 ,  G01N2015/1477 ,  G01N2015/1486 ,  G01N2015/1488 ,  G01N2015/1497

摘要： A particle detection system to identify and classify particles is programmed to capture digitized images of the particle generated by directing a light source through a fluid that includes the particle. The particle scatters the light and the scattered light is detected using a detector. The detector creates a digital signal corresponding to the particle, which is used by the system to generate biological optical signal. This biological optical signal can then be used to classify the event, or particle.

摘要翻译： 用于识别和分类粒子的粒子检测系统被编程以捕获通过将光源引导通过包括粒子的流体而产生的粒子的数字化图像。 颗粒散射光，并使用检测器检测散射光。 检测器产生对应于粒子的数字信号，该数字信号被系统用于生成生物光信号。 然后可以将该生物学光信号用于对事件或粒子进行分类。

公开(公告)号：US07405416B2

公开(公告)日：2008-07-29

申请号：US11067124

申请日：2005-02-25

申请人： J. Martin Algots ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Oscar Hemberg ,  Alexander N. Bykanov ,  Dennis W. Cobb

发明人： J. Martin Algots ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  William N. Partlo ,  Richard L. Sandstrom ,  Oscar Hemberg ,  Alexander N. Bykanov ,  Dennis W. Cobb

IPC分类号： H05G2/00

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/006

摘要： An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material, a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate the output orifice and a plasma initiation site periodically deflecting droplets from the selected path, a liquid target material delivery mechanism comprising a liquid target material delivery passage having an input opening and an output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material, a liquid target delivery droplet formation mechanism having an output orifice; and/or a wetting barrier around the periphery of the output orifice.

摘要翻译： 公开了一种EUV等离子体形成靶递送系统和方法，其可以包括：目标液滴形成机构，其包括磁阻或电子限制材料，终止于输出孔的液体等离子体源材料通道; 将电荷施加到液滴形成喷射流或沿着选定路径离开通道的各个液滴的充电机构; 在输出孔之间的液滴偏转器和等离子体引发位置周期性地偏转来自所选择的路径的液滴;液体靶材料输送机构，包括具有输入开口和输出孔的液体靶材料输送通道; 产生在液体目标材料内的干扰力的电动干扰力产生机构，具有输出孔的液体目标传送液滴形成机构; 和/或围绕输出孔周边的润湿屏障。

公开(公告)号：US20050129177A1

公开(公告)日：2005-06-16

申请号：US10513403

申请日：2003-05-13

申请人： Magnus Berglund ,  Bjorn Hansson ,  Oscar Hemberg ,  Hans Hertz ,  Lars Rymell

发明人： Magnus Berglund ,  Bjorn Hansson ,  Oscar Hemberg ,  Hans Hertz ,  Lars Rymell

IPC分类号： G21K1/00 ,  G21G4/00 ,  G21K5/02 ,  G21K5/08 ,  G21K7/00 ,  H01J35/00 ,  H01L21/027 ,  H05G2/00 ,  H05H1/00 ,  H05H1/24

CPC分类号： H05G2/003 ,  H05G2/008

摘要： A method of producing a radiating plasma with an increased flux stability and uniformity is disclosed. The method comprises the steps of generating a primary target by urging a liquid under pressure through a nozzle; directing an energy pre-pulse onto the primary target to generate a secondary target in the form of a gas or plasma cloud; allowing the thus formed secondary target to expand for a predetermined period of time; and directing a main energy pulse onto the secondary target when the predetermined period of time has elapsed in order to produce a plasma radiating X-ray or EUV radiation. The pre-pulse has a beam waist size that is larger, in at least one dimension, than the corresponding dimension of the primary target.

摘要翻译： 公开了一种产生具有增加的通量稳定性和均匀性的辐射等离子体的方法。 该方法包括以下步骤：通过在压力下迫使液体通过喷嘴产生主要目标; 将能量预脉冲引导到主要目标上以产生气体或等离子体云的形式的次要目标; 允许如此形成的次要靶扩张预定时间段; 并且当经过预定时间段以便产生等离子体辐射X射线或EUV辐射时，将主能量脉冲引导到次目标上。 预脉冲具有比主要目标的对应尺寸更大的至少一个维度的束腰尺寸。

公开(公告)号：US06711233B2

公开(公告)日：2004-03-23

申请号：US09910073

申请日：2001-07-23

申请人： Hans Martin Hertz ,  Oscar Hemberg

发明人： Hans Martin Hertz ,  Oscar Hemberg

IPC分类号： H01J3508

CPC分类号： H05G2/003 ,  H01J35/08 ,  H01J2235/082 ,  H05G2/005

摘要： In a method and an apparatus for generating X-ray or EUV radiation, an electron beam is brought to interact with a propagating target jet, typically in a vacuum chamber. The target jet is formed by urging a liquid substance under pressure through an outlet opening. Hard X-ray radiation may be generated by converting the electron-beam energy to Bremsstrahlung and characteristic line emission, essentially without heating the jet to a plasma-forming temperature. Soft X-ray or EUV radiation may be generated by the electron beam heating the jet to a plasma-forming temperature.

摘要翻译： 在用于产生X射线或EUV辐射的方法和装置中，电子束通常在真空室中与传播的靶射流相互作用。 目标射流是通过在压力下通过出口开启的液体物质来形成的。 可以通过将电子束能量转换为Bre致辐射和特征线发射来产生硬X射线辐射，基本上不将射流加热到等离子体形成温度。 可以通过将射流加热到等离子体形成温度的电子束产生软X射线或EUV辐射。