公开(公告)号：US5895711A

公开(公告)日：1999-04-20

申请号：US966997

申请日：1997-11-10

申请人： Takeyuki Yamaki ,  Minoru Inoue

发明人： Takeyuki Yamaki ,  Minoru Inoue

IPC分类号： B32B25/20 ,  C09D183/04 ,  F16C13/00 ,  G03G15/20 ,  B32B5/16

CPC分类号： G03G15/2057 ,  C09D183/04 ,  Y10T428/139 ,  Y10T428/1393 ,  Y10T428/25 ,  Y10T428/256 ,  Y10T428/259 ,  Y10T428/31663

摘要： A heat-fixing roll is coated with a hardened silicone coating composition containing such materials (1A) and (1B) or (2A) through (2D) as follows:(1A) organosiloxane consisting of a hydrolyzed condensation polymer of 20-200 parts by weight of silicon compound Si(OR.sup.1).sub.4 and colloidal silica, 100 parts by weight of silicon compound R.sub.2 Si(OR.sup.1).sub.3, and 0-60 parts by weight of silicon compound R.sub.2 Si(OR.sup.1).sub.2 (R.sup.1 and R.sup.2 being monovalent hydrocarbon radicals), with the weight average molecular weight controlled to be more than 800 in polystyrene conversion, and(1B) a straight-chain polysiloxanediol HO(R.sup.3.sub.2 SiO).sub.n H (R.sup.3 being a monovalent hydrocarbon radical, and n.gtoreq.3); or(2A) a silica dispersed oligomer solution of organosilane prepared by partially hydrolyzing a hydrolyzable organosilane R.sup.4.sub.m SiX.sub.4-m (R.sup.4 being the same or different substituted or non-substituted monovalent hydrocarbon radicals of carbon number 1-8, m being an integer 0-3, and X being a hydrolyzable group) within colloidal silica dispersed in an organic solvent, water or their mixture, employing water by 0.001-0.5 mol per 1 mol equivalent amount of the hydrolyzable group (X);(2B) the same as (1B);(2C) polyorganosiloxane containing, in molecules, silanol group R.sup.5.sub.a Si(OH).sub.b O.sub.(4-a-b)/2 (R.sup.5 being the same or different substituted or non-substituted monovalent hydrocarbon radicals of carbon number 1-8, and a and b being figures satisfying 0.2.ltoreq.a.ltoreq.2, 0.0001.ltoreq.b.ltoreq.3 and a+b

摘要翻译： 热固定辊用如下材料（1A）和（1B）或（2A）至（2D）的硬化硅涂层组合物涂覆：（1A）由20-200份的水解缩聚物组成的有机硅氧烷 硅化合物Si（OR1）4和胶体二氧化硅的重量，硅化合物R2Si（OR1）3 100重量份和硅化合物R2Si（OR1）2（R1和R2是一价烃基）0-60重量份， 重均分子量在聚苯乙烯换算时控制在800以上，（1B）直链聚硅氧烷二醇HO（R32SiO）nH（R3为一价烃基，n≥3）。 或（2A）通过部分水解可水解的有机硅烷R4mSiX4-m制备的二氧化硅分散的有机硅烷的低聚物溶液（R4是碳数为1-8的相同或不同的取代或未取代的一价烃基，m为整数0-3 ，X为水解性基团），分散在有机溶剂中的胶体二氧化硅，水或其混合物，每1当量水解性基团（X）使用0.001-0.5摩尔的水; （2B）与（1B）相同; （2C）分子中含有硅烷醇基R5aSi（OH）bO（4-ab）/ 2（R5为碳数为1-8的相同或不同的取代或未取代的一价烃基）的聚有机硅氧烷，a和b为 满足0.2 和a + b <4的数字; 和（2D）固化催化剂; 其中涂覆的热定影辊具有优异的耐热性，耐磨性，脱模性和涂层与热定影辊之间的长期粘合。

公开(公告)号：US5091460A

公开(公告)日：1992-02-25

申请号：US618551

申请日：1990-11-27

申请人： Kazuo Seto ,  Minoru Inoue ,  Motoaki Haruna ,  Hiroshi Kimura ,  Yasutoshi Nagano ,  Yasuhiro Kushida

发明人： Kazuo Seto ,  Minoru Inoue ,  Motoaki Haruna ,  Hiroshi Kimura ,  Yasutoshi Nagano ,  Yasuhiro Kushida

IPC分类号： C04B41/49 ,  C04B41/52 ,  C04B41/64 ,  C04B41/70 ,  C09D183/04 ,  C09D183/08

CPC分类号： C04B41/009 ,  C04B41/4961 ,  C04B41/52 ,  C04B41/64 ,  C04B41/70 ,  C09D183/04 ,  C09D183/08

摘要： A coating composition, a coated inorganic hardened product having a cured layer formed from the coating composition, and a process for producing the coated hardened product.a coating composition comprising the following components (A) to (C);an organosilane oligomer solution containing silica particles dispersed therein, said solution being obtained by partially hydrolyzing a hydrolyzable organosilane represented by the formulaR.sup.1.sub.n SiX.sub.4-n (I)wherein R.sup.1 which may be the same or different each represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 8 carbon atoms, n is an integer of from 0 to 3, and X represents a hydrolyzable group, in a colloidal silica dispersed in an organic solvent or water,(B) a polyorganosiloxane having a silanol group in the molecule thereof, represented by the average composition formulaR.sup.2.sub.a Si(OH).sub.b O.sub.(4-a-b)/2 (II)wherein R.sup.2 may be the same or different each represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 8 carbon atoms, and a and b are numbers satisfying the following equations:0.2.ltoreq.a.ltoreq.20.0001.ltoreq.b.ltoreq.3a+b.ltoreq.4, and(C) a catalyst.

公开(公告)号：US5081064A

公开(公告)日：1992-01-14

申请号：US532709

申请日：1990-06-04

申请人： Minoru Inoue ,  Ryuji Iwama

发明人： Minoru Inoue ,  Ryuji Iwama

IPC分类号： H01L21/768 ,  H01L23/522

CPC分类号： H01L21/76862 ,  H01L21/76844 ,  H01L21/76855 ,  H01L21/76877 ,  H01L23/5226 ,  H01L2924/0002

摘要： A method of forming an electrical contact between interconnection layers located at different layer levels includes the steps of forming a contact hole in an interlayer insulating film, and forming a metallic intermediate layer on an exposed surface portion of a first conductive interconnection layer and the interlayer insulating film. Then, a portion of said metallic intermediate layer exposed through said contact hole and an oxide film formed on said surface portion of the first conductive interconnection layer are eliminated by an etching process. This process is carried out in a vacuum. After that, in the vacuum, a second conductive interconnection layer is formed in said contact hole and formed on said interlayer insulating film so that an electrical contact between said first and second conductive interconnection layers are formed.

公开(公告)号：US4976839A

公开(公告)日：1990-12-11

申请号：US383511

申请日：1989-07-24

申请人： Minoru Inoue

发明人： Minoru Inoue

IPC分类号： H01L21/28 ,  H01L21/285 ,  H01L21/768 ,  H01L23/532

CPC分类号： H01L21/76843 ,  H01L21/76886 ,  H01L23/53223 ,  H01L2924/0002

摘要： A titanium nitride barrier layer of 50 to 200 nm in thickness is fabricated between a silicon substrate and an aluminum electrode layer of an IC device by reactive sputtering performed in a mixed gas including oxygen in a proportion of 1 to 5% by volume relative to other gases, comprising an inert gas and a reactive gas, providing the temperature of the silicon substrate at 350.degree. to 550.degree. C. during the reactive sputtering, so that the product has a failure rate, indicating the property of preventing mutual diffusion of silicon and aluminum atoms from occurring, of less than 1% and a resistivity less than 100 .mu..OMEGA..cm.

公开(公告)号：US4902582A

公开(公告)日：1990-02-20

申请号：US300186

申请日：1989-01-23

申请人： Minoru Inoue

发明人： Minoru Inoue

IPC分类号： H01L21/388 ,  H01L21/28 ,  H01L21/285 ,  H01L29/45

CPC分类号： H01L29/456 ,  H01L21/28512 ,  Y10T428/12674 ,  Y10T428/12736

摘要： A semiconductor device comprising a metallized layer formed on a silicon substrate, wherein said metallized layer is an aluminum alloy consisting essentially of aluminum, silicon and at least one element selected from the group consisting of titanium, vanadium, chromium, tungsten, and phosphorus the amount of silicon being 1.0% to 3.0% by weight, the amount of said selected element corresponding to the relative service life required of the metallized layer, said required service life being 10 times that of a metallized layer having the same composition as that of the above-mentioned metallized layer except for being free from said element, and the rest being aluminum. For example, the metallized layer may contain at least 0.04% and less than 0.10% by weight of titanium, 1.0% by weight of silicon, and the rest aluminum.

摘要翻译： 一种半导体器件，包括形成在硅衬底上的金属化层，其中所述金属化层是基本上由铝，硅和至少一种选自钛，钒，铬，钨和磷的元素组成的铝合金，其量 的硅为1.0〜3.0重量％，所述选定元素的量相当于金属化层所需的相对使用寿命，所述使用寿命为与上述相同组成的金属化层的10倍 所述金属化层除了不含所述元素，其余为铝。 例如，金属化层可以含有至少0.04重量％且小于0.10重量％的钛，1.0重量％的硅和其余的铝。

公开(公告)号：US08775873B2

公开(公告)日：2014-07-08

申请号：US13343765

申请日：2012-01-05

申请人： Masao Tomofuji ,  Shigeo Yoshikawa ,  Minoru Inoue

发明人： Masao Tomofuji ,  Shigeo Yoshikawa ,  Minoru Inoue

IPC分类号： G06F11/00

CPC分类号： G06F11/3684

摘要： In a data processing apparatus, when an instruction for starting validation is provided, or when definition information is updated, data input from a data source is collected, and a process for narrowing down of the collected data is executed. In the data narrowing process, by extracting records and items as process targets according to the definition information that defines the operation of the apparatus, the number of data items used for validation is reduced. Then, the operation is validated using the narrowed data. In the operation validation process, a virtual transfer destination of output of data is provided within the apparatus, and the data is output to the virtual transfer destination, for comparison with the output data, whereby the validation of the operation is performed.

摘要翻译： 在数据处理装置中，当提供用于开始验证的指令时，或者当更新定义信息时，收集从数据源输入的数据，并且执行收集的数据的缩小处理。 在数据收缩处理中，通过根据定义设备的操作的定义信息，提取记录和项目作为过程目标，减少了用于验证的数据项的数量。 然后，使用变窄的数据验证操作。 在操作验证过程中，在设备内提供数据输出的虚拟传送目的地，并且将数据输出到虚拟传送目的地，以与输出数据进行比较，由此执行操作的验证。