公开(公告)号：US5314783A

公开(公告)日：1994-05-24

申请号：US970031

申请日：1992-11-02

申请人： Shigeru Koibuchi ,  Asao Isobe ,  Michiaki Hashimoto

发明人： Shigeru Koibuchi ,  Asao Isobe ,  Michiaki Hashimoto

IPC分类号： G03C1/00 ,  G03C1/72 ,  G03F7/004 ,  G03F7/022 ,  H01L21/027 ,  G03F7/023 ,  G03C1/61

CPC分类号： G03F7/0226

摘要： A photosensitive resin composition comprising (A) an alkaline aqueous solution-soluble novolak resin, (B) a photosensitizer obtained by reacting a polyhydroxy compound with 1,2-naphthoquinone-(2)-diazido-5(or 4)-sulfonyl chloride, and (C) an ultraviolet absorber such as 2-(2'-hydroxy-5'-methylphenyl)-benzotriazole, has a strong absorption against a light of a wavelength of 365 nm and is suitable for producing semiconductor elements, etc.

摘要翻译： 一种感光性树脂组合物，其包含（A）碱性水溶性溶液型酚醛清漆树脂，（B）通过使多羟基化合物与1,2-萘醌 - （2） - 叠氮基-5（或4） - 磺酰氯反应而得到的光敏剂， 和（C）2-（2'-羟基-5'-甲基苯基） - 苯并三唑等紫外线吸收剂对波长365nm的光具有很强的吸收性，适用于制造半导体元件等。

公开(公告)号：US4430400A

公开(公告)日：1984-02-07

申请号：US304153

申请日：1981-09-21

申请人： Toshio Nakano ,  Yoshio Taniguchi ,  Ken Tsutsui ,  Akira Sasano ,  Tadeo Kaneko ,  Akiya Izumi ,  Michiaki Hashimoto

发明人： Toshio Nakano ,  Yoshio Taniguchi ,  Ken Tsutsui ,  Akira Sasano ,  Tadeo Kaneko ,  Akiya Izumi ,  Michiaki Hashimoto

IPC分类号： G02B5/20 ,  G03F7/00 ,  H01L27/14 ,  H04N9/07 ,  G03F5/00 ,  G03C5/00

CPC分类号： G03F7/0007

摘要： Disclosed is a method of producing color filters, which comprises forming a layer of an organic polymeric material having a predetermined light-sensitive characteristic on a substrate, exposing this layer to a predetermined pattern, developing the exposed layer to form a filter base and dyeing the filter base, wherein after the development of the exposed layer, the layer is wetted with a dehydrating solution to remove water from the filter base. By this dehydrating treatment, the filter base can be processed with very high precision.

摘要翻译： 公开了一种生产滤色器的方法，其包括在基板上形成具有预定光敏特性的有机聚合物材料层，将该层暴露于预定图案，显影曝光层以形成滤色器基底并染色 过滤基底，其中在暴露层的显影之后，用脱水溶液润湿层以从过滤器基底去除水。 通过该脱水处理，可以以非常高的精度对过滤器基底进行加工。

公开(公告)号：US4395629A

公开(公告)日：1983-07-26

申请号：US215073

申请日：1980-12-10

申请人： Akira Sasano ,  Toshio Nakano ,  Ken Tsutsui ,  Michiaki Hashimoto ,  Tadao Kaneko ,  Yoshio Taniguchi ,  Haruo Matsumaru ,  Akiya Izumi

发明人： Akira Sasano ,  Toshio Nakano ,  Ken Tsutsui ,  Michiaki Hashimoto ,  Tadao Kaneko ,  Yoshio Taniguchi ,  Haruo Matsumaru ,  Akiya Izumi

IPC分类号： H04N9/07 ,  H01L27/14 ,  H01L27/146 ,  G01J3/34

CPC分类号： H01L27/14667 ,  H01L27/14621 ,  H01L27/14645

摘要： According to a solid-state imager of this invention, in case where a plurality of color filters are disposed on a semiconductor body for the solid-state imager including a plurality of photosensitive regions and where the color filter of a third color is constructed by the overlapping between filter members of a first color and a second color, that one of the filter members which has a spectral transmittance substantially transmitting light for exposure for use in forming the filter members is arranged as a lower layer closer to a substrate of the semiconductor body. Even when the filter members are formed by the exposure process, a solid-state imager having good characteristics can be manufactured.

摘要翻译： 根据本发明的固态成像器，在多个滤色器设置在包括多个感光区域的固态成像器的半导体本体上并且第三颜色的滤色器由 在第一颜色和第二颜色的过滤构件之间重叠，具有基本上透射用于形成过滤构件的曝光用光的光谱透射率中的一个被布置为更靠近半导体本体的衬底的下层 。 即使当通过曝光处理形成过滤构件时，也可以制造具有良好特性的固态成像器。

公开(公告)号：US4273842A

公开(公告)日：1981-06-16

申请号：US895372

申请日：1978-04-11

申请人： Saburo Nonogaki ,  Hajime Morishita ,  Michiaki Hashimoto ,  Toshikatsu Manabe ,  Yoshifumi Tomita ,  Masahiro Nishizawa

发明人： Saburo Nonogaki ,  Hajime Morishita ,  Michiaki Hashimoto ,  Toshikatsu Manabe ,  Yoshifumi Tomita ,  Masahiro Nishizawa

IPC分类号： G03F7/016 ,  G03F7/28 ,  H01J9/227 ,  H01J29/22 ,  H01J29/32 ,  G03C5/00

CPC分类号： H01J29/327 ,  G03F7/016 ,  G03F7/28 ,  H01J29/225 ,  H01J9/2271 ,  H01J9/2278

摘要： A patternwise coated powder layer can be formed by a process comprising the steps of coating a photosensitive composition, which contains an aromatic diazonium salt as a photosensitive component and becomes sticky by exposure, onto the surface of a substrate to form a thin layer, subjecting the thin layer to patternwise exposure with actinic radiation to produce stickiness at the exposed area, and then contacting powder particles with the thin layer after exposure to make the thin layer to accept the powder particles according to the powder acceptability of the thin layer. According to this process, for example, the phosphor screen of a color picture tube can simply be produced.LIST OF PRIOR ART (37 CFR 1.56 (a))The following reference is cited to show the state of the art:Japanese Patent Laid-Open Publication No. 47-7266 (1972)

摘要翻译： 图案化涂层粉末层可以通过以下步骤形成，该方法包括以下步骤：将含有芳香族重氮盐作为感光性成分的感光性组合物涂布在基材表面上，形成薄层， 薄膜以光化辐射进行图案曝光以在曝光区域产生粘性，然后在曝光后使粉末颗粒与薄层接触，以使薄层根据薄层的粉末可接受性接受粉末颗粒。 根据该处理，例如可以简单地制造彩色显像管的荧光屏。

公开(公告)号：US5215858A

公开(公告)日：1993-06-01

申请号：US326740

申请日：1989-03-21

申请人： Shigeru Koibuchi ,  Asao Isobe ,  Michiaki Hashimoto

发明人： Shigeru Koibuchi ,  Asao Isobe ,  Michiaki Hashimoto

IPC分类号： G03C1/00 ,  G03C1/72 ,  G03F7/004 ,  G03F7/022 ,  H01L21/027

CPC分类号： G03F7/0226

摘要： A photosensitive resin composition comprising (A) an alkaline aqueous solution-soluble novolak resin, (B) a photosensitizer obtained by reacting a polyhydroxy compound with 1,2-naphthoquinone-(2)-diazido-5(or 4)-sulfonyl chloride, and (C) an ultraviolet absorber such as 2-(2'-hydroxy-5'-methylphenyl)-benzotriazole, has a strong absorption against a light of a wavelength of 365 nm and is suitable for producing semiconductor elements, etc.

公开(公告)号：US4983500A

公开(公告)日：1991-01-08

申请号：US260747

申请日：1988-10-21

申请人： Shouichi Uchino ,  Takao Iwayanagi ,  Michiaki Hashimoto

发明人： Shouichi Uchino ,  Takao Iwayanagi ,  Michiaki Hashimoto

IPC分类号： G03F7/26 ,  C08K5/23 ,  C09D161/04 ,  G03C1/00 ,  G03C5/00 ,  G03F7/00 ,  G03F7/016 ,  G03F7/038 ,  G03F7/095 ,  G03F7/11 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/016 ,  C08K5/23 ,  C09D161/04

摘要： Disclosed is a radiation sensitive composition which comprises a radiation sensitive compound decreased in absorption of radiation upon irradiation with radiation and an organic polymer which, upon being formed into a film, changes in its solubility and decreases in solubility in a desired solvent due to the presence of decomposition product of said radiation sensitive compound which is produced by irradiation with the radiation. A process of formation of pattern using said composition is also disclosed. Fine resist pattern of 0.5 .mu.m line-and-space patterns or less can be formed with sufficiently high contrast.

摘要翻译： 公开了一种辐射敏感性组合物，其包含在用辐射照射时减少辐射吸收的辐射敏感化合物和有机聚合物，其在形成膜时由于存在而改变其溶解度并降低其在所需溶剂中的溶解度 所述辐射敏感化合物的分解产物是通过辐射照射产生的。 还公开了使用所述组合物形成图案的方法。 可以形成具有足够高的对比度的0.5μm线间距图案或更小的精细抗蚀剂图案。

公开(公告)号：US4835089A

公开(公告)日：1989-05-30

申请号：US60323

申请日：1987-06-10

申请人： Takao Iwayanagi ,  Norio Hasegawa ,  Toshihiko Tanaka ,  Hiroshi Shiraishi ,  Takumi Ueno ,  Michiaki Hashimoto ,  Seiichiro Shirai ,  Kazuya Kadota

发明人： Takao Iwayanagi ,  Norio Hasegawa ,  Toshihiko Tanaka ,  Hiroshi Shiraishi ,  Takumi Ueno ,  Michiaki Hashimoto ,  Seiichiro Shirai ,  Kazuya Kadota

IPC分类号： G03F7/095

CPC分类号： G03F7/095

摘要： A thick polymer film containing an aromatic bisazide and/or an aromatic sulfonyl azide compound is formed on a substrate having topography level on its surface to flatten said surface and then heated or the whole surface thereof is exposed to a light. A mask pattern having a dry etching resistance higher than that of the polymer is formed on the polymer film, exposed parts of the polymer film are removed by the dry etching and the exposed parts of the film to be processed are removed to form a pattern.

摘要翻译： 在其表面上具有表层水平的基底上形成含有芳族双叠氮化物和/或芳族磺酰基叠氮化合物的厚聚合物膜，以使所述表面变平，然后加热或将其整个表面曝光。 在聚合物膜上形成具有高于聚合物的耐干蚀刻性的掩模图案，通过干蚀刻除去聚合物膜的暴露部分，并除去待处理的膜的暴露部分以形成图案。

公开(公告)号：US4565768A

公开(公告)日：1986-01-21

申请号：US615749

申请日：1984-05-31

申请人： Saburo Nonogaki ,  Michiaki Hashimoto

发明人： Saburo Nonogaki ,  Michiaki Hashimoto

IPC分类号： G03F7/008 ,  H01L21/027 ,  H01L21/312 ,  G03C1/52 ,  G03C1/71 ,  G03F7/26

CPC分类号： C07C247/00 ,  G03F7/008 ,  Y10S430/128

摘要： A photosensitive composition comprising an equimolar condensation product of an aromatic azide compound having an aldehyde group and isophorone, and an alkali-soluble polymeric compound is a negative-type photoresist with a high resolution suitable for the fabrication of semiconductor devices.

摘要翻译： 包含具有醛基和异佛尔酮的芳族叠氮化合物的等摩尔缩合产物和碱溶性聚合物的光敏组合物是适用于制造半导体器件的具有高分辨率的负型光致抗蚀剂。

公开(公告)号：US4412236A

公开(公告)日：1983-10-25

申请号：US180042

申请日：1980-08-21

申请人： Akira Sasano ,  Toshio Nakano ,  Ken Tsutsui ,  Michiaki Hashimoto ,  Tadao Kaneko ,  Norio Koike ,  Akiya Izumi

发明人： Akira Sasano ,  Toshio Nakano ,  Ken Tsutsui ,  Michiaki Hashimoto ,  Tadao Kaneko ,  Norio Koike ,  Akiya Izumi

IPC分类号： H01L27/146 ,  H01L27/14 ,  H01L27/02 ,  H01L29/78

CPC分类号： H01L27/14645 ,  H01L27/14609 ,  H01L27/14621 ,  H01L27/14667

摘要： A color solid-state imager comprising a semiconductor body which has a photoelectric conversion function and which includes at least photosensitive elements and switching elements, and predetermined color filters which are formed on the body; characterized in that a light absorbing layer is disposed at least over a vicinity of an output terminal of each switching element. The contours of the color filters can be accurately formed, and unnecessary light can be intercepted to stabilize the electrical characteristics of the solid-state imager.

摘要翻译： 一种彩色固态成像器，包括具有光电转换功能并且至少包括光敏元件和开关元件的半导体本体和形成在本体上的预定滤色器; 其特征在于，至少在每个开关元件的输出端子的附近设置光吸收层。 可以精确地形成滤色器的轮廓，并且可以截取不必要的光以稳定固态成像器的电特性。

公开(公告)号：US4311773A

公开(公告)日：1982-01-19

申请号：US120114

申请日：1980-02-11

申请人： Tadao Kaneko ,  Michiaki Hashimoto ,  Toshio Nakano ,  Akira Sasano

发明人： Tadao Kaneko ,  Michiaki Hashimoto ,  Toshio Nakano ,  Akira Sasano

IPC分类号： G03F7/00 ,  H01L31/0216 ,  G03C5/00 ,  G03C11/00 ,  G03F5/00

CPC分类号： H01L31/02162 ,  G03F7/0007

摘要： A method of producing color filters comprising:a step for forming a photosensitive film by coating, on a rugged substrate, a mixture of a light-absorbing material which absorbs light and which can be removed with a solvent and a photosensitive material;a step for irradiating light onto the photosensitive film through a predetermined pattern;a step for removing dissolvable portions of the photosensitive film and the light-absorbing material from the photosensitive film which remains on the substrate; anda step for dyeing the photosensitive film into any desired color.

摘要翻译： 一种彩色滤光片的制造方法，其特征在于，包括：通过在粗糙基板上涂布吸收光并可用溶剂和感光材料除去的吸光材料的混合物来形成感光膜的步骤; 用于通过预定图案将光照射到感光膜上的步骤; 从保留在基板上的感光膜除去感光膜和光吸收材料的可溶解部分的步骤; 以及将感光膜染色成任何所需颜色的步骤。