公开(公告)号：US08973494B2

公开(公告)日：2015-03-10

申请号：US13023225

申请日：2011-02-08

申请人： Masayuki Hatano ,  Ikuo Yoneda ,  Tetsuro Nakasugi ,  Kenji Ooki

发明人： Masayuki Hatano ,  Ikuo Yoneda ,  Tetsuro Nakasugi ,  Kenji Ooki

IPC分类号： G03F7/00 ,  B82Y10/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： According to one embodiment, an imprint method is disclosed. The method can include forming a liquid droplet of a transfer material with a volume greater than a predetermined reference volume by dropping the transfer material onto a major surface of a processing substrate. The method can include reducing the volume of the liquid droplet to be less than the reference volume by volatilizing the liquid droplet. In addition, the method can include filling the transfer material into a recess provided in a transfer surface of a template by bringing the liquid droplet having the volume reduced to be less than the reference volume into contact with the transfer surface of the template.

摘要翻译： 根据一个实施例，公开了压印方法。 该方法可以包括通过将转印材料落到处理衬底的主表面上来形成体积大于预定参考体积的转印材料的液滴。 该方法可以包括通过挥发液滴来将液滴的体积减小到小于参考体积。 此外，该方法可以包括通过使体积减小到小于参考体积的液滴与模板的转印表面接触来将转印材料填充到设置在模板的转印表面中的凹部中。

公开(公告)号：US08772179B2

公开(公告)日：2014-07-08

申请号：US13607504

申请日：2012-09-07

申请人： Kazuya Fukuhara ,  Masayuki Hatano

发明人： Kazuya Fukuhara ,  Masayuki Hatano

IPC分类号： H01L21/00

CPC分类号： B29C43/021 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/565 ,  H01L2924/0002 ,  H01L2924/00

摘要： According to one embodiment, a pattern forming method using a template containing a pattern that has at least one recess section or protrusion section to transfer the shape of the pattern to a resin layer on a substrate, is provided. The method includes a process for coating the resin on the substrate, a process for making the hardness of the first portion as a portion of the resin higher than the hardness of the second portion as the portion other than the first portion, and a process in which the portion other than the pattern of the template makes contact with the first portion, in a state where a gap is maintained between the template and the resin, the shape of the pattern is transferred to the second portion, and the resin is cured. Embodiments of an apparatus for pattern forming are also provided.

摘要翻译： 根据一个实施例，提供一种使用包含具有至少一个凹部或突起部的图案的模板的图案形成方法，以将图案的形状转印到基板上的树脂层。 该方法包括在基板上涂布树脂的方法，使作为树脂部分的第一部分的硬度高于作为第一部分以外的部分的第二部分的硬度的方法，以及 在模板和树脂之间保持间隙的状态下，模板图案之外的部分与第一部分接触的部分，图案的形状被转印到第二部分，树脂固化。 还提供了用于图案形成的装置的实施例。

公开(公告)号：US20120074605A1

公开(公告)日：2012-03-29

申请号：US13204844

申请日：2011-08-08

申请人： Yasutada NAKAGAWA ,  Takuya Kono ,  Ikuo Yoneda ,  Masayuki Hatano

发明人： Yasutada NAKAGAWA ,  Takuya Kono ,  Ikuo Yoneda ,  Masayuki Hatano

IPC分类号： B29C43/02

CPC分类号： G05B19/418 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/16

摘要： According to one embodiment, a fine processing method includes determining a resist amount required for each first region of a pattern formation surface and a total amount of resist. The method include dividing the total amount of resist by a volume of one resist drop to determine the resist drops total number. The method include determining a provisional position for the resist drop of the total number. The method include assigning the each first region to nearest one resist drop, and partitioning again the pattern formation surface into second regions assigned to the each resist drop. The method include determining a divided value by dividing the volume of the one resist drop by the required total amount of resist determined. The method include finalizing a final position of the each resist drop, if a distribution of the divided value in the pattern formation surface falls within a target range.

摘要翻译： 根据一个实施例，精细处理方法包括确定图案形成表面的每个第一区域和抗蚀剂总量所需的抗蚀剂量。 该方法包括将抗蚀剂的总量除以一个抗蚀剂滴的体积以确定抗蚀剂滴数总数。 该方法包括确定总数的抗蚀剂落下的临时位置。 该方法包括将每个第一区域分配给最接近的一个抗蚀剂层，以及再次将图案形成表面分割成分配给每个抗蚀剂层的第二区域。 该方法包括通过将一个抗蚀剂液滴的体积除以所需的抗蚀剂总量确定分割值。 如果图案形成表面中的分割值的分布落在目标范围内，则该方法包括确定每个抗蚀剂液滴的最终位置。

公开(公告)号：US20090165534A1

公开(公告)日：2009-07-02

申请号：US12281564

申请日：2007-03-07

申请人： Gisuke Kohno ,  Teruo Hon'Iden ,  Akihiro Morimoto ,  Naofumi Yasumoto ,  Koji Kawada ,  Yutaka Ueji ,  Nobukazu Ikeda ,  Masayuki Hatano ,  Michio Kuramochi ,  Yoshiyuki Kindai ,  Kazuhiro Nagano ,  Toshiaki Wada

发明人： Gisuke Kohno ,  Teruo Hon'Iden ,  Akihiro Morimoto ,  Naofumi Yasumoto ,  Koji Kawada ,  Yutaka Ueji ,  Nobukazu Ikeda ,  Masayuki Hatano ,  Michio Kuramochi ,  Yoshiyuki Kindai ,  Kazuhiro Nagano ,  Toshiaki Wada

IPC分类号： G01M3/08

CPC分类号： G01M3/2815

摘要： A method for testing leakage of a pipe passage employs a flow rate of gas used in testing supplied to the inside of a pipe passage undergoing testing hermetically sealed on one side while detecting flow rate with a flow measuring device and pressure with a pressure detector, and detecting temperature of the gas used, and inputting the detected values of pressure, flow rate and temperature into a computation treatment apparatus, and internal capacity VL of the pipe passage is computed as VL=(supplied flow rate Q×pressure applied time Δt)/(pressure rise value ΔP2), and next, the volume QL leaked from the pipe passage is computed as QL=(pressure drop value ΔP2′×internal capacity VL)/(pressure drop time Δt′).

摘要翻译： 用于测试管道通道泄漏的方法采用供给到通过密封在一侧进行密封的管道内部的测试中使用的气体流量，同时利用流量测量装置和压力检测器检测流量，以及 检测所使用的气体的温度，并将检测出的压力，流量和温度的值输入计算处理装置，并且计算管道内部容量VL为VL =（供给流量Qx压力施加时间Deltat）/（压力 上升值DeltaP2），接下来，从管道泄漏的体积QL计算为QL =（压降值DeltaP2'内部容量VL）/（压降时间Deltat'）。

公开(公告)号：US06773626B2

公开(公告)日：2004-08-10

申请号：US09970162

申请日：2001-09-26

申请人： Satoshi Sanada ,  Masayuki Hatano

发明人： Satoshi Sanada ,  Masayuki Hatano

IPC分类号： C09K1952

CPC分类号： G06K19/07703 ,  C09K19/12 ,  C09K19/18 ,  C09K19/20 ,  C09K19/2007 ,  C09K19/3003 ,  C09K19/3066 ,  C09K19/3068 ,  C09K19/3402 ,  C09K19/3458 ,  C09K19/3852 ,  C09K19/60 ,  C09K2019/0448 ,  C09K2019/3422 ,  G02F1/132 ,  G02F1/133365 ,  G02F1/13725 ,  G02F2001/133742 ,  G06K19/06046 ,  Y10T428/10

摘要： A reversible information liquid crystal display medium is disclosed which is capable of long term information display, even through extremes of heat and pressure, without the addition of energy to maintain the display. A primary ingredient of the liquid crystal display medium is a liquid crystalline composition of high-molecular liquid crystal in which molecules that can function as a liquid crystal are chemically bound to side chains of a high-molecular polymer skeleton through a flexing group. Low-molecular liquid crystal may be added to the liquid crystalline composition in order to reduce the response speed of the liquid crystalline composition. The liquid crystal display medium may be used in the display portion of a contactless integrated circuit (IC) card.

摘要翻译： 公开了一种可逆信息液晶显示介质，即使通过极端的热和压力也能够长期显示信息，而不增加能量来维持显示。 液晶显示介质的主要成分是高分子液晶的液晶组合物，其中可以起到液晶的分子通过弯曲组化学键合到高分子聚合物骨架的侧链上。 为了降低液晶组合物的响应速度，可以向液晶组合物中加入低分子液晶。 液晶显示介质可用于非接触式集成电路（IC）卡的显示部分。

公开(公告)号：US06615871B2

公开(公告)日：2003-09-09

申请号：US10277147

申请日：2002-10-22

申请人： Tadahiro Ohmi ,  Hiroshi Morokoshi ,  Michio Yamaji ,  Shigeaki Tanaka ,  Keiji Hirao ,  Yuji Kawano ,  Takashi Hirose ,  Kosuke Yokoyama ,  Michio Kuramochi ,  Masayuki Hatano ,  Nobukazu Ikeda

发明人： Tadahiro Ohmi ,  Hiroshi Morokoshi ,  Michio Yamaji ,  Shigeaki Tanaka ,  Keiji Hirao ,  Yuji Kawano ,  Takashi Hirose ,  Kosuke Yokoyama ,  Michio Kuramochi ,  Masayuki Hatano ,  Nobukazu Ikeda

IPC分类号： F16K1110

CPC分类号： F15B13/0817 ,  F15B13/0871 ,  F15B13/0892 ,  F15B13/0896 ,  F15B2013/006 ,  Y10T137/87249 ,  Y10T137/87265 ,  Y10T137/87885

摘要： An on-off device disposed at each of the inlet and the outlet of a fluid controller is one of five kinds of on-off devices, i.e., on-off device having a two-port valve, on-off device having a two-port valve and a three-port valve, on-off device having a two-port valve and two three-port valves, on-off device having two three-port valves, and on-off device having three three-port valves, The main bodies of two-port valves of all types of on-off devices are identical in configuration and each have an inlet and an outlet in a bottom face thereof. Main bodies of three-port valves of all types of on-off devices are identical in configuration and each formed in a bottom face thereof with an inlet, an outlet always in communication with the inlet, and an inlet-outlet subopening.

摘要翻译： 设置在流体控制器的每个入口和出口处的开关装置是五种开关装置中的一种，即具有双端口阀的开关装置，开 - 关装置具有二通阀， 开口阀和三通阀，具有双口阀和两个三通阀的开关装置，具有两个三通阀的开关装置和具有三个三通阀的开关装置。 所有类型的开 - 关装置的双口阀的主体构造相同，并且每个在其底面具有入口和出口。 所有类型的开关装置的三通阀的主体的结构相同，并且在其底面中形成有入口，总是与入口连通的出口以及入口 - 出口开口。

公开(公告)号：US08901012B2

公开(公告)日：2014-12-02

申请号：US13599358

申请日：2012-08-30

申请人： Masayuki Hatano ,  Hiroshi Tokue

发明人： Masayuki Hatano ,  Hiroshi Tokue

IPC分类号： C23C16/52 ,  H01L21/67 ,  C23C16/44

CPC分类号： C23C16/52 ,  B82Y10/00 ,  B82Y40/00 ,  C23C16/4401 ,  G03F7/0002 ,  H01L21/6715

摘要： According to one embodiment, a semiconductor manufacturing apparatus includes a substrate stage, a transfer unit, and a control unit. A substrate is settable on the substrate stage. The transfer unit is configured to transfer a pattern having an uneven configuration onto a major surface of the substrate by attachably and removably holding a template. The pattern is provided in the transfer surface. The control unit is configured to acquire information relating to a number of foreign objects on the major surface prior to the transferring of the pattern. The control unit adds the number for a plurality of the substrates including the pattern transferred by the transfer unit. The control unit causes the transfer unit not to implement the transferring of the pattern in the case where the sum has reached the upper limit.

摘要翻译： 根据一个实施例，半导体制造装置包括基板台，转印单元和控制单元。 衬底可在衬底台上设置。 转印单元被配置为通过可附接地和可移除地保持模板将具有不均匀构造的图案转印到基板的主表面上。 转印面上设有图案。 控制单元被配置为在传送图案之前获取与主表面上的多个异物相关的信息。 控制单元添加包括由传送单元传送的图案的多个基板的数量。 在总和达到上限的情况下，控制单元使得传送单元不执行图案的传送。

公开(公告)号：US20100023146A1

公开(公告)日：2010-01-28

申请号：US12497349

申请日：2009-07-02

申请人： Masayuki HATANO ,  Tetsuro NAKASUGI

发明人： Masayuki HATANO ,  Tetsuro NAKASUGI

IPC分类号： G06F19/00

CPC分类号： G05B19/41875 ,  G05B2219/31265 ,  G05B2219/32196 ,  Y02P90/22

摘要： A control method for a semiconductor manufacturing apparatus, comprising: generating, as log data, a history of operation states of the semiconductor manufacturing apparatus when a wafer is processed by the semiconductor manufacturing apparatus; specifying, based on the log data, processing results in which operation states of the semiconductor manufacturing apparatus are abnormal states out of processing results after the processing of the wafer processed by the semiconductor manufacturing apparatus as abnormal processing results; creating control data for the semiconductor manufacturing apparatus based on the processing results and the abnormal processing results; and controlling the processing by the semiconductor manufacturing apparatus using the control data.

摘要翻译： 一种半导体制造装置的控制方法，包括：当半导体制造装置处理晶片时，产生作为对数数据的半导体制造装置的工作状态的历史; 基于对数数据，指定在由半导体制造装置处理的晶片处理之后的处理结果中作为异常处理结果的半导体制造装置的操作状态为异常状态的处理结果; 基于处理结果和异常处理结果创建半导体制造装置的控制数据; 以及使用控制数据来控制半导体制造装置的处理。

公开(公告)号：US20090296054A1

公开(公告)日：2009-12-03

申请号：US12473034

申请日：2009-05-27

申请人： Takuya KONO ,  Masayuki HATANO

发明人： Takuya KONO ,  Masayuki HATANO

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341 ,  G03F7/70725

摘要： An immersion lithography method includes preparing an exposure tool having an exposure stage, a projection lens having an immersion head movable on the stage and used to form an immersion region and an illumination light source provided on the projection lens via a mask, placing a to-be-exposed substrate on the stage, supplying a liquid by use of the immersion head and forming the immersion region disposed between a surface portion of the substrate and a lower end portion of the projection lens, and relatively moving the stage and projection lens while holding the immersion region and exposing a region of the substrate covered with the immersion region. A first distance between the projection lens and the substrate is kept unchanged and a second distance between the immersion head and substrate is changed according to an exposure sequence.

摘要翻译： 浸没式光刻方法包括制备具有曝光台的曝光工具，具有可在舞台上移动并用于形成浸没区域的浸没头的投影透镜和经由掩模设置在投影透镜上的照明光源， 曝光后的基板，通过浸渍头供给液体，形成设置在基板的表面部分和投影透镜的下端部之间的浸渍区域，并且保持平台和投影透镜同时保持 浸没区域并暴露被浸渍区域覆盖的基板的区域。 投影透镜和基板之间的第一距离保持不变，并且浸没头和基板之间的第二距离根据曝光顺序而改变。

公开(公告)号：US20080218715A1

公开(公告)日：2008-09-11

申请号：US12044439

申请日：2008-03-07

申请人： Masayuki HATANO ,  Shinichi Ito

发明人： Masayuki HATANO ,  Shinichi Ito

IPC分类号： G03B27/42

CPC分类号： G03F7/70358 ,  G03F7/70341 ,  G03F7/70425

摘要： An immersion exposure method is disclosed which, while causing a relative movement of an immersion area formed so as to intervene between a substrate to be exposed on an exposure stage and a projection lens to the substrate, exposes an irradiation area of the substrate covered with the immersion area. An exposure stage is moved in a first direction, thereby exposing a first exposure area of the substrate. The exposure stage is moved in a second direction opposite to the first direction, thereby exposing a second exposure area adjoining the first exposure area. In a state where the second exposure area is held inside the immersion boundary of the immersion area, the exposure stage is moved from the movement end position of the exposure stage in a first exposure moving process to the movement start position of the exposure stage in a second exposure moving process.

摘要翻译： 公开了一种浸没曝光方法，其中，使形成的浸渍区域的相对运动在曝光台上待曝光的基板和投影透镜之间介入到基板的同时，使被覆盖的基板的照射区域曝光 沉浸区域。 曝光阶段沿第一方向移动，从而暴露基板的第一曝光区域。 曝光阶段在与第一方向相反的第二方向上移动，从而暴露与第一曝光区域相邻的第二曝光区域。 在第二曝光区域保持在浸没区域的浸没边界内的状态下，曝光阶段在第一曝光移动处理中从曝光台的移动结束位置移动到曝光台的移动开始位置 第二曝光移动过程。