公开(公告)号：US20100136796A1

公开(公告)日：2010-06-03

申请号：US12628800

申请日：2009-12-01

申请人： Masayuki HATANO ,  Takuya KONO ,  Yasutada NAKAGAWA ,  Yuji SASAKI

发明人： Masayuki HATANO ,  Takuya KONO ,  Yasutada NAKAGAWA ,  Yuji SASAKI

IPC分类号： H01L21/30 ,  G03B27/58

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： A substrate holding member according to an embodiment includes an opening having a minimum internal diameter lager than a diameter of a space in which a substrate to be exposed on a substrate stage is disposed, wherein an inner peripheral surface of the opening has a shape expanding toward a lower surface at least partly.

摘要翻译： 根据实施例的基板保持构件包括具有最小内径的开口，该开口比设置在基板载台上要暴露的基板的空间的直径大，该开口的内周面具有朝向 至少部分地是下表面。

公开(公告)号：US20090296054A1

公开(公告)日：2009-12-03

申请号：US12473034

申请日：2009-05-27

申请人： Takuya KONO ,  Masayuki HATANO

发明人： Takuya KONO ,  Masayuki HATANO

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341 ,  G03F7/70725

摘要： An immersion lithography method includes preparing an exposure tool having an exposure stage, a projection lens having an immersion head movable on the stage and used to form an immersion region and an illumination light source provided on the projection lens via a mask, placing a to-be-exposed substrate on the stage, supplying a liquid by use of the immersion head and forming the immersion region disposed between a surface portion of the substrate and a lower end portion of the projection lens, and relatively moving the stage and projection lens while holding the immersion region and exposing a region of the substrate covered with the immersion region. A first distance between the projection lens and the substrate is kept unchanged and a second distance between the immersion head and substrate is changed according to an exposure sequence.

摘要翻译： 浸没式光刻方法包括制备具有曝光台的曝光工具，具有可在舞台上移动并用于形成浸没区域的浸没头的投影透镜和经由掩模设置在投影透镜上的照明光源， 曝光后的基板，通过浸渍头供给液体，形成设置在基板的表面部分和投影透镜的下端部之间的浸渍区域，并且保持平台和投影透镜同时保持 浸没区域并暴露被浸渍区域覆盖的基板的区域。 投影透镜和基板之间的第一距离保持不变，并且浸没头和基板之间的第二距离根据曝光顺序而改变。

公开(公告)号：US20110032501A1

公开(公告)日：2011-02-10

申请号：US12830881

申请日：2010-07-06

申请人： Kazuya FUKUHARA ,  Masayuki HATANO ,  Takuya KONO

发明人： Kazuya FUKUHARA ,  Masayuki HATANO ,  Takuya KONO

IPC分类号： G03B27/54

CPC分类号： G03F7/70525 ,  G03F7/705

摘要： In one embodiment, an exposure apparatus is configured to irradiate a mask with illumination light and to irradiate a wafer with light from the mask irradiated with the illumination light. The apparatus includes an information acquisition unit configured to acquire use history information that is information regarding a use history of the mask. The apparatus further includes a condition derivation unit configured to derive a setting value or a change amount of an optical setting condition of the exposure apparatus, based on the acquired use history information and correspondence information that indicates a correspondence between the use history of the mask and the optical setting condition of the exposure apparatus. The apparatus further includes an exposure unit configured to set the optical setting condition of the exposure apparatus to an optical setting condition specified by the derived setting value or change amount, and to expose the wafer under the set optical setting condition.

摘要翻译： 在一个实施例中，曝光装置被配置为用照明光照射掩模，并且用来自照射照明光的掩模的光照射晶片。 该装置包括：信息获取单元，被配置为获取与掩模的使用历史有关的信息的使用历史信息。 该装置还包括条件导出单元，被配置为基于所获取的使用历史信息和对应信息来导出曝光装置的光学设置条件的设定值或变化量，该对应信息指示掩模的使用历史和 曝光装置的光学设定条件。 该装置还包括：曝光单元，被配置为将曝光装置的光学设置状态设置为由导出的设定值或变化量指定的光学设定条件，并在设定的光学设定条件下使晶片曝光。

公开(公告)号：US20120061875A1

公开(公告)日：2012-03-15

申请号：US13230564

申请日：2011-09-12

申请人： Takuya KONO

发明人： Takuya KONO

IPC分类号： B29C59/02

CPC分类号： B29C59/022 ,  B29C35/0888 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： In one embodiment, a template chuck for an imprint apparatus includes first and second bodies configured to contact an upper surface and a lower surface of a template, respectively, to sandwich the template vertically. The chuck further includes contact members configured to contact side surfaces of the template to sandwich the template laterally. The chuck further includes a deformation controller configured to deform the template by applying a stress to the template through the contact members. In addition, the first body, the second body, and the contact members are configured to be movable individually.

摘要翻译： 在一个实施例中，用于压印装置的模板卡盘包括分别与模板的上表面和下表面接触以使模板垂直夹持的第一和第二主体。 卡盘还包括被配置为接触模板的侧表面以横向夹持模板的接触构件。 卡盘还包括变形控制器，其被配置为通过通过接触构件向模板施加应力而使模板变形。 此外，第一主体，第二主体和接触部件被构造成能够单独移动。

公开(公告)号：US20110266705A1

公开(公告)日：2011-11-03

申请号：US13069186

申请日：2011-03-22

申请人： Shinichi ITO ,  Takuya KONO

发明人： Shinichi ITO ,  Takuya KONO

IPC分类号： B29C33/38 ,  B05C3/02 ,  B28B7/38

CPC分类号： G03F7/0002 ,  B29C33/62 ,  B29C33/64 ,  B82Y10/00 ,  B82Y40/00

摘要： A template repair method according to one embodiment is a method for repairing a template including a template base material and a first mold release layer formed on a pattern surface of the template base material, and a restorative material is supplied to the pattern surface of the template base material in the template repair method. The restorative material has affinity to the base material and non-affinity to the mold release layer.

摘要翻译： 根据一个实施例的模板修复方法是一种用于修复模板的方法，所述模板包括模板基材和形成在模板基材的图案表面上的第一脱模层，并且将修复材料供应到模板的图案表面 基材在模板修复方法中。 修复材料对基材具有亲和力并且对脱模层具有非亲和性。

公开(公告)号：US20080204685A1

公开(公告)日：2008-08-28

申请号：US12035217

申请日：2008-02-21

申请人： Takuya KONO ,  Tatsuhiko Higashiki

发明人： Takuya KONO ,  Tatsuhiko Higashiki

IPC分类号： G03B27/42 ,  G03B27/54 ,  G03B27/70

CPC分类号： G03F7/70433 ,  G03F7/70291 ,  G03F7/70366 ,  G03F7/70466

摘要： An exposure apparatus includes a first exposure apparatus used for exposing a peripheral portion of a wafer in maskless manner, the first exposure apparatus including a light source configured to emit light, a stage on which the wafer is to be placed, and a light controller configured to control the light emitted from the light source and irradiated onto a peripheral portion of the wafer placed on the stage, the light controller controlling at least one of shape, size and coverage on the wafer of the light emitted from the light source.

摘要翻译： 曝光装置包括：第一曝光装置，其用于以无掩模的方式曝光晶片的周边部分，所述第一曝光装置包括被配置为发光的光源，待放置所述晶片的台，以及配置在所述第一曝光装置 控制从光源发射并照射到放置在台架上的晶片的周边部分的光，该光控制器控制晶片上从光源发射的光的形状，尺寸和覆盖面中的至少一个。