Combined nanoimprinting and photolithography for micro and nano devices fabrication
    1.
    发明申请
    Combined nanoimprinting and photolithography for micro and nano devices fabrication 有权
    用于微纳米器件制造的组合纳米压印和光刻

    公开(公告)号:US20060237881A1

    公开(公告)日:2006-10-26

    申请号:US10545456

    申请日:2004-02-13

    IPC分类号: B29C35/08

    摘要: A method of fabricating a device including imprinting a mold having a protrusion against a substrate having a resist layer such that the protrusion engages the resist layer. The mold further has a mask member positioned generally adjacent the resist layer. Radiation energy is then transmitted through the mold and into the resist layer; however, the mask member substantially prevents transmission of the radiation energy therethrough, thereby defining an unexposed area in the resist layer. Once the mold is removed from the substrate, which consequently forms a first feature from nanoimprinting, the unexposed area of resist layer is removed through dissolving in a developer solution.

    摘要翻译: 一种制造器件的方法,包括将具有突起的模具压印在具有抗蚀剂层的基底上,使得突起与抗蚀剂层接合。 模具还具有通常邻近抗蚀剂层定位的掩模构件。 然后将辐射能量透过模具并进入抗蚀剂层; 然而,掩模构件基本上防止辐射能量透过,从而在抗蚀剂层中限定未曝光区域。 一旦将模具从基底上移除,从而形成纳米压印的第一特征,则通过溶解在显影剂溶液中去除抗蚀剂层的未曝光区域。

    Single-electron floating-gate MOS memory
    2.
    发明授权
    Single-electron floating-gate MOS memory 失效
    单电子浮栅MOS存储器

    公开(公告)号:US6069380A

    公开(公告)日:2000-05-30

    申请号:US900947

    申请日:1997-07-25

    IPC分类号: H01L29/788

    摘要: A Single Electron MOS Memory (SEMM), in which one bit of information is represented by storing only one electron, has been demonstrated at room temperature. The SEMM is a floating gate Metal-Oxide-Semiconductor (MOS) transistor in silicon with a channel width (about 10 nanometers) which is smaller than the Debye screening length of a single electron stored on the floating gate, and a nanoscale polysilicon dot (about 7 nanometers by 7 nanometers by 2 nanometers) as the floating gate which is positioned between the channel and the control gate. An electron stored on the floating gate can screen the entire channel from the potential on the control gate, and lead to: (i) a discrete shift in the threshold voltage; (ii) a staircase relation between the charging voltage and the shift; and (iii) a self-limiting charging process. The structure and fabrication of the SEMM is well adapted to the manufacture of ultra large-scale integrated circuits.

    摘要翻译: 已经在室温下证明了单电子MOS存储器(SEMM),其中一位信息仅通过仅存储一个电子来表示。 SEMM是硅中的浮栅金属氧化物半导体(MOS)晶体管,其通道宽度(约10纳米)小于存储在浮置栅极上的单个电子的德拜屏蔽长度,以及纳米级多晶硅点( 约7纳米×7纳米×2纳米)作为位于通道和控制门之间的浮动栅极。 存储在浮置栅极上的电子可以从控制栅极上的电位屏蔽整个通道,并导致:(i)阈值电压的离散移位; (ii)充电电压与偏移之间的阶梯关系; 和(iii)自限制充电过程。 SEMM的结构和制造适应于超大规模集成电路的制造。

    Material composition for nano-and micro-lithography
    3.
    发明申请
    Material composition for nano-and micro-lithography 失效
    纳米和微光刻的材料组成

    公开(公告)号:US20070196589A1

    公开(公告)日:2007-08-23

    申请号:US10598943

    申请日:2005-06-01

    IPC分类号: C08G59/68

    摘要: A material composition, which is used as a liquid resist, includes a first component comprising a monomer portion and at least one cationically polymerizable functional group, and a crosslinker reactive with the first component and comprising at least three cationically polymerizable functional groups. The material composition also includes a cationic photoinitiator. Upon exposure to UV light, the material composition crosslinks via cure to form a cured resist film that is the reaction product of the first component, the crosslinker, and the cationic photoinitiator. An article includes a substrate layer and a resist layer formed on the substrate layer from the material composition.

    摘要翻译: 用作液体抗蚀剂的材料组合物包括包含单体部分和至少一种阳离子可聚合官能团的第一组分和与第一组分反应并包含至少三个可阳离子聚合的官能团的交联剂。 该材料组合物还包括阳离子光引发剂。 在暴露于UV光下时,材料组合物通过固化交联以形成固化的抗蚀剂膜,其是第一组分,交联剂和阳离子光引发剂的反应产物。 一种制品包括从该材料组合物形成在基底层上的基底层和抗蚀剂层。

    Method of nanopatterning, a resist film for use therein, and an article including the resist film
    4.
    发明申请
    Method of nanopatterning, a resist film for use therein, and an article including the resist film 审中-公开
    纳米图案的方法,其中使用的抗蚀剂膜和包含抗蚀剂膜的制品

    公开(公告)号:US20070122749A1

    公开(公告)日:2007-05-31

    申请号:US11290866

    申请日:2005-11-30

    申请人: Peng Fu Lingjie Guo

    发明人: Peng Fu Lingjie Guo

    IPC分类号: G03C5/00

    摘要: A method of nanopatterning includes the steps of providing a resist film (12) and forming a pattern in the resist film (12). The resist film (12) includes a copolymer consisting of an organosilicone component and an organic component. An article (10) includes a substrate (14) and the resist film (12) disposed on the substrate (14). The copolymer of the organosilicone component and the organic component is sufficiently elastic, due to the presence of the organosilicone component, to be capable of resisting fracture and delamination during mold release. Furthermore, during pattern formation, the copolymer develops relatively low surface energy at an interface with the surface of a mold, as compared to conventional polymeric materials, and preferentially adheres to the substrate (14) rather than the mold, which provides for relatively easy mold release. The presence of the organosilicone component in the copolymer also allows the resist film (12) to exhibit excellent resistance to oxygen plasma etching.

    摘要翻译: 纳米图案的方法包括提供抗蚀剂膜(12)并在抗蚀剂膜(12)中形成图案的步骤。 抗蚀膜(12)包括由有机硅组分和有机组分组成的共聚物。 制品(10)包括基板(14)和设置在基板(14)上的抗蚀膜(12)。 由于有机硅组分的存在,有机硅组分和有机组分的共聚物具有足够的弹性,能够抵抗脱模过程中的断裂和分层。 此外,在图案形成期间,与常规聚合物材料相比,共聚物在与模具表面的界面处产生相对低的表面能,并优先粘附到基材(14)而不是模具,其提供相对容易的模具 发布。 共聚物中有机硅组分的存在也允许抗蚀剂膜(12)表现出优异的耐氧等离子体蚀刻性。

    Polymer micro-ring resonator device and fabrication method
    6.
    发明申请
    Polymer micro-ring resonator device and fabrication method 审中-公开
    聚合物微环谐振器装置及其制造方法

    公开(公告)号:US20060062523A1

    公开(公告)日:2006-03-23

    申请号:US11230267

    申请日:2005-09-19

    IPC分类号: G02B6/26

    摘要: A polymer micro-ring resonator and a method of manufacturing the same that is capable of providing reduced surface roughness and improved submicron gap separation between a waveguide and a micro-ring. The microresonator includes a waveguide and an optical resonator optically coupled to the waveguide. The optical resonator includes a core and a cladding surrounding at least a portion of the core, wherein the cladding is a fluid.

    摘要翻译: 一种聚合物微环谐振器及其制造方法,其能够在波导和微环之间提供降低的表面粗糙度和改进的亚微米间隙分离。 微谐振器包括波导和光学耦合到波导的光学谐振器。 光学谐振器包括芯和包围芯的至少一部分的包层,其中包层是流体。

    Reversal imprint technique
    7.
    发明申请
    Reversal imprint technique 审中-公开
    反转印记技术

    公开(公告)号:US20070059497A1

    公开(公告)日:2007-03-15

    申请号:US10513704

    申请日:2002-05-08

    IPC分类号: B05D5/12 B41M5/00 B05D3/12

    摘要: The present invention relates to a method for imprinting a micro-/nano-structure on a substrate, the method comprising (a) providing a mold containing a desired pattern or relief for a microstructure; (b) applying a polymer coating to the mold; and (c) transferring the polymer coating from the mold to a substrate under suitable temperature and pressure conditions to form an imprinted substrate having a desired micro-/nano-structure thereon.

    摘要翻译: 本发明涉及一种用于将微/纳米结构压印在基底上的方法,所述方法包括(a)提供含有微结构的所需图案或凹凸的模具; (b)将聚合物涂层施加到模具上; 和(c)在合适的温度和压力条件下将聚合物涂层从模具转移到基底上以形成其上具有所需微/纳米结构的印迹基底。