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公开(公告)号：US07560658B2
公开(公告)日：2009-07-14
申请号：US11167463
申请日：2005-06-27
申请人： Alan J. Hunt , Gerald Mourou , Ajit P. Joglekar , Edgar Meyhofer , John A. Nees , Greg Spooner
发明人： Alan J. Hunt , Gerald Mourou , Ajit P. Joglekar , Edgar Meyhofer , John A. Nees , Greg Spooner
CPC分类号： B23K26/06 , B23K26/0624 , B23K26/0665 , B23K26/073 , B23K26/361
摘要： Here is presented a versatile technique for machining of nanometer-scale features using tightly-focused ultrashort laser pulses. By the invention, the size of features can be reduced far below the wavelength of light, thus enabling nanomachining of a wide range of materials. The features may be extremely small (
摘要翻译： 这里介绍了一种用于使用紧密聚焦的超短激光脉冲加工纳米级特征的多功能技术。 通过本发明，特征的尺寸可以降低到远低于光的波长，从而使得能够对宽范围的材料进行纳米加工。 特征可能非常小（<20nm），并且是高度可重复的。
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公开(公告)号：US20060237405A1
公开(公告)日：2006-10-26
申请号：US11167463
申请日：2005-06-27
申请人： Alan Hunt , Gerard Mourou , Ajit Joglekar , Edgar Meyhofer , John Nees , Greg Spooner
发明人： Alan Hunt , Gerard Mourou , Ajit Joglekar , Edgar Meyhofer , John Nees , Greg Spooner
IPC分类号： B23K26/00
CPC分类号： B23K26/06 , B23K26/0624 , B23K26/0665 , B23K26/073 , B23K26/361
摘要： Here is presented a versatile technique for machining of nanometer-scale features using tightly-focused ultrashort laser pulses. By the invention, the size of features can be reduced far below the wavelength of light, thus enabling nanomachining of a wide range of materials. The features may be extremely small (
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公开(公告)号：US06995336B2
公开(公告)日：2006-02-07
申请号：US10765656
申请日：2004-01-26
申请人： Alan J. Hunt , Gerard Mourou , Ajit P. Joglekar , Edgar Meyhofer , John A. Nees , Greg Spooner
发明人： Alan J. Hunt , Gerard Mourou , Ajit P. Joglekar , Edgar Meyhofer , John A. Nees , Greg Spooner
IPC分类号： B23K26/36
CPC分类号： B23K26/06 , B23K26/0624 , B23K26/0665 , B23K26/073 , B23K26/361
摘要： Here is presented a versatile technique for machining of nanometer-scale features using tightly-focused ultrashort laser pulses. By the invention, the size of features can be reduced far below the wavelength of light, thus enabling nanomachining of a wide range of materials. The features may be extremely small (
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公开(公告)号：US20060063207A1
公开(公告)日：2006-03-23
申请号：US11233975
申请日：2005-09-22
申请人： Chih-Tin Lin , Amaya Frost , Edgar Meyhofer , Katsuo Kurabayashi , Chao Fan
发明人： Chih-Tin Lin , Amaya Frost , Edgar Meyhofer , Katsuo Kurabayashi , Chao Fan
IPC分类号： G01N33/53
CPC分类号： G01N33/5438 , G01N33/54306
摘要： A protein patterning electrode device consisting of capacitor microelectrode arrays coated with a protein non-adherent layer is provided. Operation of the electrode is based on a phenomenon called “electrowetting,” where surface wettability can dynamically be controlled by varying the voltage across the device electrodes. When an electric field is applied across the electrode layers, the surface accumulates charge and becomes hydrophilic, binding the proteins to the surface via ionic bonding. Electrically controlling the amount of the surface charge permits controlled protein surface affinity. The device provides a means for reconfigurable protein patterning.
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公开(公告)号：US20050064137A1
公开(公告)日：2005-03-24
申请号：US10988333
申请日：2004-11-11
申请人： Alan Hunt , Ernest Hasselbrink , Edgar Meyhofer , Kevin Ke
发明人： Alan Hunt , Ernest Hasselbrink , Edgar Meyhofer , Kevin Ke
IPC分类号： B23K26/06 , B23K26/073 , B23K26/36 , B23K26/38 , B32B3/10
CPC分类号： B23K26/06 , B23K26/0624 , B23K26/0665 , B23K26/073 , B23K26/1224 , B23K26/142 , B23K26/146 , B23K26/36 , B23K26/361 , B23K26/382 , B23K26/384 , B23K26/40 , B23K26/55 , B23K2101/40 , B23K2103/30 , B23K2103/50 , B81C1/00492 , B81C2201/0143 , B82Y30/00 , B82Y40/00 , C03C23/0025 , Y10T428/24273 , Y10T428/24562 , Y10T428/24744
摘要： The invention provides a versatile technique for machining of nanometer-scale features using tightly-focused ultrashort laser pulses. By the invention, the size of features can be reduced far below the wavelength of light, thus enabling nanomachining of a wide range of materials. The features may be extremely small, of nanometer size, and are highly reproducible.
摘要翻译： 本发明提供了一种用于使用紧密聚焦的超短激光脉冲来加工纳米尺度特征的通用技术。 通过本发明，特征的尺寸可以降低到远低于光的波长，从而使得能够对宽范围的材料进行纳米加工。 特征可能非常小，纳米尺寸，并且具有高度可重复性。
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公开(公告)号：US20080105663A1
公开(公告)日：2008-05-08
申请号：US11927764
申请日：2007-10-30
申请人： Alan Hunt , Ernest Hasselbrink , Edgar Meyhofer , Kevin Ke
发明人： Alan Hunt , Ernest Hasselbrink , Edgar Meyhofer , Kevin Ke
CPC分类号： B23K26/06 , B23K26/0624 , B23K26/0665 , B23K26/073 , B23K26/1224 , B23K26/142 , B23K26/146 , B23K26/36 , B23K26/361 , B23K26/382 , B23K26/384 , B23K26/40 , B23K26/55 , B23K2101/40 , B23K2103/30 , B23K2103/50 , B81C1/00492 , B81C2201/0143 , B82Y30/00 , B82Y40/00 , C03C23/0025 , Y10T428/24273 , Y10T428/24562 , Y10T428/24744
摘要： The invention provides a versatile technique for machining of nanometer-scale features using tightly-focused ultrashort laser pulses. By the invention, the size of features can be reduced far below the wavelength of light, thus enabling nanomachining of a wide range of materials. The features may be extremely small, of nanometer size, and are highly reproducible.
摘要翻译： 本发明提供了一种用于使用紧密聚焦的超短激光脉冲来加工纳米尺度特征的通用技术。 通过本发明，特征的尺寸可以降低到远低于光的波长，从而使得能够对宽范围的材料进行纳米加工。 特征可能非常小，纳米尺寸，并且具有高度可重复性。
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公开(公告)号：US07344847B2
公开(公告)日：2008-03-18
申请号：US11066804
申请日：2005-02-25
IPC分类号： G01N33/53 , H01C17/075 , C23C22/00
CPC分类号： G01N33/54366 , B01J19/0046 , B01J2219/00382 , B01J2219/00385 , B01J2219/00596 , B01J2219/00605 , B01J2219/00612 , B01J2219/00617 , B01J2219/0063 , B01J2219/00632 , B01J2219/00635 , B01J2219/00659 , B01J2219/00722 , B01J2219/00725 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： A support for immobilizing target molecules comprises a substrate having a plurality of binding regions for binding select target molecules, with target-molecule-capturing agent immobilized at the binding regions. The binding regions are intersperse among other non-binding regions. The binding regions are of sub-micron size, have high selectivity and high binding capacity, and prevent or at least minimize loss of target molecule activity.
摘要翻译： 用于固定靶分子的载体包括具有多个用于结合选择性靶分子的结合区域的底物和固定在结合区域的靶分子捕获剂。 结合区域在其他非结合区域之间是散在的。 结合区具有亚微米尺寸，具有高选择性和高结合能力，并且防止或至少最小化靶分子活性的损失。
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公开(公告)号：US20060194252A1
公开(公告)日：2006-08-31
申请号：US11066804
申请日：2005-02-25
申请人： Alan Hunt , Lingjie Guo , Jeremy Hoff , Li-Jing Cheng , Edgar Meyhofer
发明人： Alan Hunt , Lingjie Guo , Jeremy Hoff , Li-Jing Cheng , Edgar Meyhofer
CPC分类号： G01N33/54366 , B01J19/0046 , B01J2219/00382 , B01J2219/00385 , B01J2219/00596 , B01J2219/00605 , B01J2219/00612 , B01J2219/00617 , B01J2219/0063 , B01J2219/00632 , B01J2219/00635 , B01J2219/00659 , B01J2219/00722 , B01J2219/00725 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： A support for immobilizing target molecules comprises a substrate having a plurality of binding regions for binding select target molecules, with target-molecule-capturing agent immobilized at the binding regions. The binding regions are intersperse among other non-binding regions. The binding regions are of sub-micron size, have high selectivity and high binding capacity, and prevent or at least minimize loss of target molecule activity.
摘要翻译： 用于固定靶分子的载体包括具有多个用于结合选择性靶分子的结合区域的底物和固定在结合区域的靶分子捕获剂。 结合区域在其他非结合区域之间是散在的。 结合区具有亚微米尺寸，具有高选择性和高结合能力，并且防止或至少最小化靶分子活性的损失。
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