Abstract:
Provided are nanocrystal silicon layer structures formed using a plasma deposition technique, methods of forming the same, nonvolatile memory devices including the nanocrystal silicon layer structures, and methods of fabricating the nonvolatile memory devices. A method of forming a nanocrystal silicon layer structure includes forming a buffer layer on a substrate and forming a nanocrystal silicon layer on the buffer layer by a plasma deposition technique using silicon (Si)-containing gas and hydrogen (H2)-containing gas. In this method, the nanocrystal silicon layer can be directly deposited on a glass substrate using plasma vapor deposition without performing a post-processing process so that the fabrication of a nonvolatile memory device can be simplified, thereby reducing fabrication cost.
Abstract:
A thin film transistor (TFT), a method of forming the same and a flat panel display device having the same are disclosed. The TFT includes a buffer layer and a semiconductor layer which are sequentially disposed on a substrate, a gate pattern including an insulating pattern and a gate electrode pattern which are sequentially disposed on the semiconductor layer, source and drain regions defining a portion of the semiconductor layer below the gate pattern as a channel area, formed by doping the semiconductor layer disposed at both sides of the gate pattern with impurities, and extending from both sides of the channel area, a passivation layer which covers the entire surface of the substrate having the gate pattern, a first metal electrode which penetrates a portion of the passivation layer disposed on the source area and a portion of the source region below the portion of the passivation layer to be electrically connected with the source region, and a second metal electrode which penetrates a portion of the passivation layer disposed on the drain area and a portion of the drain region below the portion of the passivation layer to be electrically connected with the drain region. According to the present invention, a metal is infiltrated into source and drain regions to disperse an electric current when a TFT operates, and thus charge mobility is improved, and damage of a drain region caused by the excessive current density is prevented, leading to the long lifespan and excellent performance.
Abstract:
Provided are nanocrystal silicon layer structures formed using a plasma deposition technique, methods of forming the same, nonvolatile memory devices including the nanocrystal silicon layer structures, and methods of fabricating the nonvolatile memory devices. A method of forming a nanocrystal silicon layer structure includes forming a buffer layer on a substrate and forming a nanocrystal silicon layer on the buffer layer by a plasma deposition technique using silicon (Si)-containing gas and hydrogen (H2)-containing gas. In this method, the nanocrystal silicon layer can be directly deposited on a glass substrate using plasma vapor deposition without performing a post-processing process so that the fabrication of a nonvolatile memory device can be simplified, thereby reducing fabrication cost.
Abstract:
A turbine structure and a gate structure for tidal power plants of the present invention features that middle walls which can be installed as two units of one block are installed with an inside stuffing and a flexible joint so as to absorb and reduce the internal and external effects of the buoyancy and mechanical vibration of the turbine structures and the gate structures on the tidal power plants, save construction costs by shortened construction period and reduced concrete placing quantity, and prevent the cracks of concrete and the generation of hydration heat. The turbine structure having the flexible joint and the inside stuffing for tidal power plants comprises a base which bottom part is on the submarine rock so that a turbine structure between lake and sea which is connected with a gate structure by the medium of a connection structure can be installed as two units of one block; vertical middle walls which are formed on the base, the top of which is closed by a concrete structure wherein a draft tube and a discharge tube by which seawater can move inside; turbine generators which are arranged between the middle walls through the draft tubes; an inside stuffing space which is formed in the middle walls on one side installed in a predetermined distance on the base of the gate structure and filled with seawater; and a flexible joint of connecting the middle walls on the other side.
Abstract:
An integrated power system combining tidal power generation and ocean current power generation comprises: constructing barrages across the sea to make up a lake; installing turbine structures of a tidal power plant and sluice structures of a tidal power dam for generating electricity by using the potential energy difference between seawaters caused by tides and ebbs; forming an ocean current power park in a lake side by installing a plurality of ocean current generators, for generating electricity by using the flow of the seawater discharged through turbine generators, in a rear lake side of the turbine structures of the tidal power plant; and forming an ocean current power park in a sea side by installing ocean current generators, for generating electricity by using the seawater with the fast speed discharged into the sea through sluice gates, in a rear sea side of the sluice structures of the tidal power dam.
Abstract:
Fishways of turbine structures and gate structures for environmentally-friendly tidal power plant through which fish can pass through are provided. The fishway comprises of sea side fishways and lake side fishways to allow fish to move between the sea side and the lake side by forming inside stuffing space filled with seawater for shorter construction period and concrete reduced placing quantity in a certain section of the vertical middle walls installed on the base of which the bottom part is on the marine rock to form blocks of turbine structures and gate structures in a tidal power plant, and seawater on the sea side and the lake side is flown through the front and rear of such inside stuffing space.
Abstract:
A thin film transistor (TFT), a method of forming the same and a flat panel display device having the same are disclosed. The TFT includes a buffer layer and a semiconductor layer which are sequentially disposed on a substrate, a gate pattern including an insulating pattern and a gate electrode pattern which are sequentially disposed on the semiconductor layer, source and drain regions defining a portion of the semiconductor layer below the gate pattern as a channel area, formed by doping the semiconductor layer disposed at both sides of the gate pattern with impurities, and extending from both sides of the channel area, a passivation layer which covers the entire surface of the substrate having the gate pattern, a first metal electrode which penetrates a portion of the passivation layer disposed on the source area and a portion of the source region below the portion of the passivation layer to be electrically connected with the source region, and a second metal electrode which penetrates a portion of the passivation layer disposed on the drain area and a portion of the drain region below the portion of the passivation layer to be electrically connected with the drain region. According to the present invention, a metal is infiltrated into source and drain regions to disperse an electric current when a TFT operates, and thus charge mobility is improved, and damage of a drain region caused by the excessive current density is prevented, leading to the long lifespan and excellent performance.
Abstract:
There is provided with a complex ocean power system combining ocean current power generation for generating electricity by forming a plurality of ocean current generators in front and rear of sluice structures of tidal power dams and sluice power generation for generating electricity by forming a plurality of ocean current generators in sluice conduits of the sluice structures, comprising: constructing barrages, which cross over the sea, to make up a lake; installing sluice structures of tidal power dams between the barrages 10 to generate electricity by changing a potential energy difference between seawaters caused by tides and ebbs to kinetic energy; installing ocean current generators in front and rear of the sluice structures and in the sluice conduits of the sluice structures to generate electricity by rotating turbine blades using the flow of the incoming seawater from a sea side into a lake side during flood tide and the flow of the seawater discharged from the lake side into the sea side during ebb tide; and installing sluice gates in the sluice structures 102, 210 to close and open the sluice conduits during flood tide and ebb tide.